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    RADIATION SOURCE AND LITHOGRAPIC APPARATUS
    1.
    发明申请
    RADIATION SOURCE AND LITHOGRAPIC APPARATUS 审中-公开
    辐射源和光栅设备

    公开(公告)号：WO2013117355A1

    公开(公告)日：2013-08-15

    申请号：PCT/EP2013/050055

    申请日：2013-01-03

    Applicant: ASML NETHERLANDS B.V.

    Inventor： DIJKSMAN, Johan ,  HULTERMANS, Ronald ,  KEMPEN, Antonius ,  BADIE, Ramin

    IPC: H05G2/00

    CPC classification number: H05G2/006 ,  G03F7/70033 ,  G03F7/70908 ,  G03F7/70916 ,  H05G2/005

    Abstract: The present invention provides methods and apparatus for facilitating the start up of a fuel droplet stream generator. During a start-up phase the fuel droplet stream generator is positioned so that the fuel droplets re emitted downwardly whereby gravity assists in the establishment of the stream. The droplets are monitored using a visualization system and once the stream is determined to have the desired characteristics the stream generator is moved to a second position of steady state use in which the droplet stream is emitted in a horizontal direction.

    Abstract translation: 本发明提供了一种便于启动燃料液滴流发生器的方法和装置。 在起动阶段期间，燃料液滴流发生器被定位成使得燃料液滴向下发射，由此重力有助于流的建立。 使用可视化系统监测液滴，并且一旦确定流具有所需特性，则流发生器被移动到其中液滴流在水平方向上发射的稳态使用的第二位置。

    RADIATION SOURCE
    2.
    发明申请
    RADIATION SOURCE 审中-公开
    辐射源

    公开(公告)号：WO2013023710A1

    公开(公告)日：2013-02-21

    申请号：PCT/EP2011/072633

    申请日：2011-12-13

    Applicant: ASML NETHERLANDS B.V. ,  KEMPEN, Antonius ,  LOOPSTRA, Erik ,  WAGNER, Christian ,  TEGENBOSCH, Henricus ,  SWINKELS, Gerardus

    Inventor： KEMPEN, Antonius ,  LOOPSTRA, Erik ,  WAGNER, Christian ,  TEGENBOSCH, Henricus ,  SWINKELS, Gerardus

    IPC: H05G2/00

    CPC classification number: H05G2/006 ,  G03F7/70033 ,  H05G2/003 ,  H05G2/008

    Abstract: A radiation source includes: a nozzle configured to direct a stream of fuel droplets (30) along a trajectory towards a plasma formation location; a laser configured to output laser radiation, the laser radiation directed at the fuel droplets at the plasma formation location to generate, in use, a radiation generating plasma; and a catch configured to catch fuel droplets that pass the plasma formation location, the catch including: a container (40) configured to contain a fluid (42); a driver (44) configured to drive the fluid, to cause the fluid to move; the catch being configured such that the fuel droplets are incident on that moving fluid.

    Abstract translation: 辐射源包括：喷嘴，其构造成沿着轨迹朝向等离子体形成位置引导燃料液滴流（30）; 配置成输出激光辐射的激光器，引导到等离子体形成位置处的燃料液滴处的激光辐射，以在使用中产生辐射产生等离子体; 以及构造成捕获通过等离子体形成位置的燃料液滴的挡块，所述挡块包括：构造成容纳流体（42）的容器（40）; 构造成驱动流体的驱动器（44），以使流体移动; 捕捉器构造成使得燃料液滴入射到该移动流体上。

    RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    4.
    发明申请
    RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
    辐射源，光刻设备和器件制造方法

    公开(公告)号：WO2010018039A1

    公开(公告)日：2010-02-18

    申请号：PCT/EP2009/058898

    申请日：2009-07-13

    Applicant: ASML NETHERLANDS B.V. ,  KEMPEN, Antonius ,  BANINE, Vadim ,  IVANOV, Vladimir ,  LOOPSTRA, Erik

    Inventor： KEMPEN, Antonius ,  BANINE, Vadim ,  IVANOV, Vladimir ,  LOOPSTRA, Erik

    IPC: G03F7/20 ,  G21K1/00

    CPC classification number: G03F7/2008 ,  G03F7/70575 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/00

    Abstract: A lithographic apparatus includes a source configured to generate a radiation beam comprising desired radiation and undesired radiation using a plasma, an illumination system configured to condition the radiation beam and to receive hydrogen gas during operation of the lithographic apparatus, and a support structure constructed to hold a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus is configured such that the radiation beam on entering the projection system includes at least 50% of the undesired radiation that is generated by the plasma and includes wavelengths of radiation that interact with the hydrogen gas to generate hydrogen radicals.

