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公开(公告)号:CA3003070A1
公开(公告)日:2017-05-11
申请号:CA3003070
申请日:2016-10-25
Applicant: ASML NETHERLANDS BV
Abstract: A method for manufacturing a membrane assembly (80) for EUV lithography, the method comprising: providing a stack (40) comprising a membrane layer (45) between a supporting substrate (41) and an attachment substrate (51), wherein the supporting substrate comprises an inner region and a first border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane (45) formed from at least the membrane layer; and a support (81) holding the membrane, the support formed at least partially from the first border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.
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公开(公告)号:CA2997135A1
公开(公告)日:2017-03-09
申请号:CA2997135
申请日:2016-08-26
Applicant: ASML NETHERLANDS BV
Inventor: HOUWELING ZOMER SILVESTER , CASIMIRI ERIC WILLEM FELIX , DRUZHININA TAMARA , JANSSEN PAUL , KUIJKEN MICHAEL ALFRED JOSEPHUS , LEENDERS MARTINUS HENDRIKUS ANTONIUS , OOSTERHOFF SICCO , PETER MARIA , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
IPC: G03F1/62
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
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