公开(公告)号：WO2020094286A1

公开(公告)日：2020-05-14

申请号：PCT/EP2019/075531

申请日：2019-09-23

Applicant: ASML NETHERLANDS B.V.

Inventor： TEL, Wim, Tjibbo ,  KIERS, Antoine, Gaston, Marie ,  TIMOSHKOV, Vadim Yourievich ,  DILLEN, Hermanus, Adrianus ,  ZHANG, Yichen ,  WANG, Te-Sheng ,  CHEN, Tzu-Chao

IPC: G03F7/20

Abstract: Disclosed herein is a method for determining an image-metric of features on a substrate, the method comprising: obtaining a first image of a plurality of features on a substrate; obtaining one or more further images of a corresponding plurality of features on the substrate, wherein at least one of the one or more further images is of a different layer of the substrate than the first image; generating aligned versions of the first and one or more further images by performing an alignment process on the first and one or more further images; and calculating an image-metric in dependence on a comparison of the features in the aligned version of the first image and the corresponding features in the aligned versions of the one or more further images.

公开(公告)号：WO2021165419A1

公开(公告)日：2021-08-26

申请号：PCT/EP2021/054064

申请日：2021-02-18

Applicant: ASML NETHERLANDS B.V.

Inventor： VAN INGEN SCHENAU, Koenraad ,  SLACHTER, Abraham ,  TIMOSHKOV, Vadim Yourievich ,  KOOIMAN, Marleen ,  VAN LARE, Marie-Claire ,  DILLEN, Hermanus, Adrianus ,  HUNSCHE, Stefan ,  COLINA, Luis, Alberto, Colina, Santamaría ,  JIANG, Aiqin ,  WANG, Fuming ,  RAGHUNATHAN, Sudharshanan

IPC: G03F7/20

Abstract: Described herein are methods related to improving a simulation processes and solutions (e.g., retargeted patterns) associated with manufacturing of a chip. A method includes obtaining a plurality of dose-focus settings, and a reference distribution based on measured values of the characteristic of a printed pattern associated with each setting of the plurality of dose-focus settings. The method further includes, based on an adjustment model and the plurality of dose-focus settings, determining the probability density function (PDF) of the characteristic such that an error between the PDF and the reference distribution is reduced. The PDF can be a function of the adjustment model and variance associated with dose, the adjustment model being configured to change a proportion of non-linear dose sensitivity contribution to the PDF. A process window can be adjusted based on the determined PDF of the characteristic.

公开(公告)号：EP4202551A1

公开(公告)日：2023-06-28

申请号：EP21217598.8

申请日：2021-12-23

Applicant: ASML Netherlands B.V.

Inventor： ZHANG, Huaichen ,  TIMOSHKOV, Vadim Yourievich ,  TABERY, Cyrus, Emil ,  HAUPTMANN, Marc ,  KHODKO, Oleksandr

IPC: G03F7/20 ,  H01L21/66

Abstract: Disclosed is a method for determining a mechanical property of a layer applied to a substrate. The method comprises obtaining input data comprising metrology data relating to said layer and layout data relating to a layout of a pattern to be applied in said layer. A first model or first model term is used to determine a global mechanical property related to said layer based on at least said input data; and at least one second model or at least one second model term is used to predict a mechanical property distribution or associated overlay map based on said first mechanical property and said layout data, the mechanical property distribution describing the mechanical property variation over said layer.

公开(公告)号：EP4445218A1

公开(公告)日：2024-10-16

申请号：EP22808826.6

申请日：2022-10-27

Applicant: ASML Netherlands B.V.

Inventor： ZHANG, Huaichen ,  TIMOSHKOV, Vadim Yourievich ,  TABERY, Cyrus, Emil ,  HAUPTMANN, Marc ,  KHODKO, Oleksandr

IPC: G03F7/20 ,  H01L21/66

公开(公告)号：EP3877812A1

公开(公告)日：2021-09-15

申请号：EP19770103.0

申请日：2019-09-23

Applicant: ASML Netherlands B.V.

Inventor： TEL, Wim, Tjibbo ,  KIERS, Antoine, Gaston, Marie ,  TIMOSHKOV, Vadim Yourievich ,  DILLEN, Hermanus, Adrianus ,  ZHANG, Yichen ,  WANG, Te-Sheng ,  CHEN, Tzu-Chao

IPC: G03F7/20

公开(公告)号：EP3650940A1

公开(公告)日：2020-05-13

申请号：EP18205329.8

申请日：2018-11-09

Applicant: ASML Netherlands B.V.

Inventor： TEL, Wim, Tjibbo ,  KIERS, Antoine, Gaston, Marie ,  TIMOSHKOV, Vadim Yourievich ,  DILLEN, Hermanus, Adrianus ,  Zhang, Yichen

IPC: G03F7/20

Abstract: Disclosed herein is a method for determining an image-metric of features on a substrate, the method comprising: obtaining a first image of a plurality of features on a substrate; obtaining one or more further images of a corresponding plurality of features on the substrate, wherein at least one of the one or more further images is of a different layer of the substrate than the first image; generating aligned versions of the first and one or more further images by performing an alignment process on the first and one or more further images; and calculating an image-metric in dependence on a comparison of the features in the aligned version of the first image and the corresponding features in the aligned versions of the one or more further images.