Abstract:
A CMP slurry composition according to the present invention includes ceria particles and deionized water. The ceria particles include pulverized matters of synthetic colloidal ceria particles. Less than 90% of the entire ceria particles have a hexagonal cross-section, and more than 10% of the particles have acute inside angles. Moreover, the surface potential of the ceria particles is 0-50 mV, and an average diameter is 50-130 nm, while having a specific surface area of 15.5-30 m2/g.
Abstract:
0.01~20.0중량%의 연마제; 0.01~10.0중량%의 산화제; 0.001~10.0중량%의 부식억제제; 0.1~10.0중량% 첨가되고 두 종류의 디카르복시산들을 혼합한 착화제; 및 50~99중량%의 탈이온수를 포함하는 화학기계적연마 조성물 및 이를 이용한 화학기계적연마 방법을 제시한다.
Abstract:
본 발명은 텅스텐 금속막질의 연마 속도에 대한 절연층 막질의 연마 속도의 비를 특정 비율로 조절함으로써 프로트루젼, 단차, EOE, 스크래치, 디싱, SEAM attack, 이로젼 등의 결함을 제거하고 평탄도를 높일 수 있는 CMP 슬러리 조성물 및 이를 이용한 연마 방법에 관한 것이다.
Abstract:
Provided is a flame retardant thermoplastic resin composition which is excellent in weather resistance and flame retardancy without the deterioration of mechanical properties. The thermoplastic resin composition comprises 100 parts by weight of a base resin; 5-30 parts by weight of a halogen-based compound; 1-15 parts by weight of antimony oxide; and 1-10 parts by weight of a chlorine-based organic compound, wherein the base resin comprises (A) an acrylic graft polymer comprising 30-60 wt% of an acrylic synthetic rubber and 40-70 wt% of a copolymer of a cyano vinyl compound and an aromatic vinyl compound; a diene-based graft polymer comprising 30-60 wt% of a diene-based synthetic rubber and 40-70 wt% of a copolymer of a cyano vinyl compound and an aromatic vinyl compound; and a copolymer comprising 20-40 wt% of a cyano vinyl compound and 60-80 wt% of an aromatic vinyl compound.
Abstract:
본 발명의 내충격성과 내열성이 우수한 난연성 열가소성 수지 조성믈은 (A)(a 1 ) 평균 입자 크기가 0.08-0.18 ㎛인 소입경 고무를 사용하여 그라프트 중합법에 의해 제조된 그라프트 중합체 및 평균입자크기가 0.28-0.38 ㎛인 중입경 고무를 사용하여 그라프트 중합법에 의해 제조된 그라프트 중합체가 40 : 60 내지 80 : 20 중량%의 비율로 구성된 그라프트 ABS 수지 20-50 중량% 및 (a 2 ) 중량평균분자량이 120,000∼200,000이고, 스티렌 60∼76 중량% 및 아크릴로니트릴 40∼24 중량%로 이루어진 SAN 수지 50-80 중량%로 이루어진 열가소성 아크릴로니트릴-부타디엔-스티렌계 공중합체 수지 100 중량부; (B) 중량평균분자량이 2,000∼10,000 범위인 할로겐계 난연제 5 내지 30 중량부; (C) 산화안티몬 1 내지 15 중량부; 및 (D) 알루미노실리케이트계 무기 화합물 0.05 내지 10 중량부로 이루어진다.
Abstract:
PURPOSE: An acrylonitrile-butadiene-styrene copolymer flame retardant resin composition is provided, wherein the composition shows excellent impact resistance, flame retardancy and color expression. CONSTITUTION: The acrylonitrile-butadiene-styrene copolymer resin composition comprises 100 parts by weight of a base resin comprising 20-70 wt% of a graft acrylonitrile-butadiene-styrene copolymer resin, and 30-80 wt% of a styrene-acrylonitrile copolymer resin which is prepared by suspension polymerization or bulk polymerization, contains 15-45 wt% of acrylonitrile and has a weight average molecular weight of 70,000-300,000; 5-30 parts by weight of a halogen-based compound; 0.05-2 or 1-10 parts by weight of a fluorinated organic compound or a chlorinated organic compound; and 0.1-1 parts by weight of antimony trioxide. The graft acrylonitrile-butadiene-styrene copolymer resin comprising the antimony pentoxide is prepared by mixing 100 parts by weight of an acrylonitrile-butadiene-styrene copolymer latex which is prepared by emulsion polymerization, and comprises 5-40 wt% of acrylonitrile, 20-60 wt% of butadiene rubber and 10-70 wt% of styrene based on the solid component without aggregation, dehydration and drying, and 10-50 parts by weight of colloidal antimony pentoxide based on the solid component; and aggregating, dehydrating and drying the obtained one.
Abstract:
PURPOSE: Provided is a heat resistant, anti-conductive and thermoplastic resin composition containing ABS resin grafted with two different particle size rubber polymers. The small particle size rubber gives good appearance and the middle particle size rubber balances the physical properties. CONSTITUTION: The composition comprises: (A) 20-60wt.% ABS resin consisting of (a1) a graft polymer using the rubber of 0.08-0.18micrometer average particle size and (a2) a graft polymer using the rubber of 0.28-0.38micrometer average particle size, in the weight ratio of 40:60-80:20; (B) 80-40wt.% SAN resin composed of (b1) 30-90wt.% of AMS-based heat resistant SAN resin containing 65-78wt.% of α -methylstyrene and 35-22wt.% of acrylonitrile and (b2) 70-10wt.% of SAN resin with molecular weight of 80,000-120,000 containing 65-78wt.% of styrene and 35-22wt.% of acrylonitrile. On the basis of 100wt.% of above resin composition (A) and (B), the composition optionally comprises (C) 0.1-2.0wt.% of silicon graft copolymer composed of 65-40wt.% of vinyl graft copolymer containing (c1) 35-60wt.% of silicon copolymer with the particle size of 200-400micrometer and (c2) 40-90wt.% of aromatic styrene and 60-10wt.% of vinyl graft copolymer; (D) 0.1-2.0wt.% of heat stabilizer; (E) 0.2-2.0 wt.% of lubricant; (F) and/or 0.4-2.0wt.% of anti-static agent.
Abstract:
PURPOSE: A CMP(chemical mechanical polishing) slurry composition is provided to remove defects like protrusion, stepped height, edge over erosion, scratch, dishing, SEAM stack, erosion, etc in two polishing steps and to improve planarity. CONSTITUTION: A CMP(chemical mechanical polishing) slurry composition comprises abrasive, a Fe(3+) compound or complex compound, a water-soluble polymer, and an amino acid. The abrasive composition has the polishing rate of a tungsten metal layer of 200-600 Å/min, and the polishing rate of an insulating layer is 600-1500 Å/min. The comprised amount of the Fe3+ compound or the complex compound is 0.1-1.5 weight% based on the composition.