公开(公告)号：KR20100130577A

公开(公告)日：2010-12-13

申请号：KR20100110912

申请日：2010-11-09

Applicant: ASML NETHERLANDS BV

Inventor： LIEBREGTS PAULUS MARTINUS MARIA ,  FIEN MENNO ,  LOOPSTRA ERIK ROELOF ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BRANDS GERT JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN

IPC: H01L21/027

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983 ,  H01L21/0274 ,  G03F7/2041 ,  G03F7/70916

Abstract: PURPOSE: A lithographic apparatus having parts with a coated film adhered thereto is provided top protect a negative effect from an UV radiation and an immersion fluid by supporting the coating on at least part of lithography apparatus. CONSTITUTION: A lighting system(IL) conditions radiation beam. A patterning device supporter(MT) supports a patterning device(MA). A substrate supporter supports the substrate. A projection system(PS) projects the patterned radiation beam on the target on the substrate. The adhesive film supports the coating on at least part of a lithography apparatus.

Abstract translation: 目的：提供具有附着有涂膜的部件的光刻设备，其通过将涂层支撑在至少一部分光刻设备上而保护由UV辐射和浸没流体产生的负面影响。 构成：照明系统（IL）规定辐射束。 图案形成装置支撑体（MT）支撑图案形成装置（MA）。 基板支撑件支撑基板。 投影系统（PS）将图案化的辐射束投射到基板上的靶上。 粘合膜在至少部分光刻设备上支撑涂层。