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    Multiple-detector system for detecting charged particles
    62.
    发明公开
    Multiple-detector system for detecting charged particles 失效
    Mehrdetektorsystemfürdie Detektion geladener Partikel。

    公开(公告)号：EP0611169A1

    公开(公告)日：1994-08-17

    申请号：EP94301048.8

    申请日：1994-02-14

    Applicant: FISONS plc

    Inventor： Freedman, Philip Antony ,  Hall, Edward Francis Henry

    IPC: H01J49/02 ,  H01J3/04 ,  H01J43/04

    CPC classification number: H01J43/045 ,  H01J49/025

    Abstract: A multiple charged-particle detector system includes a plurality of charged-particle detector assemblies (10-12) which are each made up of a first arm (19-22) and a second arm (24-27) extending at an angle to each other. Charged particles (4-7) enter an aperture (14-18) at the entrance of the first arm (19-22) of each detector assembly (10-12) and strike a dynode (30-33) positioned at the intersection of the two arms causing electrons to be emitted by the dynode (30-33). Some of the electrons pass into the second arms (24-27) of the detector assemblies (10-12) and are detected by a continuous-dynode electron multiplier (35-38). The first arms (19-22) are narrower than the detectors (35-38), and the detector assemblies (10-12) are arranged in such a way that the minimum separation at which charged-particle beams (4-7) can be detected is determined by the widths of the said first arms (19-22) of the detector assemblies (10-12), and not by the widths of the detectors (35-38) themselves.

    Abstract translation: 多个带电粒子检测器系统包括多个带电粒子检测器组件（10-12），每个带电粒子检测器组件由第一臂（19-22）和第二臂（24-27）构成，第一臂（19-22）和第二臂 其他。 带电粒子（4-7）在每个检测器组件（10-12）的第一臂（19-22）的入口处进入孔（14-18），并且撞击位于相交处的倍增极（30-33） 两臂引起电子由倍增极发射（30-33）。 一些电子进入检测器组件（10-12）的第二臂（24-27），并由连续的倍增电极倍增器（35-38）检测。 第一臂（19-22）比检测器（35-38）窄，并且检测器组件（10-12）以使得带电粒子束（4-7）的最小间隔可以 被检测由检测器组件（10-12）的所述第一臂（19-22）的宽度确定，而不是由检测器（35-38）本身的宽度确定。

    ION SOURCE WITH SUBSTANTIALLY PLANAR DESIGN
    65.
    发明申请
    ION SOURCE WITH SUBSTANTIALLY PLANAR DESIGN 审中-公开
    离子源与大规模平面设计

    公开(公告)号：WO2006055296A3

    公开(公告)日：2006-08-31

    申请号：PCT/US2005040159

    申请日：2005-11-07

    Applicant: GUARDIAN INDUSTRIES ,  LUTEN HENRY A ,  VEERASAMY VIJAYEN S

    Inventor： LUTEN HENRY A ,  VEERASAMY VIJAYEN S

    IPC: H01J27/14 ,  H01J3/04 ,  H01J37/08

    CPC classification number: H01J37/08 ,  H01J3/04 ,  H01J27/143

    Abstract: In certain example embodiments of this invention, there is provide an ion source including an anode (25) and a cathode (5). In certain example embodiments, the cathode does not overhang over the anode, or vice versa. Since no, or fewer, areas of overhang are provided between the anode and cathode, there is less undesirable build-up on the anode and/or cathode during operation of the ion source so that the source can run more efficiently. Moreover, in certain example embodiments, an insulator (35) such as a ceramic or the like is provided between the anode and cathode.

    Abstract translation: 在本发明的某些示例实施例中，提供了包括阳极（25）和阴极（5）的离子源。 在某些示例性实施例中，阴极不会悬在阳极上，反之亦然。 由于在阳极和阴极之间没有或更少的突出区域被提供，所以在离子源操作期间在阳极和/或阴极上的不希望的积聚较少，使得源可以更有效地运行。 此外，在某些示例性实施例中，在阳极和阴极之间提供诸如陶瓷等的绝缘体（35）。

    PLASMA ION SOURCE AND METHOD
    66.
    发明申请
    PLASMA ION SOURCE AND METHOD 审中-公开
    等离子体源和方法

