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公开(公告)号：WO2016124536A3
公开(公告)日：2016-10-06
申请号：PCT/EP2016052055
申请日：2016-02-01
Applicant: ASML NETHERLANDS BV
Inventor： BROUNS DERK SERVATIUS GERTRUDA , DE GRAAF DENNIS , DE KRUIF ROBERTUS CORNELIS MARTINUS , JANSSEN PAUL , KRUIZINGA MATTHIAS , NOTENBOOM ARNOUD WILLEM , SMITH DANIEL ANDREW , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , WILEY JAMES NORMAN
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
Abstract translation: 一种方法，包括以下步骤：接收包括掩模和由薄膜框架保持的可移除EUV透明薄膜的掩模组件，使用检查工具从掩模移除薄膜框架和EUV透明薄膜，以检查掩模上的掩模图案， 随后将由EUV透明薄膜保持在薄膜框架上的面罩附着在面罩上。 所述方法还可以包括以下步骤：在从所述掩模移除所述薄膜框架和所述EUV透明薄膜之后，将替代的薄膜框架附接到所述掩模，所述薄膜框架保持由对所述检查工具的检查梁基本上透明的材料形成的替代薄膜 ; 并且在使用检查工具检查掩模上的掩模图案之后，从掩模去除由替代薄膜框架保持的替代薄膜，以便将由薄膜框架保持的EUV透明薄膜附着到掩模。
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公开(公告)号：WO2016079052A3
公开(公告)日：2016-09-22
申请号：PCT/EP2015076688
申请日：2015-11-16
Applicant: ASML NETHERLANDS BV
Inventor： VAN DER MEULEN FRITS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , DEKKERS JEROEN , JANSSEN PAUL , KRAMER RONALD HARM GUNTHER , KRUIZINGA MATTHIAS , LANSBERGEN ROBERT GABRIËL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LOOPSTRA ERIK ROELOF , VAN DEN BOSCH GERRIT , VAN LOO JÉRÔME FRANÇOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , DE KLERK ANGELO CESAR PETER , DINGS JACOBUS MARIA , JANSSEN MAURICE LEONARDUS JOHANNES , KERSTENS ROLAND JACOBUS JOHANNES , KESTERS MARTINUS JOZEF MARIA , LOOS MICHEL , MIDDEL GEERT , REIJNDERS SILVESTER MATHEUS , THEUERZEIT FRANK JOHANNES CHRISTIAAN , VAN LIEVENOOGEN ANNE JOHANNES WILHELMUS
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 用于适用于光刻工艺的掩模组件的模具，所述掩模组件包括图案形成装置; 以及防护薄膜框架，其构造成支撑防护薄膜组件并且用安装件安装在所述图案形成装置上; 其中所述安装件在所述图案形成装置和所述防护膜框架之间提供可释放地接合的附接。
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公开(公告)号：WO2016079051A3
公开(公告)日：2016-09-22
申请号：PCT/EP2015076687
申请日：2015-11-16
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
Inventor： KRUIZINGA MATTHIAS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BOGAART ERIK WILLEM , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , BRULS RICHARD JOSEPH , DEKKERS JEROEN , JANSSEN PAUL , KAMALI MOHAMMAD REZA , KRAMER RONALD HARM GUNTHER , LANSBERGEN ROBERT GABRIËL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LIPSON MATTHEW , LOOPSTRA ERIK ROELOF , LYONS JOSEPH H , ROUX STEPHEN , VAN DEN BOSCH GERRIT , VAN DEN HEIJKANT SANDER , VAN DER GRAAF SANDRA , VAN DER MEULEN FRITS , VAN LOO JÉRÔME FRANÇOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 适用于光刻过程的掩模组件，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述支架被构造成相对于所述图案形成装置悬挂所述薄膜框架，使得所述薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。
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公开(公告)号：CA3008477A1
公开(公告)日：2017-06-22
申请号：CA3008477
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
Inventor： VLES DAVID FERDINAND , ABEGG ERIK ACHILLES , BENDIKSEN AAGE , BROUNS DERK SERVATIUS GERTRUDA , GOVIL PRADEEP K , JANSSEN PAUL , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , PETER MARIA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WILEY JAMES NORMAN
Abstract: A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
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公开(公告)号：CA2968159A1
公开(公告)日：2016-05-26
申请号：CA2968159
申请日：2015-11-16
Applicant: ASML NETHERLANDS BV
Inventor： VAN DER MEULEN FRITS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , DEKKERS JEROEN , JANSSEN PAUL , KRAMER RONALD HARM GUNTHER , KRUIZINGA MATTHIAS , LANSBERGEN ROBERT GABRIEL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LOOPSTRA ERIK ROELOF , VAN DEN BOSCH GERRIT , VAN LOO JEROME FRANCOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , DE KLERK ANGELO CESAR PETER , DINGS JACOBUS MARIA , JANSSEN MAURICE LEONARDUS JOHANNES , KERSTENS ROLAND JACOBUS JOHANNES , KESTERS MARTINUS JOZEF MARIA , LOOS MICHEL , MIDDEL GEERT , REIJNDERS SILVESTER MATHEUS , THEUERZEIT FRANK JOHANNES CHRISTIAAN , VAN LIEVENOOGEN ANNE JOHANNES WILHELMUS
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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Patent Agency Ranking
公开(公告)号：NL2012362A
公开(公告)日：2014-09-30
