公开(公告)号：JP2009272636A

公开(公告)日：2009-11-19

申请号：JP2009112621

申请日：2009-05-07

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS R ,  VERMEULEN JOHANNES PETRUS MART ,  DIREKS DANIEL JOSEPH MARIA ,  DANNY MARIA HUBERTUS PHILIPS ,  VAN PUTTEN ARNOLD JAN

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03B27/52 ,  G03F7/70341 ,  G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To disclose a liquid immersion lithographic device for immersing a substrate in a lithography projection device in a liquid having a relatively high refractive index such as water so as to fill a space between the final element of a projection system and the substrate. SOLUTION: In the liquid immersion lithographic device, a liquid removing device is configured so as to remove the liquid from the substrate through a plurality of slender slots disposed along a line and also having an angle to the line, for example during exposure. The liquid removing device can act as a meniscus-fixed fixing device in a liquid immersion hood or used in a drying device for removing a liquid droplet from the substrate. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：公开一种用于将光刻投影装置中的基板浸入具有较高折射率的液体如液体的液浸式光刻装置，以填充投影系统的最终元件之间的空间 和基板。 解决方案：在液浸式光刻设备中，液体移除装置被配置成通过沿着一条线设置的多个细长的狭缝从衬底中移除液体，并且还具有与线的角度，例如在曝光期间 。 液体移除装置可以用作液浸罩中的弯液面固定固定装置，或用于从基板除去液滴的干燥装置中。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009200492A

公开(公告)日：2009-09-03

申请号：JP2009035133

申请日：2009-02-18

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VERMEULEN JOHANNES PETRUS MART ,  BENSCHOP JOZEF PETRUS HENRICUS ,  KATE NICOLAAS TEN ,  HUBERTUS MULKENS JOHANNES C ,  STEVENS LUCAS HENRICUS JOHANNE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70733

Abstract: PROBLEM TO BE SOLVED: To provide a liquid immersion lithographic apparatus in which a member is disposed over the surfaces of a substrate and a substrate table. SOLUTION: An immersion liquid is provided to a space between a substrate table, a substrate, and a member. In this embodiment, a radiation beam can pass through a plate. In the other embodiment, the member has a radiation beam pass-through hole. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种其中部件设置在基板和基板台的表面上的液浸式光刻设备。 解决方案：将浸没液体提供到衬底台，衬底和构件之间的空间。 在该实施例中，辐射束可以穿过板。 在另一实施例中，构件具有辐射束通孔。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007329506A

公开(公告)日：2007-12-20

申请号：JP2007218716

申请日：2007-08-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BUIS EDWIN JOHAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  VAN ELP JAN ,  HOOGKAMP JAN FREDERIK ,  VAN MEER ASCHWIN LODEWIJK HEND ,  SMULDERS PATRICK JOHANNES CORN ,  SPANJERS FRANCISCUS ANDREAS CO ,  VERMEULEN JOHANNES PETRUS MART ,  VISSER RAIMOND ,  TEGENBOSCH HENRICUS GERARDUS ,  VAN DEN BERG JOHANNES CHARLES ,  VAN DE SANDE HENRICUS JOHANNES ,  VERVOORT THIJS

IPC: B08B1/00 ,  H01L21/677 ,  B25J13/08 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/683 ,  H02N13/00

CPC classification number: G03F7/70741 ,  B25J13/089 ,  G03F7/7075 ,  G03F7/70925 ,  H01L21/6833 ,  H02N13/00

Abstract: PROBLEM TO BE SOLVED: To provide a method of effectively compensating for a positional shift including a tilt between a substrate and a supporting structure and a vertical displacement when moving the substrate in a lithographic projection apparatus using the supporting structure.
SOLUTION: By providing compliant parts (14, 26) in the supporting structure for holding and moving a substrate (W), for example, a supporting frame (18) of a robot arm (10) adaptable to the tilt and/or the vertical displacement. Clamps (20, 22, 24) that the supporting frame (18) comprises may be a Johnson-Raybeck effect type clamp that requires a stringent positional precision, and the cleaning of the inside of the projection apparatus is carried out by using only one substrate.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供一种有效地补偿包括基板和支撑结构之间的倾斜的位置偏移以及在使用支撑结构在光刻投影装置中移动基板时的垂直位移的方法。 解决方案：通过在用于保持和移动衬底（W）的支撑结构中提供柔性部件（14,26），例如适用于倾斜和/或倾斜的机器人臂（10）的支撑框架（18） 或垂直位移。 支撑框架（18）包括的夹具（20,22,24）可以是要求严格的位置精度的Johnson-Raybeck效果型夹具，并且通过仅使用一个基板来执行投影装置的内部的清洁 。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2004343076A

公开(公告)日：2004-12-02

申请号：JP2004102395

申请日：2004-03-31

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BUIS EDWIN JOHAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  VAN ELP JAN ,  HOOGKAMP JAN FREDERIK ,  VAN MEER ASCHWIN LODEWIJK HEND ,  SMULDERS PATRICK JOHANNES CORN ,  SPANJERS FRANCISCUS ANDREAS CO ,  VERMEULEN JOHANNES PETRUS MART ,  VISSER RAIMOND ,  TEGENBOSCH HENRICUS GERARDUS ,  VAN DEN BERG JOHANNES CHARLES ,  VAN DE SANDE HENRICUS JOHANNES ,  VERVOORT THIJS

