公开(公告)号：JPH0278215A

公开(公告)日：1990-03-19

申请号：JP22838788

申请日：1988-09-14

Applicant: CANON KK

Inventor： SHIMODA ISAMU ,  MIZUSAWA NOBUTOSHI ,  UDA KOJI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To suppress an irregularity in a line width of a pattern and to reduce a stroke of a shifting stage by a method wherein an exposure operation is executed by correcting the following: a change in a quantity of light with the passage of time of a light source; a change in a transmission factor with the passage of time of a lens and a photomask. CONSTITUTION:A shifting-stage drive circuit 113 is operated according to an instruction from a control circuit 111; a shifting stage 3 is shifted to an exposure position of a water 2. Then, a slit width of a slit shutter 81 is set for wafer exposure use by using a shutter drive circuit 112; a slit exposure operation is executed. During this process, the slit width and a shifting velocity of the stage 3 are calculated by the circuit 111 according to an output, of a photosensor 12 on the stage 3, which has been obtained during a measuring operation of a light intensity; an exposure amount is increased by widening the slit width or by slowing the shifting velocity; a shortage of the exposure amount with the passage of time is supplemented. In this manner, a spread of a luminous flux is made different from that during the exposure operation; the luminous flux is shifted in synchronization with a shift of the stage 3.

公开(公告)号：JPH0277627A

公开(公告)日：1990-03-16

申请号：JP22838988

申请日：1988-09-14

Applicant: CANON KK

Inventor： AMAMIYA MITSUAKI ,  TERAJIMA SHIGERU ,  SHIMODA ISAMU ,  UZAWA SHUNICHI ,  KARIYA TAKUO

IPC: G01J1/02 ,  G01T1/29 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To measure the exposure distribution on the surface of a wafer within a short time with high accuracy by detecting the difference between the intensity of the light transmitting through the first filter and that of the light transmitting through the second filter. CONSTITUTION:A stage 11 is moved so that an X-ray detector 4 comes to a predetermined exposure position so set the first filter 1 above the detector 4 and an X-ray mirror 10 is subsequently shaken so that X-rays 8 pass above the detector 4 and the intensity of X-rays 8 is measured through the filter 1 to set the output thereof to I1. Next, a filter holder 3 is rotated by a holder driving part 5 so that the second filter 2 is positioned above the detector 4 and the intensity of X-rays is measured through the filter 2 to set the output thereof to I2. Then, the difference between I1, I2 is calculated to be set to the X-ray intensity data at that position. Next, the stage 11 is moved and this process is successively repeated to calculate X-ray intensity data at all of exposure positions.

公开(公告)号：JPH0276213A

公开(公告)日：1990-03-15

申请号：JP22738888

申请日：1988-09-13

Applicant: CANON KK

Inventor： KUROSAWA HIROSHI ,  UDA KOJI ,  OZAWA KUNITAKA ,  KOBAYASHI MAKIKO ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To compensate driving profile without deteriorating processing capacity of a controller and to make an exposure amount uniform at an exposure surface by measuring an absolute intensity of an exposure light source and by expanding a time axis of a fixed driving profile proportionally in accordance with change of the intensity. CONSTITUTION:During actual exposure, a table for shutter driving is made to acquire a necessary exposure distribution from storage content of a memory 418, and transferred inside RAM in pulse generators 407, 408 and then driven. Illuminance is measured by a sensor 104 just before shot exposure. If, for example, a light intensity of an exposure light source is in decay compared with the last shot, the driving table is corrected through formula manipulation by a main controller 419, and driving profile is modified to obtain a desired optimum exposure distribution. According to this constitution, an optimum exposure distribution can be acquired constantly in rapid response to intensity change of a light source only by expanding and contracting the time axis of a profile which is once made.

