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公开(公告)号:NL2008272A
公开(公告)日:2012-09-11
申请号:NL2008272
申请日:2012-02-10
Applicant: ASML NETHERLANDS BV
Inventor: PASCH ENGELBERTUS , EUSSEN EMIEL , JACOBS JOHANNES HENRICUS WILHELMUS , OTTENS JOOST JEROEN , STAALS FRANK , MACHT LUKASZ JERZY , DRENT WILLIAM , BOGAART ERIK WILLEM
Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
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公开(公告)号:NL2009870A
公开(公告)日:2013-06-26
申请号:NL2009870
申请日:2012-11-23
Applicant: ASML NETHERLANDS BV
Inventor: BEERENS RUUD , PASCH ENGELBERTUS , VERMEULEN JOHANNES , CADEE THEODORUS PETRUS MARIA , LAFARRE RAYMOND
IPC: G03F7/20
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公开(公告)号:NL2004453A
公开(公告)日:2010-10-26
申请号:NL2004453
申请日:2010-03-23
Applicant: ASML NETHERLANDS BV
Inventor: PASCH ENGELBERTUS , BIJVOET DIRK-JAN , EUSSEN EMIEL , AARTS IGOR
IPC: G03F7/20
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公开(公告)号:NL2003845A
公开(公告)日:2010-06-22
申请号:NL2003845
申请日:2009-11-23
Applicant: ASML NETHERLANDS BV
Inventor: EIJK JAN , PASCH ENGELBERTUS , VERMEULEN JOHANNES
IPC: G03F9/00
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公开(公告)号:NL2011658A
公开(公告)日:2014-04-29
申请号:NL2011658
申请日:2013-10-22
Applicant: ASML NETHERLANDS BV
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公开(公告)号:NL2006118A
公开(公告)日:2011-09-06
申请号:NL2006118
申请日:2011-02-02
Applicant: ASML NETHERLANDS BV
Inventor: BUTLER HANS , PASCH ENGELBERTUS
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公开(公告)号:NL2006220A
公开(公告)日:2011-08-24
申请号:NL2006220
申请日:2011-02-17
Applicant: ASML NETHERLANDS BV
Inventor: PASCH ENGELBERTUS , BEERENS RUUD
IPC: G03F7/20
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公开(公告)号:NL2005013A
公开(公告)日:2011-02-02
申请号:NL2005013
申请日:2010-07-01
Applicant: ASML NETHERLANDS BV
Inventor: EIJK JAN , PASCH ENGELBERTUS , VERMEULEN JOHANNES
Abstract: A positioning system to position a movable object having a body, the positioning system includes an object position measurement system, an object actuator, and an object controller, wherein the positioning system further includes a stiffener to increase the stiffness and/or to damp relative movements within the body of the object, the stiffener including; one or more sensors, wherein each sensor is arranged to determine a measurement signal representative of an internal strain or relative displacement in the body, one or more actuators, wherein each actuator is arranged to exert an actuation force on a part of the body, and at least one controller, configured to provide on the basis of the measurement signal of at least one of the sensors, an actuation signal to at least one of the actuators to increase the stiffness and/or to damp movements within the body.
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公开(公告)号:NL2009197A
公开(公告)日:2013-02-27
申请号:NL2009197
申请日:2012-07-17
Applicant: ASML NETHERLANDS BV
Inventor: EIJK JAN , LOOPSTRA ERIK , PASCH ENGELBERTUS , VERMEULEN JOHANNES
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公开(公告)号:NL2008833A
公开(公告)日:2012-12-28
申请号:NL2008833
申请日:2012-05-16
Applicant: ASML NETHERLANDS BV
Inventor: HUANG YANG-SHAN , BUTLER HANS , EIJK JAN , HOL SVEN ANTOIN JOHAN , PASCH ENGELBERTUS , VEN BASTIAAN , VERMEULEN JOHANNES , CADEE THEODORUS , LEEUWEN ROBBERT
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