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    Method of optimizing model, method of measuring property, device manufacturing method, spectrometer, and lithographic apparatus
    1.
    发明专利
    Method of optimizing model, method of measuring property, device manufacturing method, spectrometer, and lithographic apparatus 有权
    优化模型的方法，测量属性的方法，装置制造方法，光谱仪和光刻设备

    公开(公告)号：JP2009145323A

    公开(公告)日：2009-07-02

    申请号：JP2008260585

    申请日：2008-10-07

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DEN BOEF ARIE JEFFREY ,  CRAMER HUGO AUGUSTINUS JOSEPH ,  KRIST JOUKE ,  GROOTJANS WILLEM JAN

    IPC: G01N21/27 ,  G01N21/956 ,  G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70625 ,  G01B11/24 ,  G01N21/255 ,  G01N21/47 ,  G01N21/95607 ,  G06F17/10 ,  G06F17/5009

    Abstract: PROBLEM TO BE SOLVED: To provide a method for modeling a spectrum by an improved free parameter selection method.
    SOLUTION: A set of parameters used in a model of a spectrometer includes free parameters and fixed parameters. A first set of values for the parameters is set and the model is used to generate a first spectrum. A value of one of the fixed parameters is changed to generate a second spectrum. An inverse of the model of the spectrometer is then applied to the second spectrum to generate a set of values for the parameters, the values being the same as the first set of values except for one or more free parameters. If the free parameter has significantly changed, the fixed parameter is designated as a free parameter.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种通过改进的自由参数选择方法对频谱建模的方法。 解决方案：在光谱仪模型中使用的一组参数包括自由参数和固定参数。 设置参数的第一组值，并使用该模型生成第一个频谱。 固定参数之一的值被改变以产生第二光谱。 然后将光谱仪的模型的反相应用于第二光谱以生成参数的一组值，该值与除了一个或多个空闲参数之外的第一组值相同。 如果空闲参数有明显变化，固定参数被指定为空闲参数。 版权所有（C）2009，JPO＆INPIT

    METHOD AND APPARATUS FOR DETERMINING LITHOGRAPHIC QUALITY OF A STRUCTURE
    2.
    发明申请
    METHOD AND APPARATUS FOR DETERMINING LITHOGRAPHIC QUALITY OF A STRUCTURE 审中-公开
    用于确定结构的光刻质量的方法和装置

    公开(公告)号：WO2014082813A2

    公开(公告)日：2014-06-05

    申请号：PCT/EP2013072719

    申请日：2013-10-30

    Applicant: ASML NETHERLANDS BV

    Inventor： GROOTJANS WILLEM JAN ,  GARCIA GRANDA MIGUEL ,  KRIST JOUKE ,  MEGENS HENRICUS ,  XU LU

    IPC: G03F7/20 ,  G01N21/47 ,  G01N21/956

    CPC classification number: G01N21/95607 ,  G01N21/47 ,  G01N2021/4792 ,  G01N2201/06113 ,  G01N2201/12 ,  G03F7/70133 ,  G03F7/70558 ,  G03F7/70625 ,  G03F7/70641

    Abstract: Method for determining lithographic quality of a structure produced by a lithographic process using a periodic pattern, such as a grating, detects lithographic process window edges and optimum process conditions. Method steps are: 602: printing a structure using a lithographic process using a grating pattern; 604: selecting a first characteristic, such as a polarization direction, for the illumination; 606: illuminating the structure with incident radiation with the first characteristic; 608: detecting scattered radiation; 610: selecting a second characteristic, such as a different polarization direction, for the illumination; 612: illuminating the structure with incident radiation with the second characteristic; 614: detecting scattered radiation; 616: rotating one or more angularly resolved spectrum to line up the polarizations, thus correcting for different orientations of the polarizations; 618: determining a difference between the measured angularly resolved spectra; and 620: determining a value of lithographic quality of the structure using the determined difference.

    Abstract translation: 用于通过使用诸如光栅的周期性图案的光刻处理产生的结构的光刻质量的方法检测光刻工艺窗口边缘和最佳工艺条件。 方法步骤是：602：使用光栅图案使用光刻工艺印刷结构; 604：为照明选择诸如偏振方向的第一特性; 606：用具有第一特征的入射辐射照射结构; 608：检测散射辐射; 610：为照明选择诸如不同偏振方向的第二特性; 612：用具有第二特征的入射辐射照射结构; 614：检测散射辐射; 616：旋转一个或多个角度分辨的光谱以对齐偏振，从而校正偏振的不同取向; 618：确定测得的角度分辨光谱之间的差异; 和620：使用确定的差异来确定结构的平版印刷质量的值。

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