公开(公告)号：WO2017067765A1

公开(公告)日：2017-04-27

申请号：PCT/EP2016/073084

申请日：2016-09-28

Applicant: ASML NETHERLANDS B.V.

Inventor： TEN BERGE, Peter ,  MOS, Everhardus, Cornelis ,  VAN HAREN, Richard, Johannes, Franciscus ,  WARDENIER, Peter, Hanzen ,  JENSEN, Erik ,  KASTRUP, Bernardo ,  KUBIS, Michael ,  MULKENS, Johannes, Catharinus, Hubertus ,  DECKERS, David, Frans, Simon ,  HENKE, Wolfgang, Helmut ,  LEE, Joungchel

IPC: G03F7/20

CPC classification number: G03F1/72 ,  G03F7/70425 ,  G03F7/70625

Abstract: A method including obtaining a measurement and/or simulation result of a pattern after being processed by an etch tool of a patterning system, determining a patterning error due to an etch loading effect based on the measurement and/or simulation result, and creating, by a computer system, modification information for modifying a patterning device and/or for adjusting a modification apparatus upstream in the patterning system from the etch tool based on the patterning error, wherein the patterning error is converted to a correctable error and/or reduced to a certain range, when the patterning device is modified according to the modification information and/or the modification apparatus is adjusted according to the modification information.

Abstract translation: 一种方法，包括：在由图案化系统的蚀刻工具处理之后获得图案的测量和/或模拟结果，基于所述测量结果确定由于蚀刻加载效应引起的图案化误差和/ 或模拟结果，并且由计算机系统基于图案化误差来创建用于修改图案形成装置和/或用于从蚀刻工具向上游调整图案化系统中的修改装置的修改信息，其中图案化错误被转换为 当根据修改信息修改图案形成装置和/或根据修改信息调整修改装置时，可校正的误差和/或减小到一定范围。