公开(公告)号：KR20100130577A

公开(公告)日：2010-12-13

申请号：KR20100110912

申请日：2010-11-09

Applicant: ASML NETHERLANDS BV

Inventor： LIEBREGTS PAULUS MARTINUS MARIA ,  FIEN MENNO ,  LOOPSTRA ERIK ROELOF ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BRANDS GERT JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN

IPC: H01L21/027

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983 ,  H01L21/0274 ,  G03F7/2041 ,  G03F7/70916

Abstract: PURPOSE: A lithographic apparatus having parts with a coated film adhered thereto is provided top protect a negative effect from an UV radiation and an immersion fluid by supporting the coating on at least part of lithography apparatus. CONSTITUTION: A lighting system(IL) conditions radiation beam. A patterning device supporter(MT) supports a patterning device(MA). A substrate supporter supports the substrate. A projection system(PS) projects the patterned radiation beam on the target on the substrate. The adhesive film supports the coating on at least part of a lithography apparatus.

Abstract translation: 目的：提供具有附着有涂膜的部件的光刻设备，其通过将涂层支撑在至少一部分光刻设备上而保护由UV辐射和浸没流体产生的负面影响。 构成：照明系统（IL）规定辐射束。 图案形成装置支撑体（MT）支撑图案形成装置（MA）。 基板支撑件支撑基板。 投影系统（PS）将图案化的辐射束投射到基板上的靶上。 粘合膜在至少部分光刻设备上支撑涂层。

公开(公告)号：JP2010109365A

公开(公告)日：2010-05-13

申请号：JP2009234674

申请日：2009-10-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： JAN JAAP KUIT ,  LIEBREGTS PAULUS MARTINUS MARIA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70341 ,  G03F7/70358

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithography system which can determine a maximum relative speed which can sufficiently confirm the fact that the loss of an immersion fluid is reduced to its allowable minimum level and can be configured not to exceed the speed. SOLUTION: The immersion lithography system determines an allowable maximum speed of a substrate with respect to an immersion-liquid trapping structure controlling the immersion liquid on the basis of characteristics of the exposure target substrate, and limits the speed of the substrate to the liquid trapping structure to the allowable maximum speed or below during an exposure process. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种浸没式光刻系统，其可以确定最大相对速度，其可以充分确认浸没流体的损失降低到其允许的最小水平并且可以被配置为不超过速度 。 解决方案：浸没光刻系统基于曝光目标基板的特性确定基板控制浸没液体的浸液式捕集结构的允许最大速度，并将基板的速度限制在 液体捕获结构在曝光过程中达到允许的最大速度或更低。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2012256625A

公开(公告)日：2012-12-27

申请号：JP2011090841

申请日：2011-04-15

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CORTILE ROGER HENDRIKUS MAGDALENA ,  LIEBREGTS PAULUS MARTINUS MARIA ,  RIEPEN MICHAEL ,  FABRIZIO EVANGELISTA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling system which maintains liquid in a space between a final element of a projection system and a substrate.SOLUTION: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture arranged in a second line; and an elongate opening or a plurality of openings adjacent to the gas knife device.

Abstract translation: 要解决的问题：提供一种在投影系统的最终元件和基板之间的空间中保持液体的流体处理系统。 解决方案：公开了一种用于光刻设备的流体处理结构，流体处理结构在从被构造成将浸没流体容纳在流体处理结构外部的区域的边界处依次具有：细长开口或多个 在第一行中布置的开口，其在使用中指向被配置为支撑衬底的衬底和/或衬底台; 具有布置在第二线中的细长孔的气刀装置; 以及与气刀装置相邻的细长开口或多个开口。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2010050478A

公开(公告)日：2010-03-04

申请号：JP2009243837

申请日：2009-10-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： STREEFKERK BOB ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  GRAAF ROELOF FREDERICK DE ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  JANSEN HANS ,  MARTINUS HENDRIKUS ANTONIUS LEENDERS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MERTENS JEROEN JOHANNES SOPHIA MARIA ,  VAN DER TOORN JAN-GERARD CORNELIS ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/3085 ,  G03F7/70058 ,  G03F7/70341 ,  G03F7/70825 ,  G03F7/70875 ,  G03F7/70916 ,  G03F2007/2067 ,  H01L21/0274 ,  H01L21/67098

