公开(公告)号：WO2014020003A1

公开(公告)日：2014-02-06

申请号：PCT/EP2013/065947

申请日：2013-07-30

Applicant: ASML NETHERLANDS B.V.

Inventor： BANINE, Vadim ,  MINNAERT, Arthur ,  MUITJENS, Marcel ,  YAKUNIN, Andrei ,  SCACCABAROZZI, Luigi ,  MALLMANN, Hans ,  BAL, Kursat ,  LUIJTEN, Carlo ,  NIENHUYS, Han-Kwang ,  HUIJBERTS, Alexander ,  GASSELING, Paulus ,  RIZO DIAGO, Pedro ,  VAN KAMPEN, Maarten ,  VAN AERLE, Nick

IPC: G03F7/20 ,  C01B31/04 ,  G21K1/06

CPC classification number: G03F7/70191 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/10

Abstract: There is disclosed a lithographic apparatus provided with a spectral purity filter which is provided in the projection system (PSW) and adjacent the substrate table (WT). The spectral purity filter is preferably a membrane (14) formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer.

Abstract translation: 公开了一种设置有光谱纯度滤光片的光刻设备，其设置在投影系统（PSW）中并且邻近衬底台（WT）。 光谱纯度滤光片优选为由多晶硅，多层材料，碳纳米管材料或石墨烯形成的膜（14）。 膜可以设置有保护性盖层和/或薄金属透明层。

公开(公告)号：WO2011032768A2

公开(公告)日：2011-03-24

申请号：PCT/EP2010/061008

申请日：2010-07-29

Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrei ,  VAN KAMPEN, Maarten ,  TIMOSHKOV, Vadim

Inventor： YAKUNIN, Andrei ,  VAN KAMPEN, Maarten ,  TIMOSHKOV, Vadim

IPC: G03F7/20 ,  G21K1/06 ,  G02B5/20

CPC classification number: G03F7/70958 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70941

Abstract: A spectral purity filter includes a substrate, a plurality of apertures through the substrate, and a plurality of walls. The walls define the plurality of apertures through the substrate. The spectral purity filter also includes a first layer formed on the substrate to reflect radiation of a first wavelength, and a second layer formed on the first layer to prevent oxidation of the first layer. The apertures are constructed and arranged to be able to transmit at least a portion of radiation of a second wavelength therethrough.

Abstract translation: 光谱纯度滤光器包括基底，穿过基底的多个孔，以及多个壁。 这些壁通过基底限定多个孔。 光谱纯度滤光片还包括形成在基板上以反射第一波长的辐射的第一层，以及形成在第一层上以防止第一层氧化的第二层。 孔被构造和布置成能够透过第二波长的至少一部分辐射。

公开(公告)号：WO2017080817A1

公开(公告)日：2017-05-18

申请号：PCT/EP2016/075655

申请日：2016-10-25

Applicant: ASML NETHERLANDS B.V.

Inventor： SCHIMMEL, Hendrikus, Gijsbertus ,  HUIJBREGTSE, Jeroen, Marcel ,  VAN KAMPEN, Maarten ,  VAN ZWOL, Pieter-Jan

IPC: G03F7/20 ,  G21K1/06

CPC classification number: G03F7/70925 ,  G03F7/70033 ,  G03F7/70883 ,  G03F7/70908 ,  G21K1/062

Abstract: A radiation system comprises a fuel emitter configured to provide fuel to a plasma formation region, a laser arranged to provide a laser beam at the plasma formation region incident on the fuel to generate a radiation emitting plasma, and a reflective or transmissive device (30) arranged to receive radiation emitted by the plasma and to reflect or transmit at least some of the received radiation along a desired path, wherein the reflective or transmissive device comprises a body configured to reflect and/or transmit said at least some of the radiation, and selected secondary electron emission (SEE) material (34) arranged relative to the body such as to emit secondary electrons in response to the received radiation, thereby to clean material from a surface of the device.

Abstract translation: 辐射系统包括配置成向等离子体形成区域提供燃料的燃料发射器，布置成在等离子体形成区域处提供入射在燃料上的激光束以产生辐射发射等离子体的激光器，以及 反射或透射装置（30），其布置成接收由等离子体发射的辐射并且沿期望路径反射或透射至少一些所接收的辐射，其中所述反射或透射装置包括被配置为反射和/或透射所述 至少一些辐射以及相对于主体布置的选择的二次电子发射（SEE）材料（34），以响应于所接收的辐射发射二次电子，由此清洁来自装置表面的材料。 p>

公开(公告)号：WO2011020623A1

公开(公告)日：2011-02-24

申请号：PCT/EP2010/005121

申请日：2010-08-20

Applicant: CARL ZEISS SMT GMBH ,  ASML NETHERLANDS B.V. ,  VAN KAMPEN, Maarten ,  EHM, Dirk, Heinrich ,  VERBERK, Rogier ,  HUIJBREGTSE, Jeroen

