Patent search ap:("ASML NETHERLANDS BV") AND inv:"MEIJERS RALPH" Page 1

1.

发明专利
FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知

公开(公告)号：NL2005089A

公开(公告)日：2011-03-28

申请号：NL2005089

申请日：2010-07-15

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL , KEMPER NICOLAAS , MULKENS JOHANNES , MEIJERS RALPH , EVANGELISTA FABRIZIO

IPC: G03F7/20

2.

发明专利
A LITHOGRAPHIC APPARATUS AND A METHOD OF MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS. 未知

公开(公告)号：NL2006076A

公开(公告)日：2011-09-06

申请号：NL2006076

申请日：2011-01-27

Applicant: ASML NETHERLANDS BV

Inventor： LAFARRE RAYMOND , RIEPEN MICHEL , CORTIE ROGIER , MEIJERS RALPH , EVANGELISTA FABRIZIO

IPC: G03F7/20

3.

发明专利
A FLUID HANDLING DEVICE, AN IMMERSION LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD. 未知

公开(公告)号：NL2004102A

公开(公告)日：2010-08-26

申请号：NL2004102

申请日：2010-01-18

Applicant: ASML HOLDING NV , ASML NETHERLANDS BV

Inventor： SEWELL HARRY , DONDERS SJOERD , MARKOYA LOUIS , MCCAFFERTY DIANE , MEIJERS RALPH

IPC: G03F7/20

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