公开(公告)号：KR1020140111593A

公开(公告)日：2014-09-19

申请号：KR1020140023911

申请日：2014-02-28

Applicant: 도쿄엘렉트론가부시키가이샤

Inventor： 미즈노츠요시 ,  도쿠나가요이치 ,  남바히로미츠 ,  우에키다츠히로 ,  노가미준 ,  히가시지마지로 ,  아마노요시후미 ,  미야마다카토시

IPC: H01L21/302 ,  H01L21/027

CPC classification number: H01L21/67051

Abstract: An objective of the present invention is to smoothly process a substrate by a processing liquid. The present invention provides a substrate processing apparatus (1) and a substrate processing method, which process a substrate (3) by a processing liquid supplied to the rotating substrate (3) to process the substrate (3), includes: a substrate rotating unit (12) that rotates the substrate (3); processing liquid supply units (13, 14) that supply the processing liquid to the substrate; a collection cup (32) disposed around the substrate (3) to collect the processing liquid supplied to the substrate (3) and form an air stream that flows downward by passing through from an opening (34) formed at the top to the periphery end of the substrate (3); and a negative pressure generating unit (36) which is provided at the inside of the collection cup (32) and at the outside of the opening (34) and generates a negative pressure which acts toward the outside of the substrate (3) so that the negative pressure is generated when processing the substrate (3) by the processing liquid.

Abstract translation: 本发明的目的是通过处理液体平滑地处理衬底。 本发明提供一种基板处理装置（1）和基板处理方法，其通过供给到旋转基板（3）的处理液对基板（3）进行处理，从而对基板（3）进行处理，其特征在于，包括：基板旋转部 （12），其旋转所述基板（3）; 将处理液供给到基板的处理液供给单元（13,14） 设置在所述基板（3）周围的收集杯（32），以收集供给到所述基板（3）的处理液体，并且形成通过从形成在所述顶部的开口（34）穿过的周向端部 的基板（3）; 以及负压生成单元（36），其设置在所述收集杯（32）的内部并且在所述开口（34）的外部，并且产生朝向所述基板（3）的外侧作用的负压，使得 当通过处理液体处理基板（3）时产生负压。