公开(公告)号：DE10035119A1

公开(公告)日：2002-01-31

申请号：DE10035119

申请日：2000-07-19

Applicant: BASF AG

Inventor： BINDER HORST ,  BRUCHMANN BERND

IPC: C08F4/32 ,  C08F220/14 ,  C08F220/18 ,  C08F220/26 ,  C08F220/28 ,  C08F220/32

Abstract: The invention relates to partially branched polymers having an average numerical molecular weight Mn ranging from 500 - 20000 daltons, made from ethylenically unsaturated monomers, comprising i) 80 99.9 wt % of monoethylenically unsaturated monomers A and ii) 0.1 - 20 wt % monomers B, comprising at least two non-conjugated, ethylenically unsaturated double bonds, wherein the proportional weight of monomers A and B relates to the total amount of ethylenically unsaturated polymer monomers making up said polymer.

公开(公告)号：AU8968901A

公开(公告)日：2002-01-30

申请号：AU8968901

申请日：2001-07-18

Applicant: BASF AG

Inventor： BINDER HORST ,  BRUCHMANN BERND

IPC: C08F4/32 ,  C08F220/14 ,  C08F220/18 ,  C08F220/26 ,  C08F220/28 ,  C08F220/32

Abstract: The present invention relates to partially branched polymers having a number-average molecular weight Mn in the range from 500 to 20 000 daltons and synthesized from ethylenically unsaturated monomers including:i) from 80 to 99.9% by weight of monoethylenically unsaturated monomers A, andii) from 0.1 to 20% by weight of monomers B containing at least two nonconjugated ethylenically unsaturated double bonds,the weight fraction of the monomers A and B being based on the total amount of the ethylenically unsaturated monomers that constitute the polymer.

公开(公告)号：DE59604943D1

公开(公告)日：2000-05-18

申请号：DE59604943

申请日：1996-09-03

Applicant: BASF AG

Inventor： SCHWALM DR ,  FUNHOFF DR ,  BINDER HORST

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: Positive-working radiation-sensitive mixt. is based on (a) either (a-1) water-insol. organic polymeric binder(s) with acid-labile gps., rendered soluble in aq. alkaline soln. by the action of acid or (a-2.1) a water-insol. polymeric binder, which is soluble in aq. alkaline soln., and (a-2.2) a low mol. organic cpd., which is rendered more soluble in an aq. alkaline developer by the action of an acid; (b) organic photo-acid(s); and opt. (c) organic cpd(s). other than (b). The novelty is that at least one of (a-1), (a-2.1), (a-2.2), (b) and (c) contains a gp. of formula -O N -R4 (I) or (c) is of formula O-CO-Ä(CH2Ün-CH2-N R3 (II); in which R = 1-6 C alkyl; n = 1-6.

公开(公告)号：DE59109026D1

公开(公告)日：1998-08-13

申请号：DE59109026

申请日：1991-10-04

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BINDER HORST

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

公开(公告)号：DE19534494A1

公开(公告)日：1997-03-20

申请号：DE19534494

申请日：1995-09-18

Applicant: BASF AG

Inventor： PAULUS WOLFGANG DR ,  BINDER HORST ,  ETZBACH KARL-HEINZ DR ,  SCHUHMACHER PETER DR ,  SIEMENSMEYER KARL DR ,  BLEYL INGO ,  HAARER DIETRICH PROF DR ,  MEYER HARALD DR ,  SIMMERER JUERGEN

IPC: C09K11/06 ,  C09K19/12 ,  C09K19/32 ,  C09K19/34 ,  C09K19/60 ,  H01L31/101 ,  H01L33/08 ,  H01L51/00 ,  H01L51/30 ,  H01L29/76 ,  H01L33/00

Abstract: Transistor has parallel planar source and drain electrodes (1, 2) which are 0.01-100 mu m apart, gate electrode(s) (3) which have the same dimensions as the source and drain electrodes and are placed parallel to and between them, and a layer (4) of discotic columnar liquid crystalline material (I) between the source and drain electrodes with the columnar axis oriented perpendicular to the surface of these electrodes. Also claimed is electronic or electro-optical equipment contg. this transistor.

