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1.发明申请
公开(公告)号：WO2017067813A3
公开(公告)日：2017-06-01
申请号：PCT/EP2016074280
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PÉTER MÁRIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
CPC classification number: G03F7/70958 , G03F1/62 , G03F7/70983 , G21K2201/067
Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
Abstract translation: 公开了制造用于光刻设备的薄膜的方法。 在一种布置中，该方法包括在衬底（6）的平坦表面（4）上沉积至少一个石墨烯层（2）。 衬底包括第一衬底部分和第二衬底部分（12）。 该方法进一步包括移除第一衬底部分以从该至少一个石墨烯层形成独立膜（14）。 独立式膜由第二基底部分支撑。
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公开(公告)号：CA3008477A1
公开(公告)日：2017-06-22
申请号：CA3008477
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
Inventor： VLES DAVID FERDINAND , ABEGG ERIK ACHILLES , BENDIKSEN AAGE , BROUNS DERK SERVATIUS GERTRUDA , GOVIL PRADEEP K , JANSSEN PAUL , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WILEY JAMES NORMAN
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号：CA3008050A1
公开(公告)日：2017-06-22
申请号：CA3008050
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV
Inventor： BROUNS DERK SERVATIUS GERTRUDA , JANSSEN PAUL , KAMALI MOHAMMAD REZA , PETER MARIA , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
Abstract: A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patterning device (MA) for EUV lithography; wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
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Patent Agency Ranking
公开(公告)号：CA3066546A1
公开(公告)日：2018-12-20
申请号：CA3066546
申请日：2018-06-08
Applicant: ASML NETHERLANDS BV
Inventor： VLES DAVID FERDINAND , ANDE CHAITANYA KRISHNA , DE GROOT ANTONIUS FRANCISCUS JOHANNES , GIESBERS ADRIANUS JOHANNES MARIA , JANSSEN JOHANNES JOSEPH , JANSSEN PAUL , KLOOTWIJK JOHAN HENDRIK , KNAPEN PETER SIMON ANTONIUS , KURGANOVA EVGENIA , MEIJER MARCEL PETER , MEIJERINK WOUTER ROGIER , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , OLSMAN RAYMOND , PATEL HRISHIKESH , PETER MARIA , VAN DEN BOSCH GERRIT , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WONDERGEM HENDRIKUS JAN , ZDRAVKOV ALEXANDAR NIKOLOV
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：CA3002702A1
公开(公告)日：2017-04-27
申请号：CA3002702
申请日：2016-10-11
Applicant: ASML NETHERLANDS BV
Inventor： PETER MARIA , ABEGG ERIK ACHILLES , GIESBERS ADRIANUS JOHANNES MARIA , KLOOTWIJK JOHAN HENDRIK , NASALEVICH MAXIM ALEKSANDROVICH , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
Abstract: Methods of manufacturing a pellicle for a lithographic apparatus are disclosed. In one arrangement the method comprises depositing at least one graphene layer (2) on a planar surface (4) of a substrate (6). The substrate comprises a first substrate portion and a second substrate portion (12). The method further comprises removing the first substrate portion to form a freestanding membrane (14) from the at least one graphene layer. The freestanding membrane is supported by the second substrate portion.
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公开(公告)号：CA3021916A1
公开(公告)日：2017-11-02
申请号：CA3021916
申请日：2017-04-12
Applicant: ASML NETHERLANDS BV
Inventor： NASALEVICH MAXIM ALEKSANDROVICH , ABEGG ERIK ACHILLES , BANERJEE NIRUPAM , BLAUW MICHIEL ALEXANDER , BROUNS DERK SERVATIUS GERTRUDA , JANSSEN PAUL , KRUIZINGA MATTHIAS , LENDERINK EGBERT , MAXIM NICOLAE , NIKIPELOV ANDREY , NOTENBOOM ARNOUD WILLEM , PILIEGO CLAUDIA , PETER MARIA , RISPENS GIJSBERT , SCHUH NADJA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERBURG ANTONIUS WILLEM , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID , VOORTHUIJZEN WILLEM-PIETER , ZDRAVKOV ALEKSANDAR NIKOLOV
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号：CA3008474A1
公开(公告)日：2017-06-22
申请号：CA3008474
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV
Inventor： VAN ZWOL PIETER-JAN , DE GRAAF DENNIS , JANSSEN PAUL , PETER MARIA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
Abstract: A membrane for EUV lithography, the membrane having a thickness of no more than 200 nm and comprising a stack comprising: at least one silicon layer; and at least one silicon compound layer made of a compound of silicon and an element selected from the group consisting of boron, phosphorous, bromine
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公开(公告)号：CA2997135A1
公开(公告)日：2017-03-09
申请号：CA2997135
申请日：2016-08-26
Applicant: ASML NETHERLANDS BV
Inventor： HOUWELING ZOMER SILVESTER , CASIMIRI ERIC WILLEM FELIX , DRUZHININA TAMARA , JANSSEN PAUL , KUIJKEN MICHAEL ALFRED JOSEPHUS , LEENDERS MARTINUS HENDRIKUS ANTONIUS , OOSTERHOFF SICCO , PETER MARIA , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
IPC: G03F1/62
Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method comprising: providing a stack comprising a planar substrate and at least one membrane layer, wherein the planar substrate comprises an inner region and a border region around the inner region; positioning the stack on a support such that the inner region of the planar substrate is exposed; and selectively removing the inner region of the planar substrate using a non-liquid etchant, such that the membrane assembly comprises: a membrane formed from the at least one membrane layer; and a border holding the membrane, the border formed from the border region of the planar substrate.
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