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公开(公告)号：US20180024446A1
公开(公告)日：2018-01-25
申请号：US15528187
申请日：2015-11-24
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE , Benjamin Joseph DE SMET , Sjoerd Nicolaas Lambertus DONDERS , Adrianus Marianus VERDONCK
IPC: G03F7/20
CPC classification number: G03F7/70875 , F25B39/02 , F25B2339/023 , G02B7/028 , G02B7/1815 , G03F7/708 , G03F7/70808 , G03F7/70858 , G03F7/70891
Abstract: A method of thermally conditioning a physical object, includes guiding a two-phase cooling medium through a cooling duct of the physical object, wherein the guiding includes: guiding the two-phase cooling medium in a liquid phase via a pre-heating duct of the physical object from a supply side of the physical object at least partly towards a discharging side of the physical object, the two-phase cooling medium being pre-heated in the pre-heating duct; guiding the two-phase cooling medium from the pre-heating duct to a phase transitioning duct of the physical object, the two-phase cooling medium at least partly transitioning from the liquid phase towards a gas phase in the phase transitioning duct; guiding the two-phase cooling medium from the phase transitioning duct to a discharging duct of the physical object; and discharging at the discharging side the two-phase cooling medium from the discharging duct.
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公开(公告)号：US20170261866A1
公开(公告)日：2017-09-14
申请号：US15517485
申请日：2015-10-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE
CPC classification number: G03F7/70891 , F28D15/02 , F28F13/16 , F28F2250/08 , G02B7/008 , G03F7/70875 , G03F7/709
Abstract: A pump includes a collecting duct to guide a two-phase fluid provided with magnetic field responsive particles, a collecting duct magnet system arranged along the collecting duct and configured to generate a magnetic field in at least a part of the collecting duct, a pumping duct to guide the two-phase fluid, a pumping duct inlet being connected to a collecting duct outlet, and a pumping duct magnet system arranged along the pumping duct and configured to generate a magnetic field in at least a part of the pumping duct. A pump driver is configured to drive the collecting duct magnet system to generate a spatial repetition of collecting duct magnetic fields moving along a length of the collecting duct, and is configured to drive the pumping duct magnet system to generate a spatial repetition of pumping duct magnetic fields moving along a length of the pumping duct.
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3.发明申请公开(公告)号：US20160048085A1
公开(公告)日：2016-02-18
申请号：US14882241
申请日：2015-10-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VERMEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPA Y , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
Abstract translation: 描述了一种光刻设备，其具有液体供应系统，其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件和加热器。
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公开(公告)号：US20130164688A1
公开(公告)日：2013-06-27
申请号：US13686186
申请日：2012-11-27
Applicant: ASML Netherlands B.V.
IPC: G03B27/58 , G03F7/20 , H01L21/683
CPC classification number: G03B27/58 , G03F7/2051 , G03F7/707 , G03F7/70708 , H01L21/683
Abstract: A support for an object, e.g., a semiconductor substrate, includes a main body having a surface configured and arranged to have a plurality of projections. Each of the projections has an associated electrostatic actuator for displacing a free end of the associated projection relative to the main body at least in a direction in a plane parallel to a main surface of the object.
Abstract translation: 对象（例如半导体衬底）的支撑件包括主体，该主体具有被配置和布置成具有多个突起的表面。 每个突起具有相关联的静电致动器，用于至少沿平行于物体的主表面的平面中的方向相对于主体移动相关联的突起的自由端。
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Patent Agency Ranking
5.发明申请公开(公告)号：US20170277042A1
公开(公告)日：2017-09-28
申请号：US15505885
申请日：2015-07-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Antonius Gerardus AKKERMANS , Ruud Antonius Catharina Maria BEERENS , Sander Christiaan BROERS , Jeroen Johannes Theodorus Hendrikus DE BEST , Adrianus Marinus Wouter HEEREN , George Alois Leonie LEENKNEGT , Bo LENSSEN , Hendrikus Johannes SCHELLENS , Peter VAN DER KRIEKEN , Theodorus Petrus Maria CADEE , Jan VAN EIJK , Richard Henricus Adrianus VAN LIESHOUT
CPC classification number: G03F7/70775 , G01L1/16 , G01P15/0915 , G01P15/18 , G03F7/70716 , G03F7/70783 , G03F7/7085
Abstract: A sensor includes two shear-mode piezoelectric transducers, wherein each piezoelectric transducer has a bottom surface and a top surface, wherein the top surfaces of the piezoelectric transducers are rigidly connected to each other, and wherein the bottom surfaces of the piezoelectric transducers are configured to be attached to an object to be measured.
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6.发明申请ROTATABLE FRAME, LITHOGRAPHIC APPARATUS, PROJECTION SYSTEM, METHOD FOR FOCUSING RADIATION AND DEVICE MANUFACTURING METHOD 审中-公开可旋转框架，光刻设备，投影系统，聚焦辐射和装置制造方法公开(公告)号：US20160349628A1
公开(公告)日：2016-12-01
申请号：US15235542
申请日：2016-08-12
Applicant: ASML Netherlands B.V.
Inventor： Arno Jan BLEEKER , Thomas Josephus Maria CASTENMILLER , Pieter Willem Herman DEJAGER , Heine Melle MULDER , Koen Jacobus Johannes ZAAL , Theodorus Petrus Maria CADEE , Danny Maria Hubertus PHILIPS , Ruud Antonius Catharina Maria BEERENS , Roger Anton Marie TIMMERMANS
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/20 , G03F7/7005 , G03F7/70075 , G03F7/70275 , G03F7/70291 , G03F7/70366 , G03F7/70383 , G03F7/70391 , G03F7/704 , G03F7/70425 , G03F7/70475
Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction.
Abstract translation: 配置成将辐射束投影到目标上的投影系统包括可旋转框架，其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在仅切向 或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。
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公开(公告)号：US20210063898A1
公开(公告)日：2021-03-04
申请号：US17098073
申请日：2020-11-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VAN MEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN
IPC: G03F7/20
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
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公开(公告)号：US20190235397A1
公开(公告)日：2019-08-01
申请号：US16376535
申请日：2019-04-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VAN MEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
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公开(公告)号：US20160026091A1
公开(公告)日：2016-01-28
申请号：US14775263
申请日：2014-02-26
Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT GMBH
Inventor： Erik Roelof LOOPSTRA , Olav Waldemar Vladimir FRIJNS , Stig BIELING , Antonius Theodorus Wilhelmus KEMPEN , Ivo VANDERHALLEN , Nicolaas TEN KATE , Ruud Antonius Catharina Maria BEERENS , Richard Henricus Adrianus VAN LIESHOUT , Theodorus Petrus Maria CADEE , Sjoerd Nicolaas Lambertus DONDERS , Alexander Matthijs STRUYCKEN , Marcus Petrus SCHEEPERS
CPC classification number: G03F7/70033 , G02B5/0891 , G02B19/0095 , G03F7/70166 , G03F7/702 , G03F7/70916 , G03F7/70983 , G21K1/067 , H05G2/003 , H05G2/008
Abstract: A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another.
Abstract translation: 一种辐射收集器，包括第一收集器段，该第一收集器段包括多个掠入射反射器壳体，所述多个入射反射器壳体被配置为引导辐射在离辐射收集器一定距离处的第一位置会聚;第二收集器部分，其包括多个入射入射反射器壳体， 以在距离辐射收集器的所述距离处会聚在第二位置，其中第一位置和第二位置彼此分离。
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