Abstract: PROBLEM TO BE SOLVED: To reduce generation of bubbles in an immersion liquid and evaporation of the liquid. SOLUTION: An immersion lithographic apparatus includes a liquid containment structure 12 provided for at least partially defining a space 10 structured to contain a liquid between a projection system PL and a substrate W. A sectional area of the space 10 in a plane parallel to the substrate W is minimized to reduce a traverse of a rim of the substrate W whose image is to be formed (which sometimes brings a content of bubbles in the immersion liquid). The theoretically minimum size is that of a target part TP whose image is to be formed by the projection system PL. In addition, in one embodiment, a shape of a final element of the projection system PL is modified to have a size and/or a shape similar to the target part TP on a cross section parallel to the substrate W. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：减少浸没液体中气泡的产生和液体的蒸发。 浸没式光刻设备包括液体容纳结构12，其设置用于至少部分地限定被构造成在投影系统PL和衬底W之间容纳液体的空间10.平面中的空间10的截面积平行 使基板W最小化，以减少要形成图像的基板W的边缘（其有时在浸渍液体中引起气泡的含量）的横越。 理论上的最小尺寸是由投影系统PL形成其图像的目标部分TP的尺寸。 此外，在一个实施例中，投影系统PL的最终元件的形状被修改为具有与平行于基板W的横截面上的目标部件TP类似的尺寸和/或形状。版权所有： （C）2010，JPO＆INPIT

公开(公告)号：JP2011109091A

公开(公告)日：2011-06-02

申请号：JP2010251364

申请日：2010-11-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DZIOMKINA NINA VLADIMIROVNA ,  DE GRAAF ROELOF FREDERIK ,  VAN DE KERKHOF MARCUS A ,  ANTONIUS LEENDERS MARTINUS HENDRIKUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  DE ROOIJ GERARDUS MARTINUS ANTONIUS ,  HOUBEN MARTIJN ,  BADAM VIJAY KUMAR ,  SONDAG-HUETHORST JOHANNA ANTOINETTE MARIA ,  DE KRUIJF NIEK ELOUT

IPC: H01L21/027

CPC classification number: G03F7/70916 ,  B32B2307/71 ,  B32B2307/73 ,  B32B2405/00 ,  C09J7/385 ,  G03F7/70341 ,  G03F7/7095 ,  Y10T428/28 ,  Y10T428/2843 ,  Y10T428/2848 ,  Y10T428/2852

Abstract: PROBLEM TO BE SOLVED: To make it possible to suppress deterioration of removable members. SOLUTION: A member is provided to prevent immersion liquid ingress to a gap between components or to adhere to at least one component to provide a surface to a feature of an immersion system. The member has a plastic sealing portion that is adhered to the component(s). The plastic sealing portion is opaque to DUV radiation. The plastic sealing portion may be resistant to degradation through exposure to DUV radiation. The plastic sealing portion may have a liquid phobic coating or property. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：使得可以抑制可移除部件的劣化。 解决方案：提供一种构件以防止浸没液体进入部件之间的间隙或粘附到至少一个部件以向浸没系统的特征提供表面。 该部件具有粘附到部件上的塑料密封部分。 塑料密封部分对于DUV辐射是不透明的。 塑料密封部分可以耐受通过暴露于DUV辐射的退化。 塑料密封部分可以具有液体恐惧涂层或性质。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011097107A

公开(公告)日：2011-05-12

申请号：JP2011026014

申请日：2011-02-09

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  CHRISTIAAN ALEXANDER HOOGENDAM ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  BERKVENS PAUL PETRUS JOANNES ,  MONDT EVA ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a liquid supply system for nailing liquid meniscus at a prescribed position in a space between a final element of a projection system and a substrate. SOLUTION: A liquid confinement system used for immersion lithography where a liquid meniscus between a liquid confinement system and a substrate is substantially nailed in a prescribed position by a meniscus nailing form is disclosed. The meniscus nailing form has a plurality of discrete outlets arranged in a polygon. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于在投影系统的最终元件和基板之间的空间中的指定位置处用于钉液面弯液面的液体供应系统。 解决方案：公开了一种用于浸没式光刻的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉形式基本上钉在规定的位置。 半月板钉形式具有以多边形排列的多个分立出口。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011014901A

公开(公告)日：2011-01-20

申请号：JP2010142155

申请日：2010-06-23

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PATEL HRISHIKESH ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BERKVENS PAUL PETRUS JOANNES ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE ,  BLOKS RUUD HENDRICUS MARTINUS JOHANNES

IPC: H01L21/027 ,  G03F7/20

CPC classification number: H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

Abstract: PROBLEM TO BE SOLVED: To provide a fluid handling structure that reduces a change in refractive index and a focusing error resulting from a temperature change in a space by reducing a temperature change while in the fluid handling structure of immersion liquid provided to the space by the fluid handling structure.SOLUTION: The fluid handling structure is configured to supply and confine immersion liquid to a space defined between a projection system and a contacting surface facing to the fluid handling structure. The fluid handling structure includes a supply passage formed therein for passing fluid through the fluid handling structure from the outside to the space, and a heat insulator positioned at least partly adjacent to the supply passage in order to thermally insulate fluid in the supply passage from a heat load induced in the fluid handling structure.

