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    TOPOLOGY-BASED IMAGE RENDERING IN CHARGED-PARTICLE BEAM INSPECTION SYSTEMS
    1.
    发明申请
    TOPOLOGY-BASED IMAGE RENDERING IN CHARGED-PARTICLE BEAM INSPECTION SYSTEMS 审中-公开

    公开(公告)号：WO2022128374A1

    公开(公告)日：2022-06-23

    申请号：PCT/EP2021/082773

    申请日：2021-11-24

    Applicant: ASML NETHERLANDS B.V.

    Inventor： LIANG, Haoyi ,  MA, Bing ,  CHEN, Zhichao ,  KEA, Marc, Jurian

    IPC: G03F7/20 ,  G01N21/956 ,  G06T7/00 ,  G06V10/24

    Abstract: Systems and methods of image alignment are disclosed herein. The method of image alignment may comprise obtaining an image of a sample, obtaining information associated with a corresponding reference image, generating a modified rendered image by blurring a rendered image of the corresponding reference image such that a topology of the rendered image is substantially preserved, wherein a degree of blurring is based on a characteristic of the topology, and aligning the image of the sample with the blurred rendered image. The method may further comprise aligning the image of the sample with the corresponding reference image based on an alignment between the image of the sample and the blurred rendered image.

    METHOD AND SYSTEM FOR ANOMALY-BASED DEFECT INSPECTION
    2.
    发明申请
    METHOD AND SYSTEM FOR ANOMALY-BASED DEFECT INSPECTION 审中-公开

    公开(公告)号：WO2023280489A1

    公开(公告)日：2023-01-12

    申请号：PCT/EP2022/065219

    申请日：2022-06-03

    Applicant: ASML NETHERLANDS B.V.

    Inventor： LIANG, Haoyi ,  CHEN, Yani ,  YANG, Ming-Yang ,  YANG, Yang ,  HUANG, Xiaoxia ,  CHEN, Zhichao ,  YU, Liangjiang ,  WANG, Zhe ,  PU, Lingling

    IPC: G06T7/00 ,  H01L21/66

    Abstract: Systems and methods for detecting a defect on a sample include receiving a first image and a second image associated with the first image; determining, using a clustering technique, N first feature descriptor(s) for L first pixel(s) in the first image and M second feature descriptor(s) for L second pixel(s) in the second image, wherein each of the L first pixel(s) is co-located with one of the L second pixel(s), and L, M, and N are positive integers; determining K mapping probability between a first feature descriptor of the N first feature descriptor(s) and each of K second feature descriptor(s) of the M second feature descriptor(s), wherein K is a positive integer; and providing an output for determining whether there is existence of an abnormal pixel representing a candidate defect on the sample based on a determination that one of the K mapping probability does not exceed a threshold value.

    IMAGE DISTORTION CORRECTION IN CHARGED PARTICLE INSPECTION
    3.
    发明申请
    IMAGE DISTORTION CORRECTION IN CHARGED PARTICLE INSPECTION 审中-公开

    公开(公告)号：WO2023280487A1

    公开(公告)日：2023-01-12

    申请号：PCT/EP2022/065032

    申请日：2022-06-02

    Applicant: ASML NETHERLANDS B.V.

    Inventor： LIANG, Haoyi ,  CHEN, Zhichao ,  PU, Lingling ,  CHANG, Fang-Cheng ,  YU, Liangjiang ,  WANG, Zhe

    IPC: G06T3/00 ,  G06T7/33

    Abstract: An improved systems and methods for correcting distortion of an inspection image are disclosed. An improved method for correcting distortion of an inspection image comprises acquiring an inspection image, aligning a plurality of patches of the inspection image based on a reference image corresponding to the inspection image, evaluating, by a machine learning model, alignments between each patch of the plurality of patches and a corresponding patch of the reference image, determining local alignment results for the plurality of patches of the inspection image based on a reference image corresponding to the inspection image, determining an alignment model based on the local alignment results, and correcting a distortion of the inspection image based on the alignment model.

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