公开(公告)号：DE59010241D1

公开(公告)日：1996-05-02

申请号：DE59010241

申请日：1990-12-05

Applicant: BASF AG

Inventor： BINDER HORST ,  SCHWALM REINHOLD DR

IPC: G03F7/32

公开(公告)号：DE4306069A1

公开(公告)日：1994-09-08

申请号：DE4306069

申请日：1993-03-01

Applicant: BASF AG

Inventor： FUNHOFF DIRK DR ,  SCHWALM REINHOLD DR ,  BINDER HORST

IPC: C08K5/375 ,  C08K5/42 ,  C09D125/02 ,  C09D125/18 ,  C09D143/04 ,  G03F7/004 ,  G03F7/029 ,  G03F7/032 ,  G03F7/039 ,  H01L21/027 ,  C08L25/18

Abstract: The invention relates to positive-working, radiation-sensitive mixtures essentially comprising (a1) an organic binder containing acid-labile groups which is insoluble in water, but becomes soluble in aqueous alkaline solutions on treatment with acid, or (a2.1) a polymeric binder which is insoluble in water, but soluble in aqueous alkaline solutions and (a2.2) an organic compound whose solubility in an aqueous alkaline developer is increased by treatment with acid, and (b) an organic compound which produces an acid on exposure to actinic radiation and which additionally contain (c) a strongly basic, organic compound containing hydroxyl, alkoxy or phenoxy anions. These mixtures are suitable for the production of relief structures of improved contrast.

公开(公告)号：DE4300209A1

公开(公告)日：1994-07-14

申请号：DE4300209

申请日：1993-01-07

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  FUNHOFF DIRK DR ,  BINDER HORST ,  SMUDA HUBERT DR

IPC: C08F4/32 ,  C08F8/00 ,  C08F8/04 ,  C08F8/14 ,  C08F12/00 ,  C08F12/24 ,  G03F7/027 ,  G03F7/032 ,  C08F8/12 ,  C08F12/22

公开(公告)号：DE58906664D1

公开(公告)日：1994-02-24

申请号：DE58906664

申请日：1989-05-10

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BINDER HORST ,  BOETTCHER ANDREAS DR

IPC: G03F7/004 ,  G03F7/039

Abstract: The invention relates to a radiation-sensitive mixture and to a process for the formation of relief patterns. The radiation-sensitive mixture contains (a) a polymeric binder which is insoluble in water and soluble in aqueous-alkaline solutions, and (b) an organic compound whose solubility in an aqueous-alkaline developer is increased by the action of acid and which contains at least one grouping cleavable by acid and additionally one grouping which forms a strong acid under the action of radiation, the polymeric binder (a) containing 5 to 35 mol% of copolymerised or co-condensed monomer units having acid-sensitive groupings, or the acid-sensitive groupings having been introduced by a polymer-analogous reaction. It is suitable for the formation of relief patterns.

公开(公告)号：DE3884505D1

公开(公告)日：1993-11-04

申请号：DE3884505

申请日：1988-07-21

Applicant: BASF AG

Inventor： STEININGER HELMUT DR ,  BINDER HORST

IPC: B41M5/26 ,  G11B7/24 ,  G11B7/241 ,  G11B7/244 ,  G11B7/246 ,  G11B7/253 ,  G11B7/2534 ,  G11B7/257 ,  G11B7/2578 ,  G11B7/26

Abstract: A recording material which has… a) a dimensionally stable, optically transparent substrate which is composed of plastics and has a structured surface,… b) an intermediate layer which is present thereon, is insoluble in organic solvents and acts as a diffusion barrier with respect to the latter and, on said intermediate layer,… c) an amorphous, thermally alterable recording layer which can be produced by application from a solution and drying and contains dyes, and the intermediate layer (b) of which… b1) is 5 to 95 nm thick and, based in each case on (b), consists of… b2) 88 to 99.5% by weight of oxides and/or hydrated oxides of one or more of the elements from the group consisting of titanium, zirconium, hafnium, thorium, vanadium, niobium, tantalum, tungsten, aluminium, gallium, indium, silicon, germanium and tin and of… b3) 0.5 to 12% by weight of hydrocarbon radicals, and… b4) can be produced by dissolving an alkoxide or several alkoxides of one or more of the above-mentioned elements in a polar liquid medium essentially containing C1- to C6-alkanols, applying this solution to the surface of the substrate (a) and heating the moist layer obtained in this manner in the presence of water at 50 to 120 DEG C for 5 minutes to 2 hours, and a process for the production of the recording material.