公开(公告)号：JP2003100626A

公开(公告)日：2003-04-04

申请号：JP2002245963

申请日：2002-07-23

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  HINTERSTEINER JASON DOUGLAS ,  KRUIZINGA BORGERT ,  MCCARTHY MATTHEW EUGENE ,  OSKOTSKY MARK ,  RYZHIKOV LEV ,  SAKIN LEV ,  SMIRNOV STANISLAV ,  SNIJDERS BART ,  VAN DER MAST KAREL DIEDERICK ,  VISSER HUIBERT

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an imaging apparatus capable of using for the manufacture of an integrated circuit and other (semiconductor) devices as a commercially charming alternative plan instead of using a conventional lithographic projector (a method using a mask). SOLUTION: The imaging apparatus comprises a radiant ray system for supplying a projection beam of radiant ray, a supporting structure for supporting a pattern forming means effecting a pattern formation in accordance with the desired pattern, a substrate table for retaining a substrate, and a projection system for projecting a beam formed through the pattern formation on the target part of the substrate. The pattern formation means comprises a plurality of individual pattern formation subelements to produce subbeams formed through pattern formation, by using respective subelements. The imaging apparatus comprises a combining means for combining a plurality of subbeams formed through the pattern formation, to a single image formed through the pattern formation.

公开(公告)号：DE60227135D1

公开(公告)日：2008-07-31

申请号：DE60227135

申请日：2002-07-24

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  HINTERSTEINER JASON DOUGLAS ,  KRUIZINGA BORGERT ,  MCCARTHY MATTHEW EUGENE ,  OSKOTSKY MARK ,  RYZHIKOV LEV ,  SAKIN LEV ,  SMIRNOV STANISLAV ,  SNIJDERS BART ,  VAN DER MAST KAREL DIEDERICK

IPC: G03F7/20 ,  H01L21/027

Abstract: An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.