公开(公告)号：DE60116967T2

公开(公告)日：2006-09-21

申请号：DE60116967

申请日：2001-08-23

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER WERF JAN EVERT ,  KROON MARK ,  KEUR WILHELMUS CORNELIS ,  BANINE VADIM YEVGENYEVICH ,  VAN DER LAAN HANS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  LOOPSTRA EROK ROELOF

IPC: G03F7/20 ,  G21K5/00 ,  G01T1/20 ,  G01T1/28 ,  G21K5/02 ,  H01L21/027

Abstract: A radiation sensor for use with a lithographic apparatus is disclosed, the radiation sensor comprising a radiation-sensitive material which converts incident radiation of wavelength lambda1 into secondary radiation; and sensing means capable of detecting the secondary radiation emerging from said layer.

公开(公告)号：DE60118669T2

公开(公告)日：2007-01-11

申请号：DE60118669

申请日：2001-08-23

Applicant: ASML NETHERLANDS BV

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  BANINE VADIM YEVGENYEVICH ,  LEENDERS MARTINUS HENDRIKUS AN ,  WERIJ HENRI GERARD CATO ,  VISSER HUGO MATTHIEU ,  HEERENS GERRIT-JAN ,  HAM ERIK LEONARDUS ,  MEILING HANS ,  LOOPSTRA EROK ROELOF ,  DONDERS SJOERD NICOLAAS LAMBER

IPC: G03F1/14 ,  G03F7/20 ,  H01L21/027 ,  H01L21/673 ,  H01L21/677

Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.

公开(公告)号：DE60118669D1

公开(公告)日：2006-05-24

申请号：DE60118669

申请日：2001-08-23

Applicant: ASML NETHERLANDS BV

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  BANINE VADIM YEVGENYEVICH ,  LEENDERS MARTINUS HENDRIKUS AN ,  WERIJ HENRI GERARD CATO ,  VISSER HUGO MATTHIEU ,  HEERENS GERRIT-JAN ,  HAM ERIK LEONARDUS ,  MEILING HANS ,  LOOPSTRA EROK ROELOF ,  DONDERS SJOERD NICOLAAS LAMBER

IPC: G03F1/14 ,  G03F7/20 ,  H01L21/027 ,  H01L21/673 ,  H01L21/677

Abstract: In a lithographic projection apparatus, an object such as a mask is shielded from stray particles by a particle shield using electromagnetic fields. The fields may be a uniform electric field, a non-uniform electric field or an optical breeze. The particle shield is fixed to the mask holder rather than the mask.