公开(公告)号：WO2013050338A1

公开(公告)日：2013-04-11

申请号：PCT/EP2012/069400

申请日：2012-10-02

Applicant: ASML NETHERLANDS B.V.

Inventor： NGUYEN, Thanh ,  FINDERS, Jozef ,  KETELAARS, Wilhelmus ,  WUISTER, Sander ,  VAN DER HEIJDEN, Eddy ,  MEESSEN, Hieronymus ,  KOOLE, Roelof ,  PEETERS, Emiel ,  VAN HEESCH, Chris ,  BRIZARD, Aurelie ,  BOOTS, Henri ,  DRUZHININA, Tamara ,  DE RUITER, Jessica

IPC: B81C1/00

CPC classification number: C30B1/12 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y30/00 ,  G03F7/0002 ,  H01L21/0337 ,  Y10T117/10

Abstract: A graphoepitaxy template to align a self-assembled block polymer adapted to self-assemble into a 2-D array having parallel rows of discontinuous first domains extending parallel to a first axis, mutually spaced along an orthogonal second axis, and separated by a continuous second domain. The graphoepitaxy template has first and second substantially parallel side walls extending parallel to and defining the first axis and mutually spaced along the second axis to provide a compartment to hold at least one row of discontinuous first domains of the self-assembled block copolymer on the substrate between and parallel to the side walls, and separated therefrom by a continuous second domain. The compartment has a graphoepitaxial nucleation feature arranged to locate at least one of the discontinuous first domains at a specific position within the compartment. Methods for forming the graphoepitaxy template and its use for device lithography are also disclosed.

Abstract translation: 用于使自组装嵌段聚合物对准以将其自组装成具有平行于第一轴线延伸的不连续第一区域的平行行的二维阵列，并且沿着正交的第二轴相互间隔开并由连续的第二轴 域。 所述方解石模板具有第一和第二基本上平行的侧壁，所述第一和第二基本平行的侧壁平行于并限定第一轴线并且限定第一轴线并且沿着第二轴线相互间隔延伸，以提供隔室，以将自组装嵌段共聚物的至少一排不连续的第一区域保持在基板上 在侧壁之间并平行于侧壁，并通过连续的第二结构域与之隔开。 隔室具有图案外延成核特征，布置成将隔离物内的特定位置处的不连续的第一结构域中的至少一个定位。 还公开了用于形成图案石墨模板的方法及其用于器件光刻的方法。

公开(公告)号：WO2012175342A2

公开(公告)日：2012-12-27

申请号：PCT/EP2012/060783

申请日：2012-06-07

Applicant: ASML NETHERLANDS B.V. ,  BRIZARD, Aurelie ,  KETELAARS, Wilhelmus ,  WUISTER, Sander ,  KOOLE, Roelof ,  PEETERS, Emiel ,  VAN HEESCH, Chris ,  BOOTS, Henri ,  NGUYEN, Thanh

Inventor： BRIZARD, Aurelie ,  KETELAARS, Wilhelmus ,  WUISTER, Sander ,  KOOLE, Roelof ,  PEETERS, Emiel ,  VAN HEESCH, Chris ,  BOOTS, Henri ,  NGUYEN, Thanh

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C08F299/02 ,  C08F299/04 ,  H01L51/0043

Abstract: A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than T0D, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature T g for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.

Abstract translation: BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于T0D的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键 相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。 包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段 当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。

公开(公告)号：WO2013127608A2

公开(公告)日：2013-09-06

申请号：PCT/EP2013/052306

申请日：2013-02-06

Applicant: ASML NETHERLANDS B.V.

Inventor： PEETERS, Emiel ,  KETELAARS, Wilhelmus ,  WUISTER, Sander ,  KOOLE, Roelof ,  VAN HEESCH, Chris ,  BRIZARD, Aurelie ,  BOOTS, Henri ,  NGUYEN, Thanh ,  YILDIRIM, Oktay

IPC: G06F7/02

CPC classification number: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/038 ,  G03F7/2002

Abstract: A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer comprising first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition comprising a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.