Abstract translation: 要解决的问题：提供一种流体处理结构，其通过降低温度变化而在空间中的温度变化引起的折射率变化和聚焦误差减小，同时在由 流体处理结构。解决方案：流体处理结构被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的接触表面之间的空间中。 流体处理结构包括形成在其中的供应通道，用于将流体从外部传递到空间;以及绝热体，其至少部分地邻近供应通道定位，以将供应通道中的流体与 在流体处理结构中引起的热负荷。

公开(公告)号：JP2012147039A

公开(公告)日：2012-08-02

申请号：JP2012109711

申请日：2012-05-11

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GRAAF ROELOF FREDERICK DE ,  LAMBERTUS DONDERS SJOERD NICOLAAS ,  HOOGENDAM CHRISTIAAN A ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  STREEFKERK BOB ,  VAN DER TOORN JAN-GERARD C ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection apparatus in which measures are taken to prevent or reduce presence of bubbles in liquid through which radiated projection beam passes.SOLUTION: This provision may be done, for example, by ensuring that a gap between a substrate and a substrate table is filled with immersion liquid or by causing a localized flow toward radial outside direction from an optical axis in the vicinity of an edge of the substrate.

Abstract translation: 要解决的问题：提供一种光刻投影装置，其中采取措施来防止或减少辐射投射光束通过的液体中气泡的存在。 解决方案：这种设置可以通过例如通过确保衬底和衬底台之间的间隙被浸没液体填充或者通过使得从位于其附近的光轴朝向径向外侧方向的局部流动来实现 衬底的边缘。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2012114459A

公开(公告)日：2012-06-14

申请号：JP2012024784

申请日：2012-02-08

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LIEBREGTS PAULUS MARTINUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  UITTERDIJK TAMMO

IPC: H01L21/027

CPC classification number: G03F7/70341

Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus, in which temperature gradient in an immersion liquid is reduced or avoided.SOLUTION: An immersion lithographic apparatus, arranged in a space where one or a plurality of liquid flow dividers are enclosed by a liquid confinement structure, is disclosed. A function of the liquid flow dividers is to prevent formation of one or a plurality of recycle zones of an immersion liquid which often produce change in refractive index of the immersion liquid in the space, or consequently sometimes produce mapping error.

Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其中降低或避免了浸没液体中的温度梯度。 公开了一种浸没式光刻设备，其设置在一个或多个液体分流器被液体限制结构封闭的空间中。 液体分流器的功能是防止形成浸没液体的一个或多个再循环区域，这些再循环区域通常会产生浸没液体在空间中的折射率变化，或者因此有时会产生映射误差。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011146738A

公开(公告)日：2011-07-28

申请号：JP2011083005

申请日：2011-04-04

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LIEBREGTS PAULUS MARTINUS MARIA ,  FIEN MENNO ,  LOOPSTRA ERIK R ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIREKS DANIEL JOSEPH MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  BRANDS GERT-JAN GERARDUS JOHANEES THOMAS ,  STEFFENS KOEN

IPC: H01L21/027

CPC classification number: G03F7/70958 ,  G03F7/70341 ,  G03F7/70866 ,  G03F7/70975 ,  G03F7/70983

Abstract: PROBLEM TO BE SOLVED: To provide a lithography device which is properly protected from a negative effect resulting for ultraviolet radiation and/or immersion liquid, for example. SOLUTION: A lithography device having a detachable sticky film with a coating on at least part thereof is disclosed. A liquid supply system with a liquid confinement structure extended along at least part of a boundary of a space between a projection system and a substrate support is disclosed. The film with coating exists on at least part of the liquid confinement structure. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种光刻装置，其被适当地保护免受例如紫外线辐射和/或浸液的负面影响。 公开了一种光刻设备，其具有在其至少部分上具有涂层的可拆卸粘性膜。 公开了一种具有液体限制结构的液体供应系统，其沿着投影系统和基板支撑件之间的空间的边界的至少一部分延伸。 具有涂层的膜存在于液体限制结构的至少一部分上。 版权所有（C）2011，JPO＆INPIT