저온 공정이 가능한 용액 공정용 산화물 반도체를 위한 결정화 제어 방법
    61.
    发明公开
    저온 공정이 가능한 용액 공정용 산화물 반도체를 위한 결정화 제어 방법 有权
    控制低温加工和溶液处理氧化物半导体结晶行为的方法

    公开(公告)号:KR1020110025334A

    公开(公告)日:2011-03-10

    申请号:KR1020090083346

    申请日:2009-09-04

    CPC classification number: H01L21/02565 H01L21/02628

    Abstract: PURPOSE: A method for controlling crystallization for an oxide semiconductor for a solution process at a low temperature is provided to promote crystallization by controlling the thickness of a thin film. CONSTITUTION: A metal oxide precursor solution is coated on a substrate with the thickness of a thin film between 1 and 10 nm. The coated thin film is processed at a temperature of 200 to 350 degrees. The diluted solutions of the metal oxide precursor are made to control the thickness of the thin film between 1 and 10 nm by the coating of the metal oxide precursor solution. The diluted solutions of the metal oxide precursor include the metal oxide precursor of 0.01 to 0.09M.

    Abstract translation: 目的:提供一种用于控制低温溶液处理的氧化物半导体结晶的方法,以通过控制薄膜的厚度来促进结晶。 构成:将金属氧化物前体溶液涂覆在基板上,薄膜的厚度在1至10nm之间。 涂覆的薄膜在200至350度的温度下进行处理。 金属氧化物前体的稀释溶液通过涂覆金属氧化物前体溶液来控制薄膜的厚度在1和10nm之间。 金属氧化物前体的稀释溶液包括0.01至0.09M的金属氧化物前体。

    고분자전해질을 이용한 저온 수계 CI(G)S(CuInxGa1?xSe2) 나노입자의 제조방법
    62.
    发明公开
    고분자전해질을 이용한 저온 수계 CI(G)S(CuInxGa1?xSe2) 나노입자의 제조방법 有权
    使用聚电解质的CI(G)S(CUINXGA1-XSE2)纳米颗粒的低温水基制备方法

    公开(公告)号:KR1020110024174A

    公开(公告)日:2011-03-09

    申请号:KR1020090082061

    申请日:2009-09-01

    Abstract: PURPOSE: A method for manufacturing low temperature water-based copper-indium-gallium-selenium(CuIn_xGa_1-xSe_2) nano particles is provided to control the particle of the copper-indium-gallium-selenium in a nano scale by controlling the size of an intermediate complex. CONSTITUTION: A complex solution containing copper and indium is prepared by reacting a copper compound, an indium compound, and a polymer electrolyte represented by chemical formula 1. A selenium compound is introduced into the complex solution, and copper-indium-(gallium-)selenium nano particles are prepared at low temperature. In chemical formula 1, R1 represents C6 to C30 aryl group, C1 to C18 alkyl group, C2 to C18 alkenyl group, or C3 to C18 cycloalkyl group. R2 is selected from a group including carboxylic acid, sulfonate, sulfate, ester sulfate, and phosphate. M1 is selected from sodium, ammonium, potassium, and amine. n represents an integer of 1 to 1000, and m represents an integer of 1 to 1000.

    Abstract translation: 目的:提供一种制造低温水性铜铟镓硒(CuIn_xGa_1-xSe_2)纳米颗粒的方法,通过控制纳米尺度的铜铟镓硒颗粒的尺寸 中间复合体。 构成:通过铜化合物,铟化合物和由化学式1表示的聚合物电解质的反应制备含有铜和铟的复合溶液。将硒化合物引入复合溶液中,并将铜铟 - (镓) 硒纳米颗粒在低温下制备。 在化学式1中,R 1表示C 6〜C 30芳基,C 1〜C 18烷基,C 2〜C 18烯基或C 3〜C 18环烷基。 R2选自羧酸,磺酸盐,硫酸盐,酯硫酸盐和磷酸盐。 M1选自钠,铵,钾和胺。 n表示1〜1000的整数,m表示1〜1000的整数。

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