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102 records (took 0.022 seconds)

    62.
    发明专利
    未知

    公开(公告)号：AT175365T

    公开(公告)日：1999-01-15

    申请号：AT95103462

    申请日：1995-03-10

    Applicant: BASF AG

    Inventor： KELLER HARALD DR ,  HOFFMANN GERHARD DR ,  DENZINGER WALTER ,  FAESSLER RAINER DR

    IPC: B05D3/10 ,  B05D7/14 ,  C08L39/00 ,  C09D139/00 ,  C25D13/20

    Abstract: Method of modifying cleaned or chemically pre-treated metal surfaces with aq. solns. of organic polymers contg. amino gps. In an example, a sample of Mn-modified, low Zn content, phosphatised steel that had been cleaned with water was immersed for 60s in a 0.1 wt.% aq. polyvinylamine soln. at 50 deg.C, then after drying in air the sample was immersed for 5s in deionised water and then after drying in air again the sample was cathodically electro-plated in a bath according to the comparative example in German patent application DE4208056-A2. The sample was plated at 320-380 V to give a 23 micron thick coating, and then fired for 25 mins. at 165 deg.C. A 0.1 mm wide incision was made in the lacquered sample, extending down to the metal surface and the sample was sprayed for 15 days with aq. NaCl soln. (5 wt.%) at 40 deg.C (salt water spray test), whilst another sample was immersed for 10 days in an aq. NaCl soln. (5 wt.%) warmed to 55 deg.C (salt water soak test). No rust was observed for the soak test, whilst only a slight amt. of rust was observed for the spray test.

    68.
    发明专利
    未知

    公开(公告)号：DE3837438A1

    公开(公告)日：1990-05-10

    申请号：DE3837438

    申请日：1988-11-04

    Applicant: BASF AG

    Inventor： NGUYEN KIM SON DR ,  HOFFMANN GERHARD DR ,  SCHWALM REINHOLD DR

    IPC: G03F7/039 ,  G03F7/004 ,  H01L21/027 ,  H01L21/30

    Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions, (b) a compound which upon irradiation forms a strong acid and (c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions, where the organic compound (c) is a malonic acid ester. This radiation-sensitive mixture may be used to prepare photoresists.

    PROCESS FOR OBTAINING POSITIVE RELIEF AND PRINTING FORMES
    69.
    发明专利
    PROCESS FOR OBTAINING POSITIVE RELIEF AND PRINTING FORMES 未知

    公开(公告)号：DE3380601D1

    公开(公告)日：1989-10-26

    申请号：DE3380601

    申请日：1983-12-20

    Applicant: BASF AG

    Inventor： BRONSTERT BERND DR ,  HOFFMANN GERHARD DR ,  LYNCH JOHN DR

    IPC: G03C1/72 ,  G03F7/004 ,  G03F7/031 ,  G03F7/105 ,  G03F7/26 ,  G03F7/02

    Abstract: Relief plates and printing plates are produced by a positive-working process, using a photopolymerizable layer which contains one or more photopolymerizable, olefinically unsaturated compounds, one or more photoinitiators which can be activated by UV light, and a combination of a phenothiazinium, phenoxazinium, phenazinium or acridinium dye with a mild reducing agent which, on exposure to visible light, is capable of reducing the dye in the excited electronic state. The photopolymerizable layer is exposed imagewise to light having a wavelength longer than 450 nm, and simultaneously or subsequently exposed uniformly to light having a wavelength of from 300 to 420 nm, after which the unpolymerized areas of the layer are removed.

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