公开(公告)号：NL2010632A

公开(公告)日：2013-10-29

申请号：NL2010632

申请日：2013-04-15

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  WIJST MARC

IPC: G03F7/20

Abstract: A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage, or of a component mounted on the support stage, relative to a reference frame by using the sensor part to interact with the reference part, wherein: the reference frame comprises N sub-frames coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1.

公开(公告)号：NL2011945A

公开(公告)日：2014-07-29

申请号：NL2011945

申请日：2013-12-12

Applicant: ASML NETHERLANDS BV

Inventor： KERKHOF MARCUS ,  OOSTEN ANTON ,  BUTLER HANS ,  LOOPSTRA ERIK ,  WIJST MARC ,  ZAAL KOEN

IPC: G03F7/20 ,  H05G2/00

Abstract: Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system includes a radiation source. The radiation source includes a grating structure operable to suppress the zeroth order of reflected radiation for at least a first component wavelength. The grating structure has a periodic profile including regularly spaced structures providing three surface levels, such that radiation diffracted by the grating structure includes radiation of three phases which destructively interfere for at least the zeroth order of the reflected radiation for the first component wavelength. The grating structure is on a radiation collector within the source.

公开(公告)号：NL2009902A

公开(公告)日：2013-07-01

申请号：NL2009902

申请日：2012-11-29

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  BLEEKER ARNO ,  HENNUS PIETER ,  HOEKS MARTINUS ,  HOL SVEN ANTOIN JOHAN ,  SCHOOT HARMEN ,  SLAGHEKKE BERNARDUS ,  TINNEMANS PATRICIUS ,  WIJST MARC ,  ZAAL KOEN ,  CADEE THEODORUS PETRUS MARIA ,  BEERENS RUUD ,  FISCHER OLOF ,  AANGENENT WOUTER ,  BOSCH NIELS JOHANNES MARIA

IPC: G03F7/20

公开(公告)号：NL2006057A

公开(公告)日：2011-08-25

申请号：NL2006057

申请日：2011-01-25

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  EUSSEN EMIEL ,  KOENEN WILLEM ,  PASCH ENGELBERTUS ,  SCHOOT HARMEN ,  WIJST MARC ,  VERMEULEN MARCUS ,  HOON CORNELIUS

IPC: G03F9/00 ,  G03F7/20 ,  H01L21/68

Abstract: A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.

公开(公告)号：NL2005735A

公开(公告)日：2011-06-27

申请号：NL2005735

申请日：2010-11-22

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  VERMEULEN JOHANNES ,  WIJST MARC ,  STARREVELD JEROEN ,  HOON CORNELIUS ADRIANUS LAMBERTUS ,  DEBIESME FRANCOIS

IPC: G03F7/00

公开(公告)号：NL2003846A

公开(公告)日：2010-06-22

申请号：NL2003846

申请日：2009-11-23

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN JOHANNES ,  WIJST MARC ,  CADEE THEODORUS ,  JACOBS FRANSISCUS ,  VALENTIN CHRISTIAAN LOUIS ,  BAGGEN MARCEL ,  BUTLER HANS ,  COX HENRIKUS ,  EIJK JAN ,  JEUNINK ANDRE ,  KEMPER NICOLAAS ,  SCHMIDT ROBERT-HAN MUNNIG ,  PASCH ENGELBERTUS

IPC: G03F9/00

Abstract: A lithographic apparatus includes a position controller configured to control a position of a patterning device in its planar direction by selectively pressing at least one of the side faces of the patterning device. The position controller includes a gas pressure supply and one or more outflow openings directed towards at least one side face of the patterning device so as to exert pressurized gas on this side face in order to control the position of the patterning device in its planar direction in a contactless manner.

公开(公告)号：NL2003193A

公开(公告)日：2010-03-09

申请号：NL2003193

申请日：2009-07-13

Applicant: ASML NETHERLANDS BV

Inventor： BUTLER HANS ,  JONGH ROBERTUS ,  WIJST MARC ,  TOUSAIN ROB ,  NIJHUIS MARCO OUDE ,  KOEVOETS ADRIANUS

IPC: G03F7/20

Abstract: A projection system (PS) is provided that includes a sensor system (20) that measures at least one parameter that relates to the physical deformation of a frame (10) that supports the optical elements (11) within the projection system (PS), and a control system (30) that, based on the measurements from the sensor system (20), determines an expected deviation of the position of the beam of radiation projected by the projection system (PS) that is caused by the physical deformation of the frame (10).