    Abstract translation: 光刻设备包括被配置为产生包含期望辐射和使用等离子体的不期望辐射的辐射束的源，被配置为调节辐射束并在光刻设备的操作期间接收氢气的照明系统，以及构造成保持 图案形成装置。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 衬底台被构造成保持衬底，并且投影系统被配置为将图案化的辐射束投影到衬底的目标部分上。 光刻设备被配置为使得进入投影系统的辐射束包括由等离子体产生的不期望辐射的至少50％，并且包括与氢气相互作用以产生氢自由基的辐射波长。

    METHOD AND APPARATUS FOR GENERATING RADIATION
    6.
    发明申请
    METHOD AND APPARATUS FOR GENERATING RADIATION 审中-公开
    用于产生辐射的方法和装置

    公开(公告)号：WO2014067741A1

    公开(公告)日：2014-05-08

    申请号：PCT/EP2013/070616

    申请日：2013-10-03

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BADIE, Ramin ,  BANINE, Vadim ,  DIJKSMAN, Johan ,  KEMPEN, Antonius ,  YAKUNIN, Andrei ,  VAN GREEVENBROEK, Hendrikus ,  WINKELS, Gerhardus, Koen

    IPC: G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

    Abstract: A radiation source (e.g., LPP - laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.

    Abstract translation: 用于产生极端UV（EUV）辐射的辐射源（例如，LPP-激光产生的等离子体源）具有至少两个具有不同轨迹的燃料粒子流。 每个流被引导以跨过等离子体形成区域聚焦的激发（激光）束的路径，但是轨迹在等离子体形成区域处被间隔开，并且流被相位化，使得仅一条流在 等离子体形成区域，并且使得当来自一个流的燃料粒子在等离子体产生区域产生等离子体和EUV辐射时，其它燃料颗粒被充分间隔开，以致基本上不受等离子体的影响。 该布置允许对于特定燃料粒子尺寸可实现的辐射强度的潜在加倍。

    RADIATION SOURCE
    8.
    发明申请
    RADIATION SOURCE 审中-公开
    辐射源

    公开(公告)号：WO2013174620A1

    公开(公告)日：2013-11-28

    申请号：PCT/EP2013/058869

    申请日：2013-04-29

    Applicant: ASML NETHERLANDS B.V.

    Inventor： VAN SCHOOT, Jan ,  KEMPEN, Antonius

    IPC: H05G2/00

    CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006

    Abstract: A radiation source for generating EUV radiation suitable for use in a lithographic apparatus includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets. The fuel droplets may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse with the objective of changing the shape of the droplets so that they are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.

    Abstract translation: 用于产生适用于光刻设备的EUV辐射的辐射源包括激光器，被配置为在供给燃料液滴的目标区域上激发激光脉冲。 燃料液滴可以是当被激光束激发时发射EUV辐射的锡液滴。 EUV辐射由收集器收集。 可以通过在主激光脉冲之前的激光预脉冲来预处理锡液滴，目的是改变液滴的形状，使得它们处于用于接收主激光脉冲的最佳状态。 本发明的实施例考虑了一个燃料液滴对后续液滴的蒸发的影响，并且允许调整主和/或预脉冲的定时，以考虑随后的液滴或振荡到达的任何延迟 可能由先前液滴汽化引起的后续液滴的形状。

    RADIATION SOURCE AND LITHOGRAPHIC APPARATUS
    9.
    发明申请
    RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 审中-公开
    辐射源和光刻设备

    公开(公告)号：WO2013131706A1

    公开(公告)日：2013-09-12

    申请号：PCT/EP2013/052420

    申请日：2013-02-07

    Applicant: ASML NETHERLANDS B.V.

    Inventor： KEMPEN, Antonius ,  DIJKSMAN, Johan ,  MESTROM, Wilbert

    IPC: G03F7/20 ,  H05G2/00 ,  B01L3/02 ,  B41J2/045

    CPC classification number: H05G2/006 ,  B05B17/0653 ,  G03F7/70033 ,  G03F7/70058 ,  G03F7/7085 ,  G03F7/709 ,  G03F7/70916

    Abstract: The present invention provides a method of monitoring the operation of a radiation source fuel droplet stream generator comprising a fuel-containing capillary and a piezo-electric actuator (500). The method comprises analysing the resonance frequency spectrum of a system comprising the fuel-containing capillary and the piezo-electric actuator in particular to look for changes in the resonance frequencies of the acoustic system which may be indicative of a change in the properties of the system requiring investigation.

    Abstract translation: 本发明提供一种监测包括含燃料毛细管和压电致动器（500）的辐射源燃料液滴流发生器的操作的方法。 该方法包括分析包括含燃料的毛细管和压电致动器的系统的共振频谱，以寻找声学系统的共振频率的变化，其可以指示系统的性质的变化 需要调查。

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