公开(公告)号：KR20210007971A

公开(公告)日：2021-01-20

申请号：KR20207031906

申请日：2019-04-12

Applicant: ASML NETHERLANDS BV

Inventor： DE GRAAF DENNIS ,  BEAUDRY RICHARD ,  BIRON MAXIME ,  JANSSEN PAUL ,  KATER THIJS ,  KORNELSEN KEVIN ,  KUIJKEN MICHAEL ALFRED JOSEPHUS ,  KUNTZEL JAN HENDRIK WILLEM ,  MARTEL STEPHANE ,  NASALEVICH MAXIM ALEKSANDROVICH ,  SALMASO GUIDO ,  VAN ZWOL PIETER JAN

IPC: G03F1/62 ,  G03F1/22 ,  G03F7/20

Abstract: 한면의마스크및 반대면의적어도하나의층을포함한웨이퍼가설명되며, 마스크는적어도하나의층이실질적으로없는반대면의적어도일부분위에놓이는적어도하나의스크라이브라인을포함한다. 또한, 한면의마스크및 반대면의적어도하나의층을포함한웨이퍼를제공하는단계, 마스크에서스크라이브라인을정의하는단계, 및적어도부분적으로스크라이브라인위에놓이는적어도하나의층의부분을선택적으로제거하는단계를포함하는펠리클제조방법, 및펠리클코어를제공하는단계, 및비-산화환경에서펠리클코어의적어도하나의면으로부터적어도일부재료를제거하는단계를포함하는펠리클제조방법이설명된다. 여하한의실시형태에서, 펠리클은금속질화물층을포함할수 있다.

公开(公告)号：CA3124165A1

公开(公告)日：2020-06-25

申请号：CA3124165

申请日：2019-12-16

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN PAUL ,  KUNTZEL JAN HENDRIK WILLEM

IPC: G03F1/62 ,  G03F1/24 ,  G03F1/64 ,  G03F7/20

Abstract: There is provided a method of manufacturing a membrane assembly for EUV lithography, wherein a layer which forms at least part of a pellicle membrane is provided after one or more etching steps which define a pellicle border holding the pellicle membrane. Also provided is a pellicle substrate, the substrate comprising: a stack having a front face and back face, wherein one or more layers on the back face of the stack have been selectively removed to define a pellicle border region for holding the pellicle membrane before the layer which forms at least part of a pellicle membrane has been provided.

公开(公告)号：CA3148137A1

公开(公告)日：2021-02-04

申请号：CA3148137

申请日：2020-07-24

Applicant: ASML NETHERLANDS BV

Inventor： JANSSEN PAUL ,  BIRON MAXIME ,  DONMEZ NOYAN INCI ,  FERRE LLIN LOURDES ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  KUNTZEL JAN HENDRIK WILLEM ,  NOTENBOOM ARNOUD WILLEM ,  ROLLIER ANNE-SOPHIE ,  VAN DER WOORD TIES WOUTER ,  VAN ZWOL PIETER-JAN

IPC: G03F1/62

Abstract: A method of manufacturing a pellicle membrane, the method comprising: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly comprising a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus comprising such pellicles.

公开(公告)号：CA3099013A1

公开(公告)日：2019-11-07

申请号：CA3099013

申请日：2019-04-12

Applicant: ASML NETHERLANDS BV

Inventor： DE GRAAF DENNIS ,  BEAUDRY RICHARD ,  BIRON MAXIME ,  JANSSEN PAUL ,  KATER THIJS ,  KORNELSEN KEVIN ,  KUIJKEN MICHAEL ALFRED JOSEPHUS ,  KUNTZEL JAN HENDRIK WILLEM ,  MARTEL STEPHANE ,  NASALEVICH MAXIM ALEKSANDROVICH ,  SALMASO GUIDO ,  VAN ZWOL PIETER-JAN

IPC: G03F1/62 ,  G03F7/20

Abstract: A wafer comprising a mask on one face and at least one layer on the opposite face, wherein the mask comprises at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle comprising the steps of: providing a wafer comprising a mask on one face and at least one layer on the opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle comprising the steps of: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may comprise a metal nitride layer.