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Patent Agency Ranking
公开(公告)号：WO2015189026A2
公开(公告)日：2015-12-17
申请号：PCT/EP2015/061609
申请日：2015-05-26
Applicant: ASML NETHERLANDS B.V.
Inventor： FOUQUET, Christophe, david , KASTRUP, Bernardo , DEN BOEF, Arie, Jeffrey , MULKENS, Johannes, Catharinus, Hubertus , KAVANAGH, James, Benedict , KOONMEN, James, Patrick , CALLAN, Neal
IPC: G03F7/20
CPC classification number: G06F17/5081 , G03F7/705 , G03F7/70525 , G03F7/7065 , G06F17/5009 , G06N7/005 , H01L22/20
Abstract: Disclosed herein is a computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method comprising: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process.
Abstract translation: 本文公开了一种用于设备制造过程的计算机实现的缺陷预测方法，该方法涉及将设计布局的一部分处理到衬底上，所述方法包括：从所述设计布局的所述部分中识别热点; 确定所述热点的装置制造过程的处理参数的值的范围，其中当所述处理参数具有超出所述范围的值时，通过所述装置制造过程从所述热点产生缺陷; 确定处理参数的实际值; 使用设备制造过程从热点产生的缺陷确定或预测使用实际值存在，存在概率，特性或其组合。
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公开(公告)号：WO2017067765A1
公开(公告)日：2017-04-27
申请号：PCT/EP2016/073084
申请日：2016-09-28
Applicant: ASML NETHERLANDS B.V.
Inventor： TEN BERGE, Peter , MOS, Everhardus, Cornelis , VAN HAREN, Richard, Johannes, Franciscus , WARDENIER, Peter, Hanzen , JENSEN, Erik , KASTRUP, Bernardo , KUBIS, Michael , MULKENS, Johannes, Catharinus, Hubertus , DECKERS, David, Frans, Simon , HENKE, Wolfgang, Helmut , LEE, Joungchel
IPC: G03F7/20
CPC classification number: G03F1/72 , G03F7/70425 , G03F7/70625
Abstract: A method including obtaining a measurement and/or simulation result of a pattern after being processed by an etch tool of a patterning system, determining a patterning error due to an etch loading effect based on the measurement and/or simulation result, and creating, by a computer system, modification information for modifying a patterning device and/or for adjusting a modification apparatus upstream in the patterning system from the etch tool based on the patterning error, wherein the patterning error is converted to a correctable error and/or reduced to a certain range, when the patterning device is modified according to the modification information and/or the modification apparatus is adjusted according to the modification information.
Abstract translation: 一种方法，包括：在由图案化系统的蚀刻工具处理之后获得图案的测量和/或模拟结果，基于所述测量结果确定由于蚀刻加载效应引起的图案化误差和/ 或模拟结果，并且由计算机系统基于图案化误差来创建用于修改图案形成装置和/或用于从蚀刻工具向上游调整图案化系统中的修改装置的修改信息，其中图案化错误被转换为 当根据修改信息修改图案形成装置和/或根据修改信息调整修改装置时，可校正的误差和/或减小到一定范围。
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公开(公告)号：WO2017108444A1
公开(公告)日：2017-06-29
申请号：PCT/EP2016/080374
申请日：2016-12-09
Applicant: ASML NETHERLANDS B.V.
Inventor： KASTRUP, Bernardo , MULKENS, Johannes, Catharinus, Hubertus , VAN DEN BRINK, Marinus, Aart , BENSCHOP, Jozef, Petrus, Henricus , SMAKMAN, Erwin, Paul , DRUZHININA, Tamara , VERSCHUREN, Coen, Adrianus
IPC: H01J37/065 , H01J37/15
CPC classification number: H01J37/023 , H01J37/15 , H01J37/22 , H01J2237/0245 , H01J2237/2817
Abstract: An electron beam inspection apparatus, the apparatus including a plurality of electron beam columns (600), each electron beam column configured to provide an electron beam and detect scattered or secondary electrons from an object, and an actuator system (600, 610) configured to move (640, 630) one or more of the electron beam columns relative to another one or more of the electron beam columns. The actuator system may include a plurality of first movable structures at least partly overlapping a plurality of second movable structures, the first and second movable structures supporting the plurality of electron beam columns.
Abstract translation: 电子束检测设备，该设备包括多个电子束柱（600），每个电子束柱被配置为提供电子束并检测来自物体的散射或二次电子，以及致动器 系统（600,610），被配置为相对于另一个或多个电子束列移动（640,630）一个或多个电子束列。 致动器系统可以包括与多个第二可移动结构至少部分重叠的多个第一可移动结构，第一可移动结构和第二可移动结构支撑多个电子束柱。
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公开(公告)号：WO2017067755A1
公开(公告)日：2017-04-27
申请号：PCT/EP2016/072926
申请日：2016-09-27
Applicant: ASML NETHERLANDS B.V.
Inventor： TEN BERGE, Peter , MULKENS, Johannes, Catharinus, Hubertus , KASTRUP, Bernardo , VAN HAREN, Richard, Johannes, Franciscus
CPC classification number: G03F1/72
Abstract: A method including identifying that an area of a first substrate includes a hotspot (710) based on a measurement and/or simulation result pertaining to a patterning device in a patterning system, determining first error information (720) at the hotspot, and creating (730), by a computer system, first modification information for modifying the patterning device (said information to be transmitted with the patterning device to the patterning modification tool at 740) based on the first error information to obtain a modified patterning device.
Abstract translation: 包括基于与图案化系统中的图案形成装置有关的测量和/或模拟结果来识别第一基板的区域包括热点（710）的方法，确定第一误差信息（720） ），并且由计算机系统基于第一错误信息来创建（730）用于修改图案形成装置的第一修改信息（在740处将用图案形成装置向图案形成修改工具发送的信息）以获得 一个修改过的图案装置。
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公开(公告)号：EP3759550A1
公开(公告)日：2021-01-06
申请号：EP19705767.2
申请日：2019-02-21
Applicant: ASML Netherlands B.V.
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