Abstract translation: 一种形成图案化学外延模板的方法，用于在基底表面上定向包含第一聚合物嵌段和第二聚合物嵌段的可自组装的嵌段共聚物，所述方法包括施加 底漆组合物施加到表面，所述底漆组合物包含与第一聚合物嵌段具有化学亲和力的第一聚合物部分和与第二聚合物嵌段具有化学亲和力的第二聚合物部分，选择性地暴露表面，底漆层和任何上覆层 光化辐射以提供曝光区域和未曝光区域，使曝光区域中的第一聚合物部分变得不稳定，并且从曝光区域除去不稳定的第一聚合物部分以消耗第一聚合物部分的曝光区域中的底漆层表面以形成 图案化的化学外延模板。

公开(公告)号：WO2014139795A1

公开(公告)日：2014-09-18

申请号：PCT/EP2014/053694

申请日：2014-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： FINDERS, Jozef ,  WUISTER, Sander ,  VAN DER HEIJDEN, Eddy ,  BOOTS, Henri

IPC: B81C1/00 ,  G03F7/20

CPC classification number: H01L21/76816 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/2002 ,  G03F7/2004 ,  H01L21/02345 ,  H01L21/268 ,  H01L21/31058 ,  H01L21/31133

Abstract: A method of forming a plurality of regularly spaced lithography features, e.g. contact holes, including: providing a trench on a substrate, the trench having opposing side-walls and a base, with the side-walls having a width therebetween, wherein the trench is formed by photolithography including exposing the substrate using off-axis illumination whereby a modulation is provided to the side-walls of the trench; providing a self-assemblable block copolymer having first and second blocks in the trench; causing the self-assemblable block copolymer to self-assemble into an ordered layer in the trench, the layer having first domains of the first block and second domains of the second block; and selectively removing the first domain to form at least one regularly spaced row of lithography features having the second domain along the trench.

Abstract translation: 一种形成多个规则间隔的光刻特征的方法，例如。 接触孔，包括：在衬底上提供沟槽，所述沟槽具有相对的侧壁和底座，其中所述侧壁之间具有宽度，其中所述沟槽通过光刻形成，包括使用离轴照明曝光所述衬底，由此 向沟槽的侧壁提供调制; 提供在沟槽中具有第一和第二嵌段的自组装嵌段共聚物; 使自组装嵌段共聚物自组装成沟槽中的有序层，该层具有第一嵌段的第一区域和第二嵌段的第二区域; 以及选择性地移除所述第一区域以形成沿着所述沟槽具有所述第二结构域的至少一个规则间隔的光刻特征行。

公开(公告)号：WO2014023589A1

公开(公告)日：2014-02-13

申请号：PCT/EP2013/065824

申请日：2013-07-26

Applicant: ASML NETHERLANDS B.V.

Inventor： FINDERS, Jozef ,  DRUZHININA, Tamara ,  PEETERS, Emiel ,  WUISTER, Sander ,  VAN HEESCH, Chris ,  VAN DER HEIJDEN, Eddy ,  BOOTS, Henri

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G06F17/5009 ,  G06F17/5068

Abstract: A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice. The inclusion of a realistic random error in the template design, in addition to systematic variation of a design parameter, may improve the template design optimization to render the result less sensitive to error which may be inevitable in practice.

Abstract translation: 设计外延模板以将基底上的嵌段共聚物自组装成有序目标图案的方法包括提供初级外延模板设计，然后改变设计以优化图案保真度统计量，例如放置误差，相对于 通过对预测的自组装嵌段共聚物图案进行模拟和优化作为不同设计参数的函数的图案放置来实现目标图案。 除了改变设计参数以优化模式保真度统计量之外，在模拟预测模式之前还包括模板设计中的随机误差，以便在实践中补偿预期的模板不准确性。 除了设计参数的系统变化之外，在模板设计中包括一个现实的随机误差，可以改进模板设计优化，使得结果对于在实践中可能是不可避免的误差较不敏感。