公开(公告)号：JP2011037261A

公开(公告)日：2011-02-24

申请号：JP2010147035

申请日：2010-06-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  JEUNINK ANDRE BERNARDUS ,  DEN BOEF ARIE JEFFREY ,  BANINE VADIM YEVGENYEVICH ,  RENKENS MICHAEL JOZEF MATHIJS ,  GERARD VAN SCHOTHORST ,  DIJKSMAN JOHAN FREDERIK ,  SCHOORMANS CAROLUS JOHANNES CATHARINA ,  KOEVOETS ADRIANUS HENDRIK ,  DE SCHIFFART CATHARINUS ,  WUISTER SANDER FREDERIK

IPC: B29C59/02 ,  B81C99/00 ,  H01L21/027

CPC classification number: G03F9/7042 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To provide an improved imprint lithography apparatus and a method. SOLUTION: This imprint lithography apparatus includes: an imprint template holder 22 which is constituted in a manner to hold an imprint template 20; and a plurality of position sensors 28 which are constituted in a manner to measure the variation of the size and/or shape of the imprint template 20, and the position sensors 28 are mechanically separated from the imprint template 20. In addition, the imprint template 20 is used in order to imprint a pattern on a board 34, and the variation of the size and/or shape of the imprint template 20 are measured while the pattern is imprinted on the board 34 by this lithography method. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供一种改进的压印光刻设备和方法。 解决方案：该压印光刻设备包括：压印模板保持器22，其以保持压印模板20的方式构成; 以及以测量压印模板20的尺寸和/或形状的变化的方式构成的多个位置传感器28，并且位置传感器28与压印模板20机械分离。此外，压印模板 20用于在板34上印刷图案，并且通过该光刻方法在图案印刷在板34上的同时测量压印模板20的尺寸和/或形状的变化。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：NL2011427A

公开(公告)日：2014-04-02

申请号：NL2011427

申请日：2013-09-12

Applicant: ASML NETHERLANDS BV

Inventor： DEKKERS JEROEN ,  JEUNINK ANDRE BERNARDUS ,  LOOPSTRA ERIK ,  PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  RENKENS MICHAEL JOZEF MATHIJS ,  SCHOORMANS CAROLUS JOHANNES CATHARINA ,  HOEKSTRA PETER

IPC: G01D5/26 ,  G03F7/20 ,  G03F9/00