公开(公告)号：KR20180022775A

公开(公告)日：2018-03-06

申请号：KR20187000230

申请日：2016-05-17

Applicant: ADEKA CORP

Inventor： YOSHINO TOMOHARU ,  ENZU MASAKI ,  NISHIDA AKIHIRO ,  SUGIURA NANA

IPC: C07F15/06 ,  C23C16/18 ,  H01L21/285

CPC classification number: C23C16/18 ,  C07F13/00 ,  C07F13/005 ,  C07F15/04 ,  C07F15/045 ,  C07F15/06 ,  C07F15/065 ,  H01L21/285

Abstract: 본발명의신규화합물은, 하기일반식 (I) 또는 (II)로나타내어지는것을특징으로한다: [화학식 1][식중, R및 R는, 각각독립적으로탄소원자수 1 ~ 12의탄화수소기를나타내며, 그탄화수소기의수소원자는 Si(R)으로치환되어있는경우도있다. 단, R과 R는상이한기이다. R은, 메틸기또는에틸기를나타내며, M은, 금속원자또는규소원자를나타내며, n은 1 ~ 4의정수를나타낸다.]

Abstract translation: 本发明的新型化合物的特征在于由以下通式（I）或（II）表示：其中R和R各自独立地表示具有1至12个碳原子的烃基， 该烃基的氢原子可以被Si（R）取代。 只要R和R是不同的基团。 R表示甲基或乙基，M表示金属原子或硅原子，n表示1〜4的数。

公开(公告)号：EP3144313A4

公开(公告)日：2017-12-06

申请号：EP15792769

申请日：2015-03-31

Applicant: ADEKA CORP

Inventor： YOSHINO TOMOHARU ,  ENZU MASAKI ,  SAKURAI ATSUSHI ,  HATASE MASAKO ,  UCHIUZOU HIROYUKI ,  NISHIDA AKIHIRO

IPC: C07F15/06 ,  C23C16/18 ,  C23C16/44

CPC classification number: C07F15/065 ,  C07F15/06 ,  C23C16/18 ,  C23C16/44

Abstract: The cobalt compound of this invention is represented by general formula (I) below. In general formula (I), R 1 to R 3 independently represent a straight chain or branched alkyl group having 1 to 5 carbon atoms. In addition, the thin film-forming raw material of this invention contains the cobalt compound represented by general formula (I). According to this invention, it is possible to provide a cobalt compound which can be transported in the form of a liquid due to having a low melting point, which can be decomposed at a low temperature and which can be easily vaporized due to having a high vapor pressure; and a thin film-forming raw material that uses this cobalt compound.

公开(公告)号：EP3178808A4

公开(公告)日：2018-03-21

申请号：EP15829762

申请日：2015-07-16

Applicant: ADEKA CORP

Inventor： SAKURAI ATSUSHI ,  HATASE MASAKO ,  YOSHINO TOMOHARU ,  ENZU MASAKI

IPC: C07C251/08 ,  C07F1/08 ,  C07F15/06 ,  C23C16/18 ,  H01L21/285

CPC classification number: C07F15/065 ,  C07C251/08 ,  C07C251/76 ,  C07F7/0818 ,  C07F7/10 ,  C07F15/04 ,  C07F15/045 ,  C07F15/06 ,  C23C16/18 ,  C23C16/45525 ,  H01L21/285

Abstract: The alkoxide compound of the present invention is characteristically represented by the following general formula (I) :

公开(公告)号：EP3144293A4

公开(公告)日：2018-01-03

申请号：EP15793276

申请日：2015-04-08

Applicant: ADEKA CORP

Inventor： YOSHINO TOMOHARU ,  ENZU MASAKI ,  SAKURAI ATSUSHI ,  NISHIDA AKIHIRO ,  OKABE MAKOTO

IPC: C07C215/08 ,  C07F1/08 ,  C23C16/18 ,  C23C16/455 ,  H01L21/28 ,  H01L21/285

CPC classification number: C07F1/08 ,  C07C215/08 ,  C09D1/00 ,  C09D5/24 ,  C23C16/06 ,  C23C16/18 ,  C23C16/45525 ,  C23C16/45542 ,  C23C16/45553

Abstract: This invention provides a copper compound represented by General Formula (I) below. In General Formula (I), R 1 to R 3 independently represent a linear or branched alkyl group with a carbon number of 1 to 5; provided that R 1 and R 2 are a methyl group, R 3 represents a linear or branched alkyl group with a carbon number of 2 to 5; and provided that R 1 is a methyl group and R 2 is an ethyl group, R 3 represents a methyl group or a linear or branched alkyl group with a carbon number of 3 to 5. A starting material for forming a thin film of the present invention includes the copper compound represented by General Formula (I). The present invention can provide a copper compound which has a low melting point, can be conveyed in a liquid state, has a high vapor pressure, and is easily vaporizable, and also a starting material for forming a thin film which uses such a copper compound.

公开(公告)号：EP3135664A4

公开(公告)日：2017-11-01

申请号：EP15782391

申请日：2015-03-30

Applicant: ADEKA CORP

Inventor： SAKURAI ATSUSHI ,  HATASE MASAKO ,  YOSHINO TOMOHARU ,  ENZU MASAKI

IPC: C07C251/08 ,  C07F15/06 ,  C23C16/18 ,  H01L21/28 ,  H01L21/285

CPC classification number: C07F15/06 ,  C07C251/08 ,  C23C16/18 ,  C23C16/45553 ,  H01L21/28 ,  H01L21/285 ,  H01L21/28556 ,  H01L21/28568