公开(公告)号：US20210063898A1

公开(公告)日：2021-03-04

申请号：US17098073

申请日：2020-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Erik Roelof LOOPSTRA ,  Aschwin Lodewijk Hendricus Johannes VAN MEER ,  Jeroen Johannes Sophia Maria MERTENS ,  Christianus Gerardus Maria DE MOL ,  Marcel Johannus Elisabeth Hubertus MUITJENS ,  Antonius Johannus VAN DER NET ,  Joost Jeroen OTTENS ,  Johannes Anna QUAEDACKERS ,  Maria Elisabeth REUHMAN-HUISKEN ,  Marco Koert STAVENGA ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Frederik Eduard DE JONG ,  Koen GOORMAN ,  Boris MENCHTCHIKOV ,  Herman BOOM ,  Stoyan NIHTIANOV ,  Richard MOERMAN ,  Martin Frans Pierre SMEETS ,  Bart Leonard Peter SCHOONDERMARK ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

IPC: G03F7/20

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

公开(公告)号：US20190235397A1

公开(公告)日：2019-08-01

申请号：US16376535

申请日：2019-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Erik Roelof LOOPSTRA ,  Aschwin Lodewijk Hendricus Johannes VAN MEER ,  Jeroen Johannes Sophia Maria MERTENS ,  Christianus Gerardus Maria DE MOL ,  Marcel Johannus Elisabeth Hubertus MUITJENS ,  Antonius Johannus VAN DER NET ,  Joost Jeroen OTTENS ,  Johannes Anna QUAEDACKERS ,  Maria Elisabeth REUHMAN-HUISKEN ,  Marco Koert STAVENGA ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Frederik Eduard DE JONG ,  Koen GOORMAN ,  Boris MENCHTCHIKOV ,  Herman BOOM ,  Stoyan NIHTIANOV ,  Richard MOERMAN ,  Martin Frans Pierre SMEETS ,  Bart Leonard Peter SCHOONDERMARK ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.