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公开(公告)号：EP1535712B1
公开(公告)日：2009-01-14
申请号：EP03354086.5
申请日：2003-11-28
Applicant: Xenocs S.A.
Inventor： Hoghoj, Peter , Siebrecht, Ralf , Rodrigues, Sergio
CPC classification number: B29C33/56 , B29C33/3878 , B29C33/58 , B29C33/62 , B29C39/126 , B29K2995/0073
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82.发明公开
公开(公告)号：EP1397813A2
公开(公告)日：2004-03-17
申请号：EP02740845.9
申请日：2002-05-31
Applicant: Xenocs
Inventor： HOGHOJ, Peter
CPC classification number: G02B5/0883 , B82Y10/00 , B82Y40/00 , G02B5/1838 , G02B5/26 , G02B5/283 , G03F1/24 , G03F1/26 , G03F7/70058 , G03F7/70958 , G21K1/06
Abstract: One aspect of the invention relates to a multi-layered reflective optical system for the reflection of X rays at a low angle of incidence, producing a two-dimensional optical effect. The inventive optical system comprises: a component having a surface which is reflective in such a way that a first optical effect is produced according to a first direction in space; and means for producing a second optical effect according to a second direction in space which is different from the first direction, characterized in that said means for producing a second optical effect are borne by the reflective surface. A second aspect of the invention relates to a method for the production of said optical system.
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公开(公告)号：EP3612821B1
公开(公告)日：2021-07-07
申请号：EP19723137.6
申请日：2019-05-15
Inventor： HØGHØJ, Peter , LANTZ, Blandine , JOENSEN, Karsten , SKOU, Søren
IPC: G01N23/201
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公开(公告)号：EP2075569B1
公开(公告)日：2012-02-15
申请号：EP07291646.3
申请日：2007-12-31
Applicant: Xenocs S.A.
Inventor： Lantz, Blandine , Hoghoj, Peter
IPC: G01N23/20
CPC classification number: G01N23/20008 , G21K2201/062
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公开(公告)号：EP1514279B1
公开(公告)日：2009-01-14
申请号：EP03760747.0
申请日：2003-06-19
Applicant: Xenocs
Inventor： HOGHOJ, Peter , DARIEL, Aurélien , RODRIGUES, Sergio
CPC classification number: B82Y10/00 , G21K1/06 , G21K2201/061 , G21K2201/062 , G21K2201/064
Abstract: The invention relates to an optical device which is intended to process an incident X-ray beam. The inventive device comprises: a monochromator; and an optical incident beam-conditioning element with a reflecting surface which can produce a bi-dimensional optical effect in order to adapt a beam directed towards the monochromator, the aforementioned optical element comprising a multi-layered, X-ray-reflecting surface. The invention is characterised in that the reflecting surface comprises a single surface, said reflecting surface being curved in two different directions.
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Patent Agency Ranking86.发明公开A method for producing a replication master, replication method and replication master 有权一种生成复制主文件，复制方法和复制主文件的方法
公开(公告)号：EP1535712A1
公开(公告)日：2005-06-01
申请号：EP03354086.5
申请日：2003-11-28
Applicant: Xenocs S.A.
Inventor： Hoghoj, Peter , Siebrecht, Ralf , Rodrigues, Sergio
CPC classification number: B29C33/56 , B29C33/3878 , B29C33/58 , B29C33/62 , B29C39/126 , B29K2995/0073
Abstract: In a method for producing a replication master (10) having a surface with low roughness, comprising the steps of forming said master (10) such as to have a desired external surface shape corresponding to a counterform of a surface of an object (18, 20) to be produced by replication and treating said external surface of said master (10) to obtain a predetermined surface roughness value, it is proposed that said method furthermore comprises the step of coating at least a part of said master (10) with a smoothening layer (16). The invention further relates to a replication master (10) for producing a smooth object (18, 20) having a low surface roughness, wherein at least a part of said master (10) is coated with a smoothening layer (16).
Abstract translation: 在用于制造具有低粗糙度表面的复制母版（10）的方法中，包括以下步骤：形成所述母版（10）以具有与对象（18）的表面的对应形状相对应的期望外表面形状， 20）通过复制和处理所述母模（10）的所述外表面以获得预定的表面粗糙度值而生产，建议所述方法还包括以下步骤：在所述母模（10）的至少一部分上涂覆 平滑层（16）。 本发明还涉及一种用于产生具有低表面粗糙度的光滑物体（18,20）的复制母盘（10），其中所述母盘（10）的至少一部分涂覆有平滑层（16）。
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公开(公告)号：EP2176877B1
公开(公告)日：2012-02-22
申请号：EP08828039.1
申请日：2008-07-02
Applicant: Xenocs
Inventor： HOGHOJ, Peter , BOULEE, Pascal , NTOVA, Paraskevi , RODRIGUES, Sergio
CPC classification number: H01J35/10 , B82Y10/00 , G21K2201/061 , G21K2201/064 , H01J35/14 , H01J35/20
Abstract: The invention relates to X-ray analytical instruments (RX), more precisely a device for providing a high energy X-ray beam, typically above 4 keV, for X-ray analysis applications. The device comprises an X-ray tube with a turning anode and an X-ray lens for shaping the beam.
