公开(公告)号：KR20210007971A

公开(公告)日：2021-01-20

申请号：KR20207031906

申请日：2019-04-12

Applicant: ASML NETHERLANDS BV

Inventor： DE GRAAF DENNIS ,  BEAUDRY RICHARD ,  BIRON MAXIME ,  JANSSEN PAUL ,  KATER THIJS ,  KORNELSEN KEVIN ,  KUIJKEN MICHAEL ALFRED JOSEPHUS ,  KUNTZEL JAN HENDRIK WILLEM ,  MARTEL STEPHANE ,  NASALEVICH MAXIM ALEKSANDROVICH ,  SALMASO GUIDO ,  VAN ZWOL PIETER JAN

IPC: G03F1/62 ,  G03F1/22 ,  G03F7/20

Abstract: 한면의마스크및 반대면의적어도하나의층을포함한웨이퍼가설명되며, 마스크는적어도하나의층이실질적으로없는반대면의적어도일부분위에놓이는적어도하나의스크라이브라인을포함한다. 또한, 한면의마스크및 반대면의적어도하나의층을포함한웨이퍼를제공하는단계, 마스크에서스크라이브라인을정의하는단계, 및적어도부분적으로스크라이브라인위에놓이는적어도하나의층의부분을선택적으로제거하는단계를포함하는펠리클제조방법, 및펠리클코어를제공하는단계, 및비-산화환경에서펠리클코어의적어도하나의면으로부터적어도일부재료를제거하는단계를포함하는펠리클제조방법이설명된다. 여하한의실시형태에서, 펠리클은금속질화물층을포함할수 있다.

公开(公告)号：CA3082273A1

公开(公告)日：2019-05-16

申请号：CA3082273

申请日：2018-11-06

Applicant: ASML NETHERLANDS BV

Inventor： HOUWELING ZOMER SILVESTER ,  ANDE CHAITANYA KRISHNA ,  DE GRAAF DENNIS ,  KATER THIJS ,  KUIJKEN MICHAEL ALFRED JOSEPHUS ,  VALEFI MAHDIAR

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A pellicle comprising a metal oxysilicide layer. Also disclosed in a pellicle comprising a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. Also disclosed is a method of manufacturing a pellicle for a lithographic apparatus, said method comprising: providing a metal oxysilicide layer, a lithographic assembly (LA) comprising a pellicle (15) comprising a metal oxysilicide layer, and the use of a pellicle comprising a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：CA3099013A1

公开(公告)日：2019-11-07

申请号：CA3099013

申请日：2019-04-12

Applicant: ASML NETHERLANDS BV

Inventor： DE GRAAF DENNIS ,  BEAUDRY RICHARD ,  BIRON MAXIME ,  JANSSEN PAUL ,  KATER THIJS ,  KORNELSEN KEVIN ,  KUIJKEN MICHAEL ALFRED JOSEPHUS ,  KUNTZEL JAN HENDRIK WILLEM ,  MARTEL STEPHANE ,  NASALEVICH MAXIM ALEKSANDROVICH ,  SALMASO GUIDO ,  VAN ZWOL PIETER-JAN

IPC: G03F1/62 ,  G03F7/20

Abstract: A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle comprising the steps of: providing a wafer comprising a mask on one face and at least one layer on the opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle comprising the steps of: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may comprise a metal nitride layer.