公开(公告)号：IL312810A

公开(公告)日：2024-07-01

申请号：IL31281024

申请日：2024-05-12

Applicant: ASML NETHERLANDS BV ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  VERMEULEN PAUL ALEXANDER

Inventor： HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  VERMEULEN PAUL ALEXANDER

Abstract: A method for forming a pellicle for use in a lithographic apparatus is disclosed. The method comprises: providing a porous membrane formed from a first material; applying at least one layer of two-dimensional material to at least one side of the porous membrane; and applying a capping layer to the at least one layer of two-dimensional material on at least one side of the porous membrane such that the at least one layer of two-dimensional material is disposed between the or each capping layer and the porous membrane. The at least one layer of two-dimensional material acts to close the adjacent side of the porous membrane and to form a smoother and flatter exterior surface of the pellicle. Advantageously, this allows the porous membrane to be protected from etching whilst reducing EUV flare, regardless of the material used for the capping layer.

公开(公告)号：CA3082273A1

公开(公告)日：2019-05-16

申请号：CA3082273

申请日：2018-11-06

Applicant: ASML NETHERLANDS BV

Inventor： HOUWELING ZOMER SILVESTER ,  ANDE CHAITANYA KRISHNA ,  DE GRAAF DENNIS ,  KATER THIJS ,  KUIJKEN MICHAEL ALFRED JOSEPHUS ,  VALEFI MAHDIAR

IPC: G03F1/62 ,  G03F1/64 ,  G03F7/20

Abstract: A pellicle comprising a metal oxysilicide layer. Also disclosed in a pellicle comprising a molybdenum layer, a ruthenium layer and a silicon oxynitride layer, wherein the molybdenum layer is disposed between the ruthenium layer and the silicon oxynitride layer. Also disclosed is a method of manufacturing a pellicle for a lithographic apparatus, said method comprising: providing a metal oxysilicide layer, a lithographic assembly (LA) comprising a pellicle (15) comprising a metal oxysilicide layer, and the use of a pellicle comprising a metal oxysilicide layer in a lithographic apparatus.

公开(公告)号：CA3235933A1

公开(公告)日：2023-04-27

申请号：CA3235933

申请日：2022-10-07

Applicant: ASML NETHERLANDS BV

Inventor： DONMEZ NOYAN INCI ,  VAN DER WOORD TIES WOUTER ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  KLEIN ALEXANDER LUDWIG ,  HOUWELING ZOMER SILVESTER ,  VERMEULEN PAUL ALEXANDER ,  GIESBERS ADRIANUS JOHANNES MARIA ,  KLOOTWIJK JOHAN HENDRIK ,  BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA

IPC: G03F1/62

Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：IL312111A

公开(公告)日：2024-06-01

申请号：IL31211124

申请日：2024-04-11

Applicant: ASML NETHERLANDS BV ,  BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA ,  DONMEZ NOYAN INCI ,  GIESBERS ADRIANUS JOHANNES MARIA ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER

Inventor： BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA ,  DONMEZ NOYAN INCI ,  GIESBERS ADRIANUS JOHANNES MARIA ,  HOUWELING ZOMER SILVESTER ,  KLEIN ALEXANDER LUDWIG ,  KLOOTWIJK JOHAN HENDRIK ,  REININK JOHAN ,  VAN DE GOOR TIM WILLEM JOHAN ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER

Abstract: There is provided a pellicle membrane comprising a population of metal silicide crystals in a silicon- based matrix, wherein the pellicle membrane has an emissivity of 0.3 or more. Also provided is a method of manufacturing a pellicle membrane, a pellicle assembly, a lithographic apparatus comprising such a pellicle membrane or pellicle assembly. Also described is the use of such a pellicle membrane, pellicle assembly, or lithographic apparatus in a lithographic apparatus or method.

公开(公告)号：CA3210509A1

公开(公告)日：2022-09-09

申请号：CA3210509

申请日：2022-02-03

Applicant: ASML NETHERLANDS BV

Inventor： VERMEULEN PAUL ALEXANDER ,  HOUWELING ZOMER SILVESTER

IPC: B01D71/02 ,  C01B32/158 ,  D01F9/127 ,  G03F1/62

Abstract: A carbon nanotube membrane comprising carbon nanotubes having a pre-selected bonding configuration or (m, n) chirality, characterised in that the carbon nanotube membrane comprises a substantial amount of carbon nanotubes having zigzag (m, 0) chirality and/or armchair (m, m) chirality. An apparatus for the treatment of a carbon-based membrane, a method for treating carbon based membranes, pellicles comprising carbon based membranes, lithographic apparatuses comprising carbon nanotube membranes, as well as the use of carbon nanotube membranes in lithographic apparatuses and methods are also described.

公开(公告)号：CA3149349A1

公开(公告)日：2021-03-04

申请号：CA3149349

申请日：2020-08-20

Applicant: ASML NETHERLANDS BV

Inventor： NIKIPELOV ANDREY ,  BALTUSSEN SANDER ,  BANINE VADIM YEVGENYEVICH ,  DOLGOV ALEXANDR ,  DONMEZ NOYAN INCI ,  HOUWELING ZOMER SILVESTER ,  NOTENBOOM ARNOUD WILLEM ,  VAN DE KERKHOF MARCUS ADRIANUS ,  VAN DER WOORD TIES WOUTER ,  VERMEULEN PAUL ALEXANDER ,  VLES DAVID FERDINAND ,  VORONINA VICTORIA ,  YEGEN HALIL GOKAY

IPC: G03F1/62 ,  C01B32/158 ,  D01F9/12 ,  D01F11/12 ,  G03F7/20

Abstract: A pellicle membrane for a lithographic apparatus, said membrane comprising uncapped carbon nanotubes is provided. Also provided is a method of regenerating a pellicle membrane, said method comprising decomposing a precursor compound and depositing at least some of the products of decomposition onto the pellicle membrane. Also described is a method of reducing the etch rate of a pellicle membrane, said method comprising providing an electric field in the region of the pellicle membrane to redirect ions from the pellicle, or heating elements to desorb radicals from the pellicle, preferably wherein the pellicle membrane is a carbon nanotube pellicle membrane as well as an assembly for a lithographic apparatus, said assembly including a biased electrode near or including the pellicle membrane or heating means for pellicle membrane.

公开(公告)号：CA2997135A1

公开(公告)日：2017-03-09

申请号：CA2997135

申请日：2016-08-26

Applicant: ASML NETHERLANDS BV

Inventor： HOUWELING ZOMER SILVESTER ,  CASIMIRI ERIC WILLEM FELIX ,  DRUZHININA TAMARA ,  JANSSEN PAUL ,  KUIJKEN MICHAEL ALFRED JOSEPHUS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  OOSTERHOFF SICCO ,  PETER MARIA ,  VAN DER ZANDE WILLEM JOAN ,  VAN ZWOL PIETER-JAN ,  VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  VLES DAVID FERDINAND ,  VOORTHUIJZEN WILLEM-PIETER

IPC: G03F1/62

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.