IPC: B08B1/00 ,  B25J13/08 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/677 ,  H01L21/683 ,  H02N13/00 ,  H01L21/68

CPC classification number: G03F7/70741 ,  B25J13/089 ,  G03F7/7075 ,  G03F7/70925 ,  H01L21/6833 ,  H02N13/00

Abstract: PROBLEM TO BE SOLVED: To provide a method capable of effectively compensating an inclination between a substrate and a support structure or a misregistration including a displacement in the vertical direction when the substrate is moved by the support structure in a lithographic projection apparatus. SOLUTION: By providing a support structure for holding and moving a substrate (W), for example, flexible sections (14, 26) in a support frame (18) of a robot arm (10), it can be adapted to the tilt and/or a displacement in the vertical direction. Clamps (20, 22, 24) provided on the support frame (18) may be a Johnson-Raybeck effect type clamp, which requires the severe position accuracy, and can perform a cleaning treatment in a projection apparatus by only one substrate. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：DE60110731T2

公开(公告)日：2006-01-12

申请号：DE60110731

申请日：2001-11-26

Applicant: ASML NETHERLANDS BV

Inventor： DRIESSEN JOHANNES CORNELIS ,  SOEMERS HERMANUS MATHIAS JOANN ,  RENKENS MICHAEL JOZEFA MATHIJS ,  BISSCHOPS THEODORUS HUBERTUS J ,  VERMEULEN JOHANNES PETRUS MART ,  RIJKEN ANTONIUS MARIA

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.

公开(公告)号：SG115629A1

公开(公告)日：2005-10-28

申请号：SG200401151

申请日：2004-03-09

Applicant: ASML NETHERLANDS BV

Inventor： VAN GROOS PIETER JOHANNES MARI ,  HOOGKAMP JAN FREDERIK ,  KLOMP ALBERT JAN HENDRIK ,  LOOPSTRA ERIK ROELOF ,  VERMEULEN JOHANNES PETRUS MART ,  VUGTS JOSEPHUS CORNELIUS JOHAN ,  LIVESEY ROBERT GORDON ,  FRANSSEN JOHANNES HENDRIKUS GE

IPC: H01L21/677 ,  G03F7/20 ,  H01L21/027 ,  H01L21/683

Abstract: A method of and apparatus for maintaining a machine part arranged in an interior space of a machine, where the interior space is kept at a first pressure and is separated from an environment having a second pressure via a load lock. The method includes transporting a machine part via the load lock out of the interior space and transporting via the load lock into the interior space one of the maintained machine part and a separate replacement machine part.

公开(公告)号：SG125948A1

公开(公告)日：2006-10-30

申请号：SG200401666

申请日：2004-03-26

Applicant: ASML NETHERLANDS BV

Inventor： TINNEMANS PATRICIUS ALOYSIUS J ,  BUIS EDWIN JOHAN ,  DONDERS SJOERD NICOLAAS LAMBER ,  ELP VAN JAN ,  HOOGKAMP JAN FREDERIK ,  MEER VAN ASCHWIN LODEWIJK HEND ,  SMULDERS PATRICK JOHANNES CORN ,  SPNAJERS FRANCISCUS ANDREAS CO ,  VERMEULEN JOHANNES PETRUS MART ,  VISSER RAIMOND ,  TEGENBOSCH HENRICUS GERARDUS ,  BERG VAN DEN JOHANNES CHARLES ,  SANDE VAN DE HENRICUS JOHANNES ,  VERVOORT THIJS

IPC: B08B1/00 ,  B25J13/08 ,  B25J15/00 ,  B65G49/07 ,  G03F7/20 ,  H01L21/027 ,  H01L21/304 ,  H01L21/677 ,  H01L21/68 ,  H01L21/683 ,  H02N13/00

Abstract: The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate (W). The supporting structure maybe a robot (8). The robot (8) has a robot arm (10) with a support frame (18) for supporting, e.g. the substrate (W). The support frame (18) has one or more clamps (20, 22, 24) for holding the object (W) during movement. The robot arm comprises one or more compliant parts (14; 26; 28). The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus maybe cleaned with one single substrate only.

公开(公告)号：DE60110731D1

公开(公告)日：2005-06-16

申请号：DE60110731

申请日：2001-11-26

Applicant: ASML NETHERLANDS BV

Inventor： DRIESSEN JOHANNES CORNELIS ,  SOEMERS HERMANUS MATHIAS JOANN ,  RENKENS MICHAEL JOZEFA MATHIJS ,  BISSCHOPS THEODORUS HUBERTUS J ,  VERMEULEN JOHANNES PETRUS MART ,  RIJKEN ANTONIUS MARIA

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68

Abstract: A lithographic projection apparatus includes conduits which supply utilities to components in a vacuum chamber such as object tables and/or associated motors and/or sensors. The conduits are shielded from exposure to the vacuum by conduit conducts having at least the same number of degrees of freedom as their associated object table.

公开(公告)号：SG157300A1

公开(公告)日：2009-12-29

申请号：SG2009031923

申请日：2009-05-08

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS RUDOLF ,  VERMEULEN JOHANNES PETRUS MART ,  DIRECKS DANIEL JOZEF MARIA ,  PHILIPS DANNY MARIA HUBERTUS ,  VAN PUTTEN ARNOLD JAN

Abstract: An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.