Capacitors with nanoislands on conductive plates

    公开(公告)号:US11855125B2

    公开(公告)日:2023-12-26

    申请号:US16560647

    申请日:2019-09-04

    CPC classification number: H01L28/60 H01G4/008 H01G4/1209 H01G4/28 H01L21/4846

    Abstract: Embodiments herein relate to a capacitor device or a manufacturing process flow for creating a capacitor that includes nanoislands within a package. The capacitor a first conductive plate having a first side and a second side opposite the first side and a second conductive plate having a first side and a second side opposite the first side where the first side of the first conductive plate faces the first side of the second conductive plate. A first plurality of nanoislands is distributed on the first side of the first conductive plate and a second plurality of nanoislands is distributed on the first side of the second conductive plate, where the first conductive plate, the second conductive plate, and the first and second pluralities of nanoislands form a capacitor. The nanoislands may be applied to the conductive plates using a sputtering technique.

    Hybrid fine line spacing architecture for bump pitch scaling

    公开(公告)号:US11694898B2

    公开(公告)日:2023-07-04

    申请号:US16363688

    申请日:2019-03-25

    CPC classification number: H01L21/2815 H01L21/4853 H01L24/17 H01L2224/17051

    Abstract: Embodiments disclosed herein include electronic packages and methods of forming such packages. In an embodiment, an electronic package comprises a package substrate, a first die over the package substrate, the first die having a first bump pitch, a second die over the package substrate, the second die having a second bump pitch that is greater than the first bump pitch, and a plurality of conductive traces over the package substrate, the plurality of conductive traces electrically coupling the first die to the second die. In an embodiment, a first end region of the plurality of conductive traces proximate to the first die has a first line space (L/S) dimension, and a second end region of the plurality of conductive traces proximate to the second die has a second L/S dimension. In an embodiment, the second L/S dimension is greater than the first L/S dimension.

    MULTI-STEP ISOTROPIC ETCH PATTERNING OF THICK COPPER LAYERS FOR FORMING HIGH ASPECT-RATIO CONDUCTORS

    公开(公告)号:US20220199427A1

    公开(公告)日:2022-06-23

    申请号:US17132282

    申请日:2020-12-23

    Abstract: An integrated circuit device, comprising a substrate comprising a dielectric material and a conductor on or within the dielectric material of the substrate. The conductor comprises a first portion comprising a first sloped sidewall, wherein a first base width of the first portion is greater than a first top width of the first portion. The conductor also comprises a second portion over the first portion, the second portion comprising a second sloped sidewall, wherein a second base width of the upper portion is greater than both a second top width of the second portion and the first top width of the first portion.

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