公开(公告)号：NL2003424A

公开(公告)日：2010-04-08

申请号：NL2003424

申请日：2009-09-02

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  HOON CORNELIUS

IPC: G03F7/20

Abstract: A projection assembly includes a projection system to project a patterned radiation beam onto a substrate, a damping system to dampen a vibration of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, the active damping subsystem including a sensor to measure a position of the interface damping mass, an electromagnetic actuator to exert a force on the interface damping mass, and a controller to drive the electromagnetic actuator based on a signal provided by the sensor, the active damping subsystem including a reaction mass for the electromagnetic actuator to exert a counterforce upon based on the signal provided by the first sensor.

公开(公告)号：NL2006057A

公开(公告)日：2011-08-25

申请号：NL2006057

申请日：2011-01-25

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  EUSSEN EMIEL ,  KOENEN WILLEM ,  PASCH ENGELBERTUS ,  SCHOOT HARMEN ,  WIJST MARC ,  VERMEULEN MARCUS ,  HOON CORNELIUS

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/68

Abstract: A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.