公开(公告)号：NL2009222A

公开(公告)日：2013-03-04

申请号：NL2009222

申请日：2012-07-24

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO ,  LOOPSTRA ERIK ,  SCHOOT HARMEN ,  PHILIPS DANNY ,  BEERENS RUUD

IPC: G03F7/20

Abstract: A lithographic apparatus having a programmable patterning device and a projection system. The programmable patterning device is configured to provide a plurality of radiation beams. The projection system has a lens group array configured to project the plurality of radiation beams onto a substrate. The projection system further includes a focus adjuster in an optical path corresponding to a lens group of the lens group array. The focus adjuster has an optical element having substantially zero optical power.

公开(公告)号：NL2009210A

公开(公告)日：2013-02-19

申请号：NL2009210

申请日：2012-07-20

Applicant: ASML NETHERLANDS BV

Inventor： JAGER PIETER ,  BANINE VADIM ,  BLEEKER ARNO ,  SCHOOT HARMEN ,  STEVENS LUCAS ,  VERMEULEN JOHANNES ,  WUISTER SANDER

IPC: G03F7/20

公开(公告)号：NL2006563A

公开(公告)日：2011-05-17

申请号：NL2006563

申请日：2011-04-07

Applicant: ASML NETHERLANDS BV

Inventor： YAKUNIN ANDREI ,  BANINE VADIM ,  LOOPSTRA ERIK ,  SCHOOT HARMEN ,  STEVENS LUCAS ,  KAMPEN MAARTEN

IPC: G03F7/20

公开(公告)号：NL2009902A

公开(公告)日：2013-07-01

申请号：NL2009902

申请日：2012-11-29

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  BLEEKER ARNO ,  HENNUS PIETER ,  HOEKS MARTINUS ,  HOL SVEN ANTOIN JOHAN ,  SCHOOT HARMEN ,  SLAGHEKKE BERNARDUS ,  TINNEMANS PATRICIUS ,  WIJST MARC ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA ,  BEERENS RUUD ,  FISCHER OLOF ,  AANGENENT WOUTER ,  BOSCH NIELS JOHANNES MARIA

IPC: G03F7/20

公开(公告)号：NL2006057A

公开(公告)日：2011-08-25

申请号：NL2006057

申请日：2011-01-25

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  EUSSEN EMIEL ,  KOENEN WILLEM ,  PASCH ENGELBERTUS ,  SCHOOT HARMEN ,  WIJST MARC ,  VERMEULEN MARCUS ,  HOON CORNELIUS

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/68

Abstract: A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.