公开(公告)号：JPH0276212A

公开(公告)日：1990-03-15

申请号：JP22738788

申请日：1988-09-13

Applicant: CANON KK

Inventor： KOBAYASHI MAKIKO ,  OZAWA KUNITAKA ,  UDA KOJI ,  SAKAMOTO EIJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: G03F1/76 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To improve accuracy of pattern printing to a wafer by providing exposure downtime in the middle of exposure so that a temperature of a mask or a wafer does not exceed a possible temperature range of exposure which is regulated based on a printing line width, etc., and by carrying out exposure again after heat dissipation. CONSTITUTION:A mask 1 and a wafer 2 are aligned, and exposure of one shot is made and a timer is started simultaneously. Temperature sensors 5, 6 are monitored which are provided on a mask stage 3 and a wafer stage 4, and exposure is continued. If a temperature is not in a good temperature range, a shutter 8 is shut to interrupt exposure and the timer is stopped. Heat which is stored in the mask 1 and the wafer 2 during exposure downtime is emitted. When a temperature lowers to some extent, exposure is started again. These procedures are repeated, and when accumulating totals of exposure time attains a time necessary for one shot, one shot exposure is finished. According to this constitution, long time X-ray exposure is possible while a temperature of a mask and a wafer are kept in an optimum temperature range, thus realizing fine and precision printing which enhances characteristics of short wavelength of X-ray.

公开(公告)号：JPH0273617A

公开(公告)日：1990-03-13

申请号：JP22471288

申请日：1988-09-09

Applicant: CANON KK

Inventor： MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  KARIYA TAKUO ,  SHIMODA ISAMU

IPC: H01L21/30 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To set the moving region of an alignment unit and a screen size to minimum limits, and to increase the mounting region of other component by setting the length of a direction perpendicular to and parallel to the edge of a blade to a predetermined length in response to maximum/minimum exposure screen angle. CONSTITUTION:The length of a blade BLD in a direction perpendicular to an edge for specifying the screen of the blade is increased slightly larger than (lEX-lmin)/2, where lEX is the direction of a screen sufficiently necessary to radiate at the maximum exposure screen angle, and lmin is the length of the minimum exposure screen angle. The length of the blade BLD of a direction along the edge is slightly increased larger than lmax+lSTG, where lSTG is the distance of an alignment unit AAU for detecting the deviation of an alignment mark on a wafer and an alignment mark AMK on a mask MSK moving in a direction along the edge, and lmax is the maximum exposure screen angle of this aligner. Thus, the moving region and screen size of the unit AAU are minimized to increase the mounting region of other components.

公开(公告)号：JPH0272650A

公开(公告)日：1990-03-12

申请号：JP22348488

申请日：1988-09-08

Applicant: CANON KK

Inventor： KUNO MITSUTOSHI ,  MARUMO KOJI ,  UDA KOJI ,  OZAWA KUNITAKA ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: H05K13/02 ,  H01L21/68

Abstract: PURPOSE:To prevent breakdown of wafers an contact conveyance of a carrier and the wafer by detecting the attitude state of the wafer with a presence- absence sensor and distance measuring sensor when the wafer is taken out of the carrier. CONSTITUTION:A wafer hand 3 holding wafers 2a-2c and the like is provided in order to take out and convey the wafers 2a-2c and the like which are housed in a wafer carrier 1. A wafer presence-or-absence sensor 4 such as an electrostatic capacitance sensor detects the presence or absence of the wafer at the specified wafer housing position among the wafer housing positions in the carrier 1. A distance measuring sensor 5 measures a distance to the wafer which is detected with the presence-absence sensor 4 at the other specified position with respect to the presence-absence sensor 4. When the wafers 2a-2c are conveyed out of the carrier 1, the attitude states of the wafers 2a-2c are detected with the presence-or-absence sensor 4 and the distance measuring sensor 5. In this way, risks of contact between the carrier 1 and the wafers 2a-2c and the like caused by manufacturing errors, deformation and the like of the carrier 1 can be prevented, and the conveyance to the outward can be performed.

公开(公告)号：JPH0272612A

公开(公告)日：1990-03-12

申请号：JP22348388

申请日：1988-09-08

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  AMAMIYA MITSUAKI ,  UDA KOJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To enable high measurement accuracy by installing a semiconductor sensor behind an exposure shutter, and opening or closing this shutter during measurement and synchronizing it with the opening and closing of this shutter so as to obtain the output of a semiconductor sensor to calculate the illuminance of the exposing light. CONSTITUTION:When measuring the illuminance of X-rays, first a stage 107 is shifted to the outside of the opening of an aperture 107 so that a wafer 108 on the stage 107 may not be irradiated with X-rays. Next, when a shutter 101 is moved right and left at high speed, pulse currents are obtained from a sensor 103, and AC component can be obtained by synchronizing it with the driving period of the shutter 101 at a signal processing part 112, and the fluctuating component of the dark current is canceled and accurate X-rays intensity can be measured. Hereby, exposure illuminance can be measured in high accuracy.