    公开(公告)号：WO01093293A1

    公开(公告)日：2001-12-06

    申请号：PCT/RU2001/000060

    申请日：2001-02-14

    IPC: H01J3/04 ,  F03H1/00 ,  H01J37/08

    CPC classification number: H01J27/024 ,  H01J27/14 ,  H01J37/08

    Abstract: A plasma ion source comprises a cathode chamber (1) with a gas input unit (2). A hollow cathode (3) forming an anode chamber (4) is connected with the cathode chamber (1) via the outlet made in the wall of the latter. The ion source structure includes an electrostatic system of ion extraction with an emission electrode (5) fixed in the anode chamber (4) outlet. With the help of a magnetic system, in the cathode (1) and anode (4) chambers the magnetic field is created with the induction vector of a preferably axial direction. An ignition electrode electrically connected with the hollow anode (3) is fixed in the cathode chamber (1). An additional electrode (10) is mounted in the outlet of the cathode chamber (1), which is insulated from the hollow anode (3) and the cathode chamber (1). The additional electrode (10) has an axial orifice with a diameter much smaller than the maximum internal cross section of the hollow anode (3). The electrical discharge between the cathode (1) and anode (4) chambers is ignited through the orifice. A particular ion source configuration and the oparation method correspond to the present invention and ensure increased energy and gas efficiency and high degree of uniformity of the generated ion current density.

    Abstract translation: 等离子体离子源包括具有气体输入单元（2）的阴极室（1）。 形成阳极室（4）的空心阴极（3）通过在后壁的壁上形成的出口与阴极室（1）连接。 离子源结构包括具有固定在阳极室（4）出口中的发射电极（5）的离子提取的静电系统。 借助于磁性系统，在阴极（1）和阳极（4）室中，以优选的轴向方向的感应矢量产生磁场。 与中空阳极（3）电连接的点火电极固定在阴极室（1）中。 附加电极（10）安装在阴极室（1）的出口处，其与中空阳极（3）和阴极室（1）绝缘。 附加电极（10）具有直径远小于中空阳极（3）的最大内部截面的直径的轴向孔。 阴极（1）和阳极（4）室之间的放电通过孔被点燃。 特定的离子源构造和制备方法对应于本发明，并且确保提高的能量和气体效率以及所产生的离子电流密度的高度均匀性。

    Apparatus for ion implantation
    70.
    发明公开
    Apparatus for ion implantation 失效
    离子注入装置

    公开(公告)号：EP0145120A1

    公开(公告)日：1985-06-19

    申请号：EP84305547.6

    申请日：1984-08-15

    Applicant: APPLIED MATERIALS, INC.

    Inventor： Aitken, Derek

    IPC: H01J37/08 ,  H01J3/04

    CPC classification number: H01J49/30 ,  H01J27/022 ,  H01J27/028 ,  H01J27/14 ,  H01J37/05 ,  H01J37/08 ,  H01J37/3171

    Abstract: The disclosure relates to a system for implanting ions into a target element including a source arrangement (230) for producing an ion beam; a beam analyzing arrangent for receiving the ion beam and selectively separating various ion species in the beam on the basis of mass to produce an analyzed beam; and a beam resolving arrangent disposed in the path of the analyzed beam for permitting a preselected ion species to pass to the target element. The ion source arrangement (230) comprises an arc chamber (230C) having an elongate exit aperture (232), and an elongate filament-cathode (230D). Bias and operating potentials are provided for the source arrangement and gaseous material to be ionized is supplied to the chamber. The ion source (230) utilises an electromagnet arrangement (280) having poles (281) aligned with the source filament (230D) for causing the electrons emitted by the filament to spiral around and create ions of the gaseous material supplied to the chamber (230C) and to compensate for non-uniformity in the ion beam emitted along the chamber, current to the field coils of the magnet for each pole is controlled independently.

    Abstract translation: 本公开涉及一种用于将离子注入到目标元件中的系统，该系统包括用于产生离子束的源装置（230） 光束分析装置，用于接收离子束并基于质量选择性地分离光束中的各种离子种类以产生分析光束; 以及布置在分析光束的路径中的光束分辨布置，用于允许预选择的离子物质传递到目标元件。 离子源装置（230）包括具有细长出口孔（232）的电弧室（230C）和细长灯丝 - 阴极（230D）。 为源设置提供偏置和操作电位，并且将要离子化的气态材料提供给室。 离子源（230）利用具有与源丝（230D）对准的极（281）的电磁体布置（280），用于使得由丝发射的电子旋转并产生供应到腔室（230C）的气态材料的离子 ）并且补偿沿腔室发射的离子束中的不均匀性，独立地控制到每个磁极的磁体的励磁线圈的电流。

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