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    Illumination system
    2.
    发明专利
    Illumination system 有权
    照明系统

    公开(公告)号：JP2007179039A

    公开(公告)日：2007-07-12

    申请号：JP2006325363

    申请日：2006-12-01

    Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールデイング エヌ.ブイ.

    Inventor： VISSER HUIBERT ,  KLINKHAMER JACOB FREDRIK FRISO ,  RYZHIKOV LEV ,  COSTON SCOTT ,  JOOBEUR ADEL ,  VINK HENRI JOHANNES P ,  SHMAREV YEVGENIY KONSTANTINOVICH

    IPC: G03F7/20 ,  H01L21/027

    CPC classification number: G03F7/70583 ,  G02B27/0905 ,  G03F7/70075

    Abstract: PROBLEM TO BE SOLVED: To provide an optical apparatus that gives uniform intensity and other characteristics over the all beams when a plurality of radiation beams are projected onto a substrate. SOLUTION: The optical apparatus is provided comprising a homogenizer and a coherence remover so as to substantially homogenize and remove at least some coherence from a beam of radiation. The homogenizer is configured to convert a beam of radiation into a plurality of beams of radiation, and the coherence remover is configured such that each of the beams of radiation passes through a different channel of the coherence remover. Otherwise, the coherence remover converts a beam of radiation into a plurality of beams, and the plurality of beams of radiation are transferred to the homogenizer. COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：提供当多个辐射束投影到基板上时，在所有光束上均匀强度和其它特性的光学装置。 解决方案：提供光学装置，其包括均化器和相干去除器，以便基本均匀化并从辐射束中去除至少一些相干性。 均化器被配置为将辐射束转换成多个辐射束，并且相干去除器被配置为使得每个辐射束通过相干去除器的不同通道。 否则，相干去除器将辐射束转换成多个光束，并且将多个辐射束转移到均化器。 版权所有（C）2007，JPO＆INPIT

    IMAGING APPARATUS
    4.
    发明专利
    IMAGING APPARATUS 审中-公开

    公开(公告)号：JP2003100626A

    公开(公告)日：2003-04-04

    申请号：JP2002245963

    申请日：2002-07-23

    Applicant: ASML NETHERLANDS BV

    Inventor： BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  HINTERSTEINER JASON DOUGLAS ,  KRUIZINGA BORGERT ,  MCCARTHY MATTHEW EUGENE ,  OSKOTSKY MARK ,  RYZHIKOV LEV ,  SAKIN LEV ,  SMIRNOV STANISLAV ,  SNIJDERS BART ,  VAN DER MAST KAREL DIEDERICK ,  VISSER HUIBERT

    IPC: G03F7/20 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide an imaging apparatus capable of using for the manufacture of an integrated circuit and other (semiconductor) devices as a commercially charming alternative plan instead of using a conventional lithographic projector (a method using a mask). SOLUTION: The imaging apparatus comprises a radiant ray system for supplying a projection beam of radiant ray, a supporting structure for supporting a pattern forming means effecting a pattern formation in accordance with the desired pattern, a substrate table for retaining a substrate, and a projection system for projecting a beam formed through the pattern formation on the target part of the substrate. The pattern formation means comprises a plurality of individual pattern formation subelements to produce subbeams formed through pattern formation, by using respective subelements. The imaging apparatus comprises a combining means for combining a plurality of subbeams formed through the pattern formation, to a single image formed through the pattern formation.

    The illumination optical system
    5.
    发明专利
    The illumination optical system 审中-公开
    照明光学系统

    公开(公告)号：JP2010199605A

    公开(公告)日：2010-09-09

    申请号：JP2010101208

    申请日：2010-04-26

    Applicant: Asml Holding Nv ,  Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ. ,  エーエスエムエル ホールディング エヌ.ブイ.

    Inventor： VISSER HUIBERT ,  KLINKHAMER JACOB FREDRIK FRISO ,  RYZHIKOV LEV ,  COSTON SCOTT ,  JOOBEUR ADEL ,  VINK HENRI JOHANNES P ,  SHMAREV YEVGENIY KONSTANTINOVICH

    IPC: H01L21/027

    CPC classification number: G03F7/70583 ,  G02B27/0905 ,  G03F7/70075

    Abstract: PROBLEM TO BE SOLVED: To homogenize intensity characteristics or the like even when beams of light are individually patterned and are projected on a substrate in using an illumination source for generating a plurality of beams of light. SOLUTION: The optical apparatus includes a homogenizer 100 and a coherence remover 102 to substantially homogenize and remove at least some coherence from the beam of light. The homogenizer is structured to convert the beam of light into a plurality of beams of light. The coherence remover is so structured that respective beams of light pass through different channels of the coherence remover. In other embodiment, the coherence remover converts the beam of light into a plurality of beams of light and the plurality of beams of light are delivered to the homogenizer. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：即使在光束被单独地构图并且在使用用于产生多束光的照明源的情况下投射到基板上时也能均匀化强度特性等。 解决方案：光学装置包括均质器100和相干去除器102，以使至少一些来自光束的一致性基本均匀化并去除。 均化器被构造成将光束转换成多个光束。 相干去除器的结构使得各个光束通过相干去除器的不同通道。 在另一实施例中，相干去除器将光束转换成多个光束，并将多个光束传送到均化器。 版权所有（C）2010，JPO＆INPIT

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