公开(公告)号：JPH0267903A

公开(公告)日：1990-03-07

申请号：JP21852388

申请日：1988-09-02

Applicant: CANON KK

Inventor： ABE NAOTO ,  UDA KOJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI ,  NOSE TETSUSHI

IPC: G01B11/00 ,  G01D5/26 ,  G03F9/00 ,  H01L21/68 ,  H01L31/12 ,  H01L33/00 ,  H01S5/06 ,  H01S5/062 ,  H01S5/0683

Abstract: PURPOSE:To optimally control illumination time by a method wherein time from starting of photoelectric conversion of a photoelectric conversion element to termination of illumination of a light emitting element is made variable so that the amount of light beam entering the photoelectric conversion element is controlled. CONSTITUTION:Light emitted from a semiconductor laser 101 driven by an LD driver 102 is received by an accumulation-type line sensor 104 via an optical system 103. Then the output of the sensor 104 is processed by a signal processor 106 to have the center of gravity, etc. of a beam having positional information calculated. Frequency of a line sensor driver 105 which specifies accumulation time, etc. of the driver 102 and the sensor 104 is counted by a timing circuit 107. Further, time of lighting and extinguishing of illumination of the laser 101 is controlled by the circuit 107. The efficient amount of the beam entering the sensor 104 can be therefore controlled to an optimal value.

公开(公告)号：JPH01292310A

公开(公告)日：1989-11-24

申请号：JP12362488

申请日：1988-05-19

Applicant: CANON KK

Inventor： MINOURA KAZUO ,  SHIMODA ISAMU

IPC: B41J2/44 ,  G02B26/10 ,  G06K15/12 ,  H04N1/113 ,  H04N1/23

Abstract: PURPOSE:To easily detect the deviation in a focal position with simple constitution by scanning a light beam plural times on a detector while moving the focusing position thereof, then subjecting the detection signal of every scanning to relational computation. CONSTITUTION:The light beam from a light source 1 scans the surface of a drum 6 of a photosensitive recording body via a rotary polyhedral mirror 3 and a scanning lens system 5. The spot detector 7 having one aperture 12 in the position optically equiv. with the scanning plane with respect to the light source in order to detect the focusing state of the light beam on the scanning plane. The lens light beam is then scanned plural times in directions AB on the detector 7 while a lens system 2 is moved by a focal position moving mechanism to move the focusing position. The signal 14 of the detector 7 at every scanning is subjected to the relational computation in a detection signal processing part 8. A control part 9 generates the signal for driving the lens system 2 according to the output signal of the processing part 8 and moves the focal position. The focusing position of the beam is thus adjusted.

公开(公告)号：JPH01149348A

公开(公告)日：1989-06-12

申请号：JP30829587

申请日：1987-12-05

Applicant: CANON KK

Inventor： KUMOMI HIDEYA ,  YONEHARA TAKAO ,  NISHIGAKI YUJI ,  YAMAGATA KENJI ,  SUZUKI AKIRA ,  SHIMODA ISAMU ,  KANEKO TETSUYA ,  TSUKAMOTO TAKEO ,  TAKEDA TOSHIHIKO ,  OKUNUKI MASAHIKO ,  ICHIKAWA TAKESHI

IPC: C30B29/06 ,  H01J1/304 ,  H01J9/02 ,  H01L21/20

Abstract: PURPOSE:To improve the conductivity of an electrode by forming electrode for emission of electrons with a mono-crystal having a point surrounded by a facet consisting of specific crystal surfaces. CONSTITUTION:An electrode for emission of electrons is formed from a mono- crystal 74 having a point 75 surrounded by a facet consisting of specific crystal surfaces 76, 77 and obtained through growth of a seed mono-crystal 73 having specific plane azimuth upon heat treatment, which is arranged on a base 71. This is further provided with an insulating material having an opening with the electrode point 75 as the center, a pullout electrode installed on this insulating material and furnished near the point 75, and a means to impress voltage between electrode having point 75 and the pullout electrode. This prevents dispersion in electrode shapes having the point 75 as electron emitting part and improves the performance.