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    LITHOGRAPHIC APPARATUS.
    1.
    发明专利
    LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2008272A

    公开(公告)日：2012-09-11

    申请号：NL2008272

    申请日：2012-02-10

    Applicant: ASML NETHERLANDS BV

    Inventor： PASCH ENGELBERTUS ,  EUSSEN EMIEL ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  OTTENS JOOST JEROEN ,  STAALS FRANK ,  MACHT LUKASZ JERZY ,  DRENT WILLIAM ,  BOGAART ERIK WILLEM

    IPC: G03F7/20 ,  H01L21/68

    Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

    LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF AN STAGE OF A LITHOGRAPHIC APPARATUS.
    3.
    发明专利
    LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF AN STAGE OF A LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2006057A

    公开(公告)日：2011-08-25

    申请号：NL2006057

    申请日：2011-01-25

    Applicant: ASML NETHERLANDS BV

    Inventor： BUTLER HANS ,  EUSSEN EMIEL ,  KOENEN WILLEM ,  PASCH ENGELBERTUS ,  SCHOOT HARMEN ,  WIJST MARC ,  VERMEULEN MARCUS ,  HOON CORNELIUS

    IPC: G03F9/00 ,  G03F7/20 ,  H01L21/68

    Abstract: A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.

    POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
    4.
    发明专利
    POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知

    公开(公告)号：NL2009196A

    公开(公告)日：2013-02-27

    申请号：NL2009196

    申请日：2012-07-17

    Applicant: ASML NETHERLANDS BV

    Inventor： KOENEN WILLEM ,  EUSSEN EMIEL ,  PASCH ENGELBERTUS ,  LEEUWEN ROBBERT ,  KOEVOETS ADRIANUS

    IPC: G03F7/20 ,  H01L21/68

    Abstract: A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.

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