申请号：NL2012362
申请日：2014-03-04
Applicant: ASML NETHERLANDS BV
Inventor： WILEY JAMES NORMAN , SCACCABAROZZI LUIGI , BROUNS DERK SERVATIUS GERTRUDA , ARIAS ESPINOZA JUAN DIEGO , WINTER LAURENTIUS , DHALLUIN FLORIAN DIDIER ALBIN , RIZO DIAGO PEDRO
IPC: G03F7/20
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公开(公告)号：CA3117253A1
公开(公告)日：2020-04-30
申请号：CA3117253
申请日：2019-10-17
Applicant: ASML NETHERLANDS BV
Inventor： SAFINOWSKI PAWEL , BROUNS DERK SERVATIUS GERTRUDA
Abstract: Inspection apparatus for inspecting an object such as a pellicle for use in an EUV lithographic apparatus, the inspection apparatus comprising: - a vacuum chamber; - a load lock forming an interface between the vacuum chamber and an ambient environment; - a stage apparatus configured to receive the object from the load lock and displace the object inside the vacuum chamber; wherein the vacuum chamber comprises a first parking position and a second parking position for temporarily storing the object.
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公开(公告)号：CA3008050A1
公开(公告)日：2017-06-22
申请号：CA3008050
申请日：2016-12-02
Applicant: ASML NETHERLANDS BV
Inventor： BROUNS DERK SERVATIUS GERTRUDA , JANSSEN PAUL , KAMALI MOHAMMAD REZA , PETER MARIA , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VLES DAVID FERDINAND , VOORTHUIJZEN WILLEM-PIETER
Abstract: A membrane assembly (80) for EUV lithography, the membrane assembly comprising: a planar membrane (40); a border (81) configured to hold the membrane; and a frame assembly (50) connected to the border and configured to attach to a patterning device (MA) for EUV lithography; wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.
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公开(公告)号：CA2975806A1
公开(公告)日：2016-08-11
申请号：CA2975806
申请日：2016-02-01
Applicant: ASML NETHERLANDS BV
Inventor： BROUNS DERK SERVATIUS GERTRUDA , DE GRAAF DENNIS , DE KRUIF ROBERTUS CORNELIS MARTINUS , JANSSEN PAUL , KRUIZINGA MATTHIAS , NOTENBOOM ARNOUD WILLEM , SMITH DANIEL ANDREW , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , WILEY JAMES NORMAN
Abstract: A method comprising the steps of receiving a mask assembly comprising a mask and a removable EUV transparent pellicle held by a pellicle frame, removing the pellicle frame and EUV transparent pellicle from the mask, using an inspection tool to inspect the mask pattern on the mask, and subsequently attaching to the mask an EUV transparent pellicle held by a pellicle frame. The method may also comprise the following steps: after removing the pellicle frame and EUV transparent pellicle from the mask, attaching to the mask an alternative pellicle frame holding an alternative pellicle formed from a material which is substantially transparent to an inspection beam of the inspection tool; and after using an inspection tool to inspect the mask pattern on the mask, removing the alternative pellicle held by the alternative pellicle frame from the mask in order to attach to the mask the EUV transparent pellicle held by the pellicle frame.
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公开(公告)号：CA3021916A1
公开(公告)日：2017-11-02
申请号：CA3021916
申请日：2017-04-12
Applicant: ASML NETHERLANDS BV
Inventor： NASALEVICH MAXIM ALEKSANDROVICH , ABEGG ERIK ACHILLES , BANERJEE NIRUPAM , BLAUW MICHIEL ALEXANDER , BROUNS DERK SERVATIUS GERTRUDA , JANSSEN PAUL , KRUIZINGA MATTHIAS , LENDERINK EGBERT , MAXIM NICOLAE , NIKIPELOV ANDREY , NOTENBOOM ARNOUD WILLEM , PILIEGO CLAUDIA , PETER MARIA , RISPENS GIJSBERT , SCHUH NADJA , VAN DE KERKHOF MARCUS ADRIANUS , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERBURG ANTONIUS WILLEM , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VLES DAVID , VOORTHUIJZEN WILLEM-PIETER , ZDRAVKOV ALEKSANDAR NIKOLOV
Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane comprises a stack having layers in the following order: a first capping layer comprising an oxide of a first metal; a base layer comprising a compound comprising a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer comprising an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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