公开(公告)号：NL2011658A

公开(公告)日：2014-04-29

申请号：NL2011658

申请日：2013-10-22

Applicant: ASML NETHERLANDS BV

Inventor： PASCH ENGELBERTUS ,  JANSEN ALBERT ,  JEUNINK ANDRE ,  ADRIAENS JOHANNES ,  AUER FRANK ,  BROOMANS PETERJAN ,  COSIJNS SUZANNE ,  KOENEN WILLEM ,  SMIT SEBASTIAAN ,  VERMUNT JORIS WILHELMUS HENRICUS

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2009196A

公开(公告)日：2013-02-27

申请号：NL2009196

申请日：2012-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KOENEN WILLEM ,  EUSSEN EMIEL ,  PASCH ENGELBERTUS ,  LEEUWEN ROBBERT ,  KOEVOETS ADRIANUS

IPC: G03F7/20 ,  H01L21/68

Abstract: A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.

公开(公告)号：NL2006149A

公开(公告)日：2011-09-13

申请号：NL2006149

申请日：2011-02-07

Applicant: ASML NETHERLANDS BV

Inventor： KOENEN WILLEM ,  EUSSEN EMIEL ,  PASCH ENGELBERTUS

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL2006804A

公开(公告)日：2011-12-28

申请号：NL2006804

申请日：2011-05-18

Applicant: ASML NETHERLANDS BV

Inventor： COX HENRIKUS ,  KOENEN WILLEM ,  MATTAAR THOMAS ,  PIETERSE MARTINUS THEODORUS JACOBUS ,  VERKOOIJEN ROB ANTONIUS ANDRIES

IPC: G03F7/20 ,  H01L21/68

Abstract: A measurement system is configured to derive a position quantity of an object, the measurement system includes at least one position quantity sensor configured to provide respective position quantity measurement signals; a position quantity calculator configured to determine a position quantity of the object from the position quantity measurement signal, wherein the position quantity calculator includes a torsion estimator configured to estimate a torsion of the object, the position quantity calculator being configured to correct the determined position quantity of the object for the estimated torsion.

公开(公告)号：NL2006057A

公开(公告)日：2011-08-25

申请号：NL2006057

申请日：2011-01-25

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  EUSSEN EMIEL ,  KOENEN WILLEM ,  PASCH ENGELBERTUS ,  SCHOOT HARMEN ,  WIJST MARC ,  VERMEULEN MARCUS ,  HOON CORNELIUS

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/68

Abstract: A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.