Inventor： VAN KAMPEN, Maarten ,  EHM, Dirk, Heinrich ,  VERBERK, Rogier ,  HUIJBREGTSE, Jeroen

IPC: G02B1/10 ,  G03F7/20 ,  G21K1/06 ,  G02B5/08

CPC classification number: G03F7/70958 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70916 ,  G21K1/062

Abstract: In order to limit the negative effect of metal contamination on reflectivity within an EUV lithography device, a reflective optical element (50) is proposed for the extreme ultraviolet and soft X-ray wavelength range with a reflective surface (59) with an uppermost layer (56), in which the uppermost layer (56) comprises one or more organic silicon compounds with a carbon-silicon and/or silicon-oxygen bond.

Abstract translation: 为了限制金属污染对EUV光刻装置内的反射率的负面影响，提出了一种用于极紫外和软X射线波长范围的反射光学元件（50），其具有最上层的反射表面（59） 56），其中最上层（56）包含一个或多个具有碳 - 硅和/或硅 - 氧键的有机硅化合物。

公开(公告)号：WO2022144179A1

公开(公告)日：2022-07-07

申请号：PCT/EP2021/086063

申请日：2021-12-16

Applicant: ASML NETHERLANDS B.V.

Inventor： NIKIPELOV, Andrey ,  FAROKHIPOOR, Saeedeh ,  VAN KAMPEN, Maarten

IPC: G02B5/08 ,  G02B1/14

Abstract: A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., mirrors of a VUV) of a wafer inspection system is disclosed. The cleaning system ionizes or disassociates the hydrogen gas in VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+), which remove water or hydrocarbons from the surface of the mirrors. The VUV mirrors may comprise a reflective material, such as aluminum. The VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may comprise a noble metal.

公开(公告)号：WO2011160861A1

公开(公告)日：2011-12-29

申请号：PCT/EP2011/054057

申请日：2011-03-17

Applicant: ASML NETHERLANDS B.V. ,  YAKUNIN, Andrei ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  VAN DER SCHOOT, Harmen ,  STEVENS, Lucas ,  VAN KAMPEN, Maarten

Inventor： YAKUNIN, Andrei ,  BANINE, Vadim ,  LOOPSTRA, Erik ,  VAN DER SCHOOT, Harmen ,  STEVENS, Lucas ,  VAN KAMPEN, Maarten

IPC: G03F7/20 ,  G21K1/06 ,  G03F1/14 ,  G02B5/20 ,  G02B5/08 ,  C01B31/04

CPC classification number: G03F1/64 ,  B82Y10/00 ,  B82Y40/00 ,  C01B32/20 ,  G02B5/0816 ,  G02B5/0891 ,  G02B5/204 ,  G02B5/208 ,  G02B27/0006 ,  G03B27/54 ,  G03F1/24 ,  G03F1/62 ,  G03F7/70058 ,  G03F7/702 ,  G03F7/70916 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/062 ,  G21K2201/061 ,  H01B1/04 ,  H01B1/24

Abstract: A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane (44) is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles (54) through the membrane. A particle trapping structure (52) is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles (58) from inside the chamber to outside the chamber.

Abstract translation: 光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。 图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。 腔室位于辐射源和图案形成装置之间。 所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。 膜（44）构造成允许辐射束的通过，并且防止污染颗粒（54）通过膜。 颗粒捕获结构（52）被配置为允许气体沿着室内的间接路径流动到室外。 间接路径构造成基本上防止污染颗粒（58）从腔室内部通过到室外。

公开(公告)号：WO2011092020A2

公开(公告)日：2011-08-04

申请号：PCT/EP2011/000385

申请日：2011-01-28

Applicant: CARL ZEISS SMT GMBH ,  ASML NETHERLANDS B.V. ,  EHM, Dirk Heinrich ,  VAN KAMPEN, Maarten ,  SCHMIDT, Stefan-Wolfgang ,  BANINE, Vadim Yevgenyevich ,  LOOPSTRA, Erik

Inventor： EHM, Dirk Heinrich ,  VAN KAMPEN, Maarten ,  SCHMIDT, Stefan-Wolfgang ,  BANINE, Vadim Yevgenyevich ,  LOOPSTRA, Erik

IPC: G03F7/20

CPC classification number: G03F7/70891 ,  G01J1/58 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70558 ,  G03F7/7085 ,  G03F7/70958

Abstract: An arrangement for use in a projection exposure tool (100) for microlithography comprises a reflective optical element (10; 110) and a radiation detector (30; 32; 130). The reflective optical element (10; 110) comprises a carrier element (12) guaranteeing the mechanical strength of the optical element (10; 110) and a reflective coating (18) disposed on the carrier element (12) for reflecting a use radiation (20a). The carrier element (12) is made of a material which upon interaction with the use radiation (20a) emits a secondary radiation (24) the wavelength of which differs from the wavelength of the use radiation (20a), and the radiation detector (30; 32; 130) is configured to detect the secondary radiation (24).

