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公开(公告)号：WO2022033793A1
公开(公告)日：2022-02-17
申请号：PCT/EP2021/069613
申请日：2021-07-14
Applicant: ASML NETHERLANDS B.V.
Inventor： COLLIGNON, Tijmen, Pieter , SMAL, Pavel , TABERY, Cyrus, Emil , DOS SANTOS GUZELLA, Thiago , BASTANI, Vahid
Abstract: Methods and associated apparatus for identifying contamination in a semiconductor fab are disclosed. The methods comprise determining contamination map data for a plurality of semiconductor wafers clamped to a wafer table after being processed in the semiconductor fab. Combined contamination map data is determined based, at least in part, on a combination of the contamination map data of the plurality of semiconductor wafers. The combined contamination map data is combined to reference data. The reference data comprises one or more values for the combined contamination map data that are indicative of contamination in one or more tools in the semiconductor fab.
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公开(公告)号：WO2021213746A1
公开(公告)日：2021-10-28
申请号：PCT/EP2021/057211
申请日：2021-03-22
Applicant: ASML NETHERLANDS B.V.
Inventor： SAHRAEIAN, Reza , BASTANI, Vahid , GKOROU, Dimitra , DOS SANTOS GUZELLA, Thiago
Abstract: Apparatus and methods of configuring an imputer model for imputing a second parameter. The method comprises inputting a first data set comprising values of a first parameter to the imputer model, and evaluating the imputer model to obtain a second data set comprising imputed values of the second parameter. The method further comprises obtaining a third data set comprising measured values of a third parameter, wherein the third parameter is correlated to the second parameter; obtaining a prediction model configured to infer values of the third parameter based on inputting values of the second parameter; inputting the second data set to the prediction model, and evaluating the prediction model to obtain inferred values of the third parameter; and configuring the imputer model based on a comparison of the inferred values and the measured values of the third parameter.
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公开(公告)号：WO2022179773A1
公开(公告)日：2022-09-01
申请号：PCT/EP2022/051299
申请日：2022-01-21
Applicant: ASML NETHERLANDS B.V.
Inventor： DOS SANTOS GUZELLA, Thiago , ISHIBASHI, Masashi , SANNO, Noriaki , BASTANI, Vahid , SAHRAEIAN, Reza , SAPUTRA, Putra
IPC: G01N21/956 , G03F7/20 , G05B19/418 , G06N20/00 , H01L21/66
Abstract: Described is a method for determining a spatially varying process offset for a lithographic process, the spatially varying process offset (MTD) varying over a substrate subject to the lithographic process to form one or more structures thereon. The method comprises obtaining a trained model (MOD), having been trained to predict first metrology data based on second metrology data, wherein the first metrology data (OV) is spatially varying metrology data which relates to a first type of measurement of said structures being a measure of yield and said second metrology data (PB) is spatially varying metrology data which relates to a second type of measurement of said structures and correlates with said first metrology data; and using said model to obtain said spatially varying process offset (MTD).
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Patent Agency Ranking
公开(公告)号：EP3913435A1
公开(公告)日：2021-11-24
申请号：EP20175361.3
申请日：2020-05-19
Applicant: ASML Netherlands B.V.
Inventor： SAHRAEIAN, Reza , BASTANI, Vahid , GKOROU, Dimitra , DOS SANTOS GUZELLA, Thiago
Abstract: Apparatus and methods of configuring an imputer model for imputing a second parameter. The method comprises inputting a first data set comprising values of a first parameter to the imputer model, and evaluating the imputer model to obtain a second data set comprising imputed values of the second parameter. The method further comprises obtaining a third data set comprising measured values of a third parameter, wherein the third parameter is correlated to the second parameter; obtaining a prediction model configured to infer values of the third parameter based on inputting values of the second parameter; inputting the second data set to the prediction model, and evaluating the prediction model to obtain inferred values of the third parameter; and configuring the imputer model based on a comparison of the inferred values and the measured values of the third parameter.
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公开(公告)号：EP4050328A1
公开(公告)日：2022-08-31
申请号：EP21159169.8
申请日：2021-02-25
Applicant: ASML Netherlands B.V.
Inventor： DOS SANTOS GUZELLA, Thiago , ISHIBASHI, Masashi , SANNO, Noriaki , BASTANI, Vahid , SAHRAEIAN, Reza , SAPUTRA, Putra
IPC: G01N21/956 , G03F7/20 , G05B19/418 , G06N20/00 , H01L21/66
Abstract: Described is a method for determining a spatially varying process offset for a lithographic process, the spatially varying process offset varying over a substrate subject to the lithographic process to form one or more structures thereon. The method comprises obtaining a trained model, having been trained to predict first metrology data based on second metrology data, wherein the first metrology data is spatially varying metrology data which relates to a first type of measurement of said structures being a measure of yield and said second metrology data is spatially varying metrology data which relates to a second type of measurement of said structures and correlates with said first metrology data; and using said model to obtain said spatially varying process offset.
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公开(公告)号：EP4196851A1
公开(公告)日：2023-06-21
申请号：EP21740579.4
申请日：2021-07-14
Applicant: ASML Netherlands B.V.
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7.发明公开
公开(公告)号：EP4538938A1
公开(公告)日：2025-04-16
申请号：EP23202791.2
申请日：2023-10-10
Applicant: ASML Netherlands B.V.
Inventor： DOS SANTOS GUZELLA, Thiago , MALAN, Abele, Millenium , CHEN, Yiyu Lydia , DECOUCHANT, Jérémie, Éric, Alphonse, Pierre
Abstract: A method is presented for using a distributed network to derive information characterising a production system described by variables. The network comprises two probabilistic models implementing a graph comprising nodes associated with a corresponding one of the variables, and directed edges connecting respective pairs of the nodes. Each graph comprises an interface node for which the corresponding associated variable is common and normal nodes to which edge(s) are directed that are associated with a respective conditional probability table (CPT) specifying a probability of the variable being in a set of states based on the variables associated with the corresponding one or more nodes from which the one or more edges are directed. The interface node is associated with a partial CPT of the common variable. The method comprises generating, using the at least two models, conditioned data specifying a probability distribution of the state of the common variable.
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公开(公告)号：EP4139749A1
公开(公告)日：2023-03-01
申请号：EP21712845.3
申请日：2021-03-22
Applicant: ASML Netherlands B.V.
Inventor： SAHRAEIAN, Reza , BASTANI, Vahid , GKOROU, Dimitra , DOS SANTOS GUZELLA, Thiago
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