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Patent Agency Ranking
公开(公告)号：KR20200133740A
公开(公告)日：2020-11-30
申请号：KR20207026497
申请日：2019-03-20
Applicant: ASML NETHERLANDS BV
Inventor： LANGLOIS MARC GUY , LANSBERGEN ROBERT GABRIEL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , TEGENBOSCH HENRICUS GERARDUS
IPC: H05G2/00
Abstract: 타겟재료부스러기를액체형태로축적하는수단을포함하는 EUV 시스템이개시되며, 타겟재료는광학기구상으로튀는것이차단되고, 타겟재료는고화될수 있고, 그런다음에, 융용되어콜렉터를오염시킴이없이배출될수 있는위치로전달된다.
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公开(公告)号：CA2968159A1
公开(公告)日：2016-05-26
申请号：CA2968159
申请日：2015-11-16
Applicant: ASML NETHERLANDS BV
Inventor： VAN DER MEULEN FRITS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , DEKKERS JEROEN , JANSSEN PAUL , KRAMER RONALD HARM GUNTHER , KRUIZINGA MATTHIAS , LANSBERGEN ROBERT GABRIEL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LOOPSTRA ERIK ROELOF , VAN DEN BOSCH GERRIT , VAN LOO JEROME FRANCOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , DE KLERK ANGELO CESAR PETER , DINGS JACOBUS MARIA , JANSSEN MAURICE LEONARDUS JOHANNES , KERSTENS ROLAND JACOBUS JOHANNES , KESTERS MARTINUS JOZEF MARIA , LOOS MICHEL , MIDDEL GEERT , REIJNDERS SILVESTER MATHEUS , THEUERZEIT FRANK JOHANNES CHRISTIAAN , VAN LIEVENOOGEN ANNE JOHANNES WILHELMUS
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：NL1036785A1
公开(公告)日：2009-10-20
申请号：NL1036785
申请日：2009-03-30
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
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公开(公告)号：CA3003766A1
公开(公告)日：2017-05-11
申请号：CA3003766
申请日：2016-11-03
Applicant: ASML NETHERLANDS BV
Inventor： DE JAGER PIETER WILLEM HERMAN , BIJLSMA SIPKE JACOB , FRIJNS OLAV WALDEMAR VLADIMIR , NIKIPELOV ANDREY ALEXANDROVICH , TEN KATE NICOLAAS , DERKSEN ANTONIUS THEODORUS ANNA MARIA , VERSPAY JACOBUS JOHANNUS LEONARDUS HENDRICUS , LANSBERGEN ROBERT GABRIEL MARIA , KASTELIJN AUKJE ARIANNE ANNETTE
Abstract: A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector (10) and an electron accelerator (20). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target (30) and a beam splitter (40) arranged to direct the a first portion of the electron beam along a first path towards a first side of the target (30) and to direct a second portion of the electron beam along a second path towards a second side of the target (30).
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公开(公告)号：CA2968151A1
公开(公告)日：2016-05-26
申请号：CA2968151
申请日：2015-11-16
Applicant: ASML HOLDING NV , ASML NETHERLANDS BV
Inventor： KRUIZINGA MATTHIAS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BOGAART ERIK WILLEM , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , BRULS RICHARD JOSEPH , DEKKERS JEROEN , JANSSEN PAUL , KAMALI MOHAMMAD REZA , KRAMER RONALD HARM GUNTHER , LANSBERGEN ROBERT GABRIEL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LIPSON MATTHEW , LOOPSTRA ERIK ROELOF , LYONS JOSEPH H , ROUX STEPHEN , VAN DEN BOSCH GERRIT , VAN DEN HEIJKANT SANDER , VAN DER GRAAF SANDRA , VAN DER MEULEN FRITS , VAN LOO JEROME FRANCOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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