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公开(公告)号：EP2075569A1
公开(公告)日：2009-07-01
申请号：EP07291646.3
申请日：2007-12-31
Applicant: Xenocs S.A.
Inventor： Lantz, Blandine , Hoghoj, Peter
IPC: G01N23/20
CPC classification number: G01N23/20008 , G21K2201/062
Abstract: The invention refers to an X-ray beam device for X-ray analytical applications, comprising an X-ray source designed such as to emit a divergent beam of X-rays; and an optical assembly designed such as to focus said beam onto a focal spot, wherein said optical assembly comprises a first reflecting optical element, a monochromator device and a second reflecting optical element sequentially arranged between said source and said focal spot, wherein said first optical element is designed such as to collimate said beam in two dimensions towards said monochromator device, and wherein said second optical element is designed such as to focus the beam coming from said monochromator device in two dimensions onto said focal spot.
Abstract translation: 本发明涉及用于X射线分析应用的X射线束装置，其包括设计成发射X射线发散束的X射线源; 以及设计成将所述光束聚焦到焦斑上的光学组件，其中所述光学组件包括顺序地布置在所述光源和所述焦点之间的第一反射光学元件，单色器装置和第二反射光学元件，其中所述第一光学 元件被设计成使得所述光束在二维上朝向所述单色仪装置校准，并且其中所述第二光学元件被设计成将来自所述单色仪装置的光束二维聚焦在所述焦斑上。
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89.发明授权
公开(公告)号：EP1397813B1
公开(公告)日：2008-06-04
申请号：EP02740845.9
申请日：2002-05-31
Applicant: Xenocs
Inventor： HOGHOJ, Peter
CPC classification number: G02B5/0883 , B82Y10/00 , B82Y40/00 , G02B5/1838 , G02B5/26 , G02B5/283 , G03F1/24 , G03F1/26 , G03F7/70058 , G03F7/70958 , G21K1/06
Abstract: One aspect of the invention relates to a multi-layered reflective optical system for the reflection of X rays at a low angle of incidence, producing a two-dimensional optical effect. The inventive optical system comprises: a component having a surface which is reflective in such a way that a first optical effect is produced according to a first direction in space; and means for producing a second optical effect according to a second direction in space which is different from the first direction, characterized in that said means for producing a second optical effect are borne by the reflective surface. A second aspect of the invention relates to a method for the production of said optical system.
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公开(公告)号：EP1732087A3
公开(公告)日：2007-03-28
申请号：EP06120020.0
申请日：2003-06-19
Applicant: Xenocs
Inventor： Hoghoj, Peter , Dariel, Aurélien , Rodrigues, Sergio
IPC: G21K1/06
CPC classification number: B82Y10/00 , G21K1/06 , G21K2201/061 , G21K2201/062 , G21K2201/064
Abstract: La présente invention concerne un ensemble optique réflectif multicouche (10) à gradient latéral dont la surface réfléchissante est destinée à réfléchir des rayons X incidents sous faible angle d'incidence en produisant un effet optique bidimensionnel, caractérisé par le fait que ladite surface réfléchissante est constituée d'une surface unique, ladite surface réfléchissante étant conformée selon deux courbures correspondant à deux directions différentes caractérisé en ce que la surface réfléchissante a un rayon de courbure saggitale inférieur à 20 mm.
La présente invention concerne également un procédé de fabrication d'un tel ensemble optique, caractérisé en ce que le procédé comprend le revêtement d'un substrat présentant déjà une courbure, et la courbure de ce substrat selon une deuxième direction différente.
L'invention concerne enfin un dispositif de génération et de conditionnement de rayons X pour des applications de réflectométrie RX dispersive en angle comprenant un ensemble optique tel que mentionné ci-dessus couplé à une source rayons X de telle sorte que les rayons X émis par la source sont conditionnés en deux dimensions afin d'adapter le faisceau émis par la source à destination d'un échantillon, les rayons X ayant des angles d'incidences différents sur l'échantillon considéré.
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