公开(公告)号：CA3082273A1

公开(公告)日：2019-05-16

申请号：CA3082273

申请日：2018-11-06

Applicant: ASML NETHERLANDS BV

Inventor： HOUWELING ZOMER SILVESTER ,  ANDE CHAITANYA KRISHNA ,  DE GRAAF DENNIS ,  KATER THIJS ,  KUIJKEN MICHAEL ALFRED JOSEPHUS ,  VALEFI MAHDIAR

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A pellicle comprising a metal oxysilicide layer. Also disclosed in a pellicle comprising a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. Also disclosed is a method of manufacturing a pellicle for a lithographic apparatus, said method comprising: providing a metal oxysilicide layer, a lithographic assembly (LA) comprising a pellicle (15) comprising a metal oxysilicide layer, and the use of a pellicle comprising a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：CA3116145A1

公开(公告)日：2020-04-23

申请号：CA3116145

申请日：2019-10-02

Applicant: ASML NETHERLANDS BV

Inventor： VAN ZWOL PIETER-JAN ,  BALTUSSEN SANDER ,  DE GRAAF DENNIS ,  FRANKEN JOHANNES CHRISTIAAN LEONARDUS ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  KNAPEN PETER SIMON ANTONIUS ,  KURGANOVA EVGENIA ,  KUZNETSOV ALEXEY SERGEEVICH ,  NOTENBOOM ARNOUD WILLEM ,  VALEFI MAHDIAR ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VAN DER WOORD TIES WOUTER ,  WONDERGEM HENDRIKUS JAN ,  ZDRAVKOV ALEKSANDAR NIKOLOV

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising: at least one membrane layer supported by a planar substrate, wherein the planar substrate comprises an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate, wherein the step of selectively removing the inner region of the planar substrate comprises using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer; such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border comprising the border region of the planar substrate and the first sacrificial layer situated between the border and the membrane layer.