Abstract translation: 用于微光刻的投影曝光工具（100）中的布置包括反射光学元件（10; 110）和辐射检测器（30; 32; 130）。 反射光学元件（10; 110）包括保证光学元件（10; 110）的机械强度的载体元件（12）和设置在载体元件（12）上的反射涂层（18），用于反射使用辐射 20A）。 载体元件（12）由与使用辐射（20a）相互作用发射其波长与使用辐射（20a）的波长不同的次级辐射（24）和辐射探测器（30）的材料制成 ; 32; 130）被配置为检测所述次级辐射（24）。

公开(公告)号：WO2014124769A1

公开(公告)日：2014-08-21

申请号：PCT/EP2014/050552

申请日：2014-01-14

Applicant: ASML NETHERLANDS B.V.

Inventor： KUZNETSOV, Alexey ,  BOOGAARD, Arjen ,  HUIJBREGTSE, Jeroen ,  NIKIPELOV, Andrey ,  VAN KAMPEN, Maarten

IPC: G21K1/06 ,  H05G2/00

CPC classification number: G21K1/062 ,  B82Y10/00 ,  C23C28/34 ,  G03F1/24 ,  G03F7/70033 ,  G21K2201/067 ,  H05G2/008

Abstract: A method of manufacturing a multi-layer mirror (500) comprising a multi-layer stack of pairs of alternating layers of a first material (510) and silicon (520), the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer (540) of the first material with a dopant material.

Abstract translation: 一种制造多层反射镜（500）的方法，所述多层反射镜（500）包括第一材料（510）和硅（520）的交替层对的多层堆叠，所述方法包括沉积第一 材料和硅层，所述堆叠由衬底支撑并且用掺杂剂材料掺杂所述第一材料的至少第一层（540）。

公开(公告)号：WO2013127587A2

公开(公告)日：2013-09-06

申请号：PCT/EP2013/051657

申请日：2013-01-29

Applicant: ASML NETHERLANDS B.V.

Inventor： BANINE, Vadim ,  FRANKEN, Johannes ,  KEMPEN, Antonius ,  VAN KAMPEN, Maarten ,  MESTROM, Wilbert

IPC: G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/70916 ,  G03F7/7095 ,  H05G2/003

Abstract: A source collector apparatus includes a plasma generation apparatus arranged to excite a fuel to form a radiation emitting plasma, a collector arranged to collect the radiation, and a contamination receiving apparatus, wherein the contamination receiving apparatus is provided with a porous structure.

Abstract translation: 源收集器装置包括被配置为激励燃料以形成辐射发射等离子体的等离子体发生装置，被设置为收集辐射的收集器以及污染物接收装置，其中污染物接收装置被提供 具有多孔结构。

公开(公告)号：WO2012004070A1

公开(公告)日：2012-01-12

申请号：PCT/EP2011/059303

申请日：2011-06-06

Applicant: ASML Netherlands B.V. ,  JAK, Martin ,  BANINE, Vadim ,  SOER, Wouter ,  YAKUNIN, Andrei ,  VAN KAMPEN, Maarten ,  SCHASFOORT, Ad

Inventor： JAK, Martin ,  BANINE, Vadim ,  SOER, Wouter ,  YAKUNIN, Andrei ,  VAN KAMPEN, Maarten ,  SCHASFOORT, Ad

IPC: G21K3/00

CPC classification number: C09D5/08 ,  B32B15/01 ,  B32B15/018 ,  G02B5/208 ,  G03F7/70191 ,  G03F7/70308 ,  G03F7/70858 ,  G03F7/70908 ,  G03F7/70916 ,  G21K1/10 ,  H05G2/008 ,  Y10T428/12736 ,  Y10T428/12778 ,  Y10T428/12806 ,  Y10T428/12986 ,  Y10T428/31678

Abstract: A metal component (262M, 300M) is designed for use in an EUV lithography apparatus, for example as a spectral purity filter (260) or a heating element (300) in a hydrogen radical generator. An exposed surface of the metal is treated (262P, 300P) to inhibit the formation of an oxide of said metal in an air environment prior to operation. This prevents contamination of optical components by subsequent evaporation of the oxide during operation of the component at elevated temperatures.

Abstract translation: 金属部件（262M，300M）被设计用于EUV光刻设备中，例如作为氢自由基发生器中的光谱纯度过滤器（260）或加热元件（300）。 处理金属的暴露表面（262P，300P）以在操作之前在空气环境中抑制所述金属的氧化物的形成。 这防止了在组件在升高的温度下操作过程中随后氧化物的蒸发而污染光学部件。