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Patent Agency Ranking
公开(公告)号：WO2016079052A3
公开(公告)日：2016-09-22
申请号：PCT/EP2015076688
申请日：2015-11-16
Applicant: ASML NETHERLANDS BV
Inventor： VAN DER MEULEN FRITS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , DEKKERS JEROEN , JANSSEN PAUL , KRAMER RONALD HARM GUNTHER , KRUIZINGA MATTHIAS , LANSBERGEN ROBERT GABRIËL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LOOPSTRA ERIK ROELOF , VAN DEN BOSCH GERRIT , VAN LOO JÉRÔME FRANÇOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , DE KLERK ANGELO CESAR PETER , DINGS JACOBUS MARIA , JANSSEN MAURICE LEONARDUS JOHANNES , KERSTENS ROLAND JACOBUS JOHANNES , KESTERS MARTINUS JOZEF MARIA , LOOS MICHEL , MIDDEL GEERT , REIJNDERS SILVESTER MATHEUS , THEUERZEIT FRANK JOHANNES CHRISTIAAN , VAN LIEVENOOGEN ANNE JOHANNES WILHELMUS
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 用于适用于光刻工艺的掩模组件的模具，所述掩模组件包括图案形成装置; 以及防护薄膜框架，其构造成支撑防护薄膜组件并且用安装件安装在所述图案形成装置上; 其中所述安装件在所述图案形成装置和所述防护膜框架之间提供可释放地接合的附接。
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公开(公告)号：WO2016079051A3
公开(公告)日：2016-09-22
申请号：PCT/EP2015076687
申请日：2015-11-16
Applicant: ASML NETHERLANDS BV , ASML HOLDING NV
Inventor： KRUIZINGA MATTHIAS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BOGAART ERIK WILLEM , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , BRULS RICHARD JOSEPH , DEKKERS JEROEN , JANSSEN PAUL , KAMALI MOHAMMAD REZA , KRAMER RONALD HARM GUNTHER , LANSBERGEN ROBERT GABRIËL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LIPSON MATTHEW , LOOPSTRA ERIK ROELOF , LYONS JOSEPH H , ROUX STEPHEN , VAN DEN BOSCH GERRIT , VAN DEN HEIJKANT SANDER , VAN DER GRAAF SANDRA , VAN DER MEULEN FRITS , VAN LOO JÉRÔME FRANÇOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN
CPC classification number: G03F7/70983 , G03F1/64 , G03F7/70825
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
Abstract translation: 适用于光刻过程的掩模组件，所述掩模组件包括图案形成装置; 以及被配置为支撑薄膜并用安装件安装在所述图案形成装置上的薄膜框架; 其中所述支架被构造成相对于所述图案形成装置悬挂所述薄膜框架，使得所述薄膜框架和所述图案形成装置之间存在间隙; 并且其中所述安装件在所述图案形成装置和所述薄膜框架之间提供可释放地接合的附接。
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公开(公告)号：CA2968159A1
公开(公告)日：2016-05-26
申请号：CA2968159
申请日：2015-11-16
Applicant: ASML NETHERLANDS BV
Inventor： VAN DER MEULEN FRITS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , DEKKERS JEROEN , JANSSEN PAUL , KRAMER RONALD HARM GUNTHER , KRUIZINGA MATTHIAS , LANSBERGEN ROBERT GABRIEL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LOOPSTRA ERIK ROELOF , VAN DEN BOSCH GERRIT , VAN LOO JEROME FRANCOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN , DE KLERK ANGELO CESAR PETER , DINGS JACOBUS MARIA , JANSSEN MAURICE LEONARDUS JOHANNES , KERSTENS ROLAND JACOBUS JOHANNES , KESTERS MARTINUS JOZEF MARIA , LOOS MICHEL , MIDDEL GEERT , REIJNDERS SILVESTER MATHEUS , THEUERZEIT FRANK JOHANNES CHRISTIAAN , VAN LIEVENOOGEN ANNE JOHANNES WILHELMUS
Abstract: Tooling for a mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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公开(公告)号：CA3066546A1
公开(公告)日：2018-12-20
申请号：CA3066546
申请日：2018-06-08
Applicant: ASML NETHERLANDS BV
Inventor： VLES DAVID FERDINAND , ANDE CHAITANYA KRISHNA , DE GROOT ANTONIUS FRANCISCUS JOHANNES , GIESBERS ADRIANUS JOHANNES MARIA , JANSSEN JOHANNES JOSEPH , JANSSEN PAUL , KLOOTWIJK JOHAN HENDRIK , KNAPEN PETER SIMON ANTONIUS , KURGANOVA EVGENIA , MEIJER MARCEL PETER , MEIJERINK WOUTER ROGIER , NASALEVICH MAXIM ALEKSANDROVICH , NOTENBOOM ARNOUD WILLEM , OLSMAN RAYMOND , PATEL HRISHIKESH , PETER MARIA , VAN DEN BOSCH GERRIT , VAN DEN EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES , VAN DER ZANDE WILLEM JOAN , VAN ZWOL PIETER-JAN , VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS , VOORTHUIJZEN WILLEM-PIETER , WONDERGEM HENDRIKUS JAN , ZDRAVKOV ALEXANDAR NIKOLOV
Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.
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公开(公告)号：CA2968151A1
公开(公告)日：2016-05-26
申请号：CA2968151
申请日：2015-11-16
Applicant: ASML HOLDING NV , ASML NETHERLANDS BV
Inventor： KRUIZINGA MATTHIAS , JANSEN MAARTEN MATHIJS MARINUS , AZEREDO LIMA JORGE MANUEL , BOGAART ERIK WILLEM , BROUNS DERK SERVATIUS GERTRUDA , BRUIJN MARC , BRULS RICHARD JOSEPH , DEKKERS JEROEN , JANSSEN PAUL , KAMALI MOHAMMAD REZA , KRAMER RONALD HARM GUNTHER , LANSBERGEN ROBERT GABRIEL MARIA , LEENDERS MARTINUS HENDRIKUS ANTONIUS , LIPSON MATTHEW , LOOPSTRA ERIK ROELOF , LYONS JOSEPH H , ROUX STEPHEN , VAN DEN BOSCH GERRIT , VAN DEN HEIJKANT SANDER , VAN DER GRAAF SANDRA , VAN DER MEULEN FRITS , VAN LOO JEROME FRANCOIS SYLVAIN VIRGILE , VERBRUGGE BEATRIJS LOUISE MARIE-JOSEPH KATRIEN
Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.
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