公开(公告)号：WO2016079052A3

公开(公告)日：2016-09-22

申请号：PCT/EP2015076688

申请日：2015-11-16

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER MEULEN FRITS ,  JANSEN MAARTEN MATHIJS MARINUS ,  AZEREDO LIMA JORGE MANUEL ,  BROUNS DERK SERVATIUS GERTRUDA ,  BRUIJN MARC ,  DEKKERS JEROEN ,  JANSSEN PAUL ,  KRAMER RONALD HARM GUNTHER ,  KRUIZINGA MATTHIAS ,  LANSBERGEN ROBERT GABRIËL MARIA ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  VAN DEN BOSCH GERRIT ,  VAN LOO JÉRÔME FRANÇOIS SYLVAIN VIRGILE ,  VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN ,  DE KLERK ANGELO CESAR PETER ,  DINGS JACOBUS MARIA ,  JANSSEN MAURICE LEONARDUS JOHANNES ,  KERSTENS ROLAND JACOBUS JOHANNES ,  KESTERS MARTINUS JOZEF MARIA ,  LOOS MICHEL ,  MIDDEL GEERT ,  REIJNDERS SILVESTER MATHEUS ,  THEUERZEIT FRANK JOHANNES CHRISTIAAN ,  VAN LIEVENOOGEN ANNE JOHANNES WILHELMUS

IPC: G03F1/62 ,  G03F1/00 ,  G03F7/20

CPC classification number: G03F7/70983 ,  G03F1/64 ,  G03F7/70825

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

Abstract translation: 用于适用于光刻工艺的掩模组件的模具，所述掩模组件包括图案形成装置; 以及防护薄膜框架，其构造成支撑防护薄膜组件并且用安装件安装在所述图案形成装置上; 其中所述安装件在所述图案形成装置和所述防护膜框架之间提供可释放地接合的附接。

公开(公告)号：CA2968159A1

公开(公告)日：2016-05-26

申请号：CA2968159

申请日：2015-11-16

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER MEULEN FRITS ,  JANSEN MAARTEN MATHIJS MARINUS ,  AZEREDO LIMA JORGE MANUEL ,  BROUNS DERK SERVATIUS GERTRUDA ,  BRUIJN MARC ,  DEKKERS JEROEN ,  JANSSEN PAUL ,  KRAMER RONALD HARM GUNTHER ,  KRUIZINGA MATTHIAS ,  LANSBERGEN ROBERT GABRIEL MARIA ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LOOPSTRA ERIK ROELOF ,  VAN DEN BOSCH GERRIT ,  VAN LOO JEROME FRANCOIS SYLVAIN VIRGILE ,  VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN ,  DE KLERK ANGELO CESAR PETER ,  DINGS JACOBUS MARIA ,  JANSSEN MAURICE LEONARDUS JOHANNES ,  KERSTENS ROLAND JACOBUS JOHANNES ,  KESTERS MARTINUS JOZEF MARIA ,  LOOS MICHEL ,  MIDDEL GEERT ,  REIJNDERS SILVESTER MATHEUS ,  THEUERZEIT FRANK JOHANNES CHRISTIAAN ,  VAN LIEVENOOGEN ANNE JOHANNES WILHELMUS

IPC: G03F1/62 ,  G03F1/00 ,  G03F7/20

Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.