公开(公告)号：WO2022002599A1

公开(公告)日：2022-01-06

申请号：PCT/EP2021/066324

申请日：2021-06-17

Applicant: ASML NETHERLANDS B.V.

Inventor： JIANG, Aiqin ,  RAGHUNATHAN, Sudharshanan ,  FREEMAN, Jill, Elizabeth ,  WANG, Fuming ,  YAN, Fei

IPC: G03F7/20 ,  G03F7/705 ,  G03F7/70625

Abstract: Described herein is a method for determining a process window of a patterning process based on a failure rate. The method includes (a) obtaining a plurality of features printed on a substrate, (b) grouping, based on a metric, the features into a plurality of groups, and (c) generating, based on measurement data associated with a group of features, a base failure rate model for the group of features, wherein the base failure rate model identifies the process window related to the failure rate of the group of features. The method further includes generating, using the base failure rate model, a feature-specific failure rate model for a specific feature, wherein the feature-specific failure rate model identifies a feature-specific process window such that an estimated failure rate of the specific feature is below a specified threshold.

公开(公告)号：WO2018087207A1

公开(公告)日：2018-05-17

申请号：PCT/EP2017/078716

申请日：2017-11-09

Applicant: ASML NETHERLANDS B.V.

Inventor： JIANG, Aiqin ,  DEN BOEF, Arie, Jeffrey ,  BHATTACHARYYA, Kaustuve ,  VAN DER LAAN, Hans ,  VISSER, Bart ,  JAK, Martin, Jacobus, Johan

IPC: G03F7/20 ,  G01N21/956 ,  H01L21/66

Abstract: A method including obtaining a fit of data for overlay of a metrology target for a patterning process as a function of a stack difference parameter of the metrology target; and using, by a hardware computer, a slope of the fit (i) to differentiate a metrology target measurement recipe from another metrology target measurement recipe, or (ii) calculate a corrected value of overlay, or (iii) to indicate that an overlay measurement value obtained using the metrology target should be used, or not be used, to configure or modify an aspect of the patterning process, or (iv) any combination selected from (i)-(iii).

Abstract translation: 一种方法，包括获取用于图案化过程的度量目标的重叠的数据拟合，作为度量目标的堆叠差异参数的函数; 以及由硬件计算机使用拟合的斜率（i）以将度量目标测量配方与另一度量衡目标测量配方区分开，或（ii）计算重叠的校正值，或（iii）指示重叠 应使用或不使用测量目标获得的测量值来配置或修改构图过程的一个方面，或者（iv）从（i） - （iii）中选择的任何组合。

公开(公告)号：WO2021165419A1

公开(公告)日：2021-08-26

申请号：PCT/EP2021/054064

申请日：2021-02-18

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN INGEN SCHENAU, Koenraad ,  SLACHTER, Abraham ,  TIMOSHKOV, Vadim Yourievich ,  KOOIMAN, Marleen ,  VAN LARE, Marie-Claire ,  DILLEN, Hermanus, Adrianus ,  HUNSCHE, Stefan ,  COLINA, Luis, Alberto, Colina, Santamaría ,  JIANG, Aiqin ,  WANG, Fuming ,  RAGHUNATHAN, Sudharshanan

IPC: G03F7/20

Abstract: Described herein are methods related to improving a simulation processes and solutions (e.g., retargeted patterns) associated with manufacturing of a chip. A method includes obtaining a plurality of dose-focus settings, and a reference distribution based on measured values of the characteristic of a printed pattern associated with each setting of the plurality of dose-focus settings. The method further includes, based on an adjustment model and the plurality of dose-focus settings, determining the probability density function (PDF) of the characteristic such that an error between the PDF and the reference distribution is reduced. The PDF can be a function of the adjustment model and variance associated with dose, the adjustment model being configured to change a proportion of non-linear dose sensitivity contribution to the PDF. A process window can be adjusted based on the determined PDF of the characteristic.