公开(公告)号：JP2007110107A

公开(公告)日：2007-04-26

申请号：JP2006258963

申请日：2006-09-25

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITAL EVITCH ,  SMITS JOSEPHUS JACOBUS ,  LAMBERTUS ADRIANUS VAN DEN WIL ,  KRIVTSUN VLADIMIR M ,  STRUYCKEN ALEXANDER MATTHIJS ,  RIDDER JOHANNES B ,  VOORMA HARM-JAN ,  SPEE CAROLUS IDA MARIA ANTONIU ,  KLAAS TIMMER

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/304

CPC classification number: G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

Abstract: PROBLEM TO BE SOLVED: To remove a deposit on an optical element such as a radiating condenser of an aligner. SOLUTION: In a method for cleaning a deposit of the radiating condenser; a collector assembly has a radiating condenser, a cover plate, and a support for connecting the radiating condenser to the cover plate. The cover plate is provided so as to cover the opening of a collector chamber 48. The opening may be large enough to allow the passage of the radiating condenser and the support. The radiating condenser is cleaned by different cleaning processing. This processing is performed by a cleaner. The cleaner may include a surrounding cover designed to form a storage capacity surrounding at least the radiating condenser, an inlet configured to supply at least one of cleaning gas and a cleaning solution to the storage capacity to clean at least the radiating condenser, and an outlet configured to remove at least one of the cleaning gas and the cleaning solution from the storage capacity. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：去除诸如对准器的辐射冷凝器的光学元件上的沉积物。 解决方案：用于清洁辐射冷凝器沉积物的方法; 集电器组件具有辐射冷凝器，盖板和用于将辐射冷凝器连接到盖板的支撑件。 盖板设置成覆盖收集器室48的开口。开口可以足够大以允许辐射冷凝器和支撑件通过。 通过不同的清洁处理清洁辐射式冷凝器。 该处理由清洁器执行。 清洁器可以包括设计成形成至少围绕辐射冷凝器的存储容量的周围盖子，被配置为将清洁气体和清洁溶液中的至少一种供应到存储容量以至少清洁辐射冷凝器的入口，以及出口 被配置为从所述存储容量中去除所述清洁气体和所述清洁溶液中的至少一个。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2003158070A

公开(公告)日：2003-05-30

申请号：JP2002237163

申请日：2002-07-12

Applicant: ASML NETHERLANDS BV ,  ZEISS CARL SEMICONDUCTOR MFG

Inventor： LOOPSTRA ERIK ROELOF ,  FRANKEN DOMINICUS JACOBUS PETRUS ADRIANUS ,  SMITS JOSEPHUS JACOBUS ,  VAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  HOF ALBRECHT ,  MAUL GUNTER ,  MUHLBEYER MICHAEL ,  MEHLKOPP KLAUS

IPC: G02B7/182 ,  G02B7/00 ,  G02B7/02 ,  G02B27/62 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a projection system which realizes high positioning precision necessary for an EUV lithographic apparatus and does not need to cool a frame to which an optical element is fixed, and to perform predictive temperature compensation positioning control which is complicated and expensive. SOLUTION: In this lithographic projection apparatus, the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1×10 K thereby avoiding the need for expensive cooling system and/or predictive temperature compensation.

公开(公告)号：JP2009302536A

公开(公告)日：2009-12-24

申请号：JP2009135672

申请日：2009-06-05

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LOOPSTRA ERIK ROELOF ,  BARTRAY PETRUS RUTGERUS ,  LEVASIER LEON MARTIN ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  SMITS JOSEPHUS JACOBUS ,  AANTJES ANTHONIE ,  WIJCKMANS MAURICE WILLEM JOZEF ,  RIDDER JOHANNES BERNARDUS ,  SCHREUDER ANDRE ,  PAULUSSEN DENNIS JOZEF MARIA ,  JONKERS PETER GERARDUS ,  POINCELIN HUGUES ,  HEUSSCHEN FRANSISCUS THERESIA

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/709 ,  G03F7/70808

Abstract: PROBLEM TO BE SOLVED: To suppress transmission of undesirable vibrations with respect to a lithography device and a device manufacturing method. SOLUTION: The lithography device includes a projection system configured to project an image on a substrate, a substrate table configured to support the substrate, a first chamber including the projection system, and a second chamber including the substrate table and first frame. The device includes a base frame configured so as to support the second chamber and an intermediate frame coupled to the base frame. The intermediate frame is configured to separate the first chamber and the second chamber. The device includes a support coupled to the first frame. The support is configured to support the first chamber through coupled openings that the intermediate frame and second chamber have. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：抑制相对于光刻设备的不期望的振动的传输和装置制造方法。 光刻设备包括：投影系统，被配置为将图像投影在基板上;衬底台，其被配置为支撑所述基板;第一室，包括所述投影系统;以及第二室，包括所述基板台和所述第一框架。 该装置包括被配置为支撑第二室的基座框架和耦合到基架的中间框架。 中间框架构造成分离第一室和第二室。 该装置包括联接到第一框架的支撑件。 支撑构造成通过中间框架和第二室具有的联接开口支撑第一室。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2004343116A

公开(公告)日：2004-12-02

申请号：JP2004142232

申请日：2004-05-12

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： BOX WILHELMUS JOSEPHUS ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  FRANKEN DOMINICUS JACOBUS PETR ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  SMITS JOSEPHUS JACOBUS ,  VAN DER WIJST MARC WILHELMUS M

IPC: G21K1/06 ,  G02B7/182 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70808 ,  G03F7/70825 ,  G03F7/70833 ,  G03F7/70858 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70991

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment which makes temperature stability of a projection system surer by active heat transport, while minimizing impact of mechanical vibration by the heat transport.
SOLUTION: In the lithography projection equipment, the projection system comprises one or more optical operating mirrors, and a heat shield which shields heat emission to the mirrors and/or a supporting structure of the mirrors or from the mirrors and/or the supporting structure of the mirrors. Although the heat shield is cooled compulsorily, as the mirrors and the heat shield are supported separately by a supporting frame, vibration of the mirrors by forced cooling is reduced. Preferably, the heat shield includes a heat shield which shields heat emission to the mirrors or from the mirrors, and shields heat emission to heat shields and/or supporting structures for individual mirrors or from the heat shields and/or the supporting structures.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供通过主动热输送确保投影系统的温度稳定性的光刻设备，同时最小化由热传递引起的机械振动的影响。 解决方案：在光刻投影设备中，投影系统包括一个或多个光学操作反射镜，以及屏蔽热反射镜和/或反射镜的支撑结构或从镜子和/或 镜子的支撑结构。 虽然隔热板被强制冷却，但由于反射镜和隔热罩由支撑框架单独支撑，所以通过强制冷却减轻了反射镜的振动。 优选地，隔热罩包括屏蔽向镜子或从反射镜发热的隔热罩，并且屏蔽热辐射到隔热罩和/或用于各个反射镜或隔热罩和/或支撑结构的支撑结构。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：SG128670A1

公开(公告)日：2007-01-30

申请号：SG200604526

申请日：2006-07-04

Applicant: ASML NETHERLANDS BV

Inventor： SJMAENOK LEONID AIZIKOVITCH ,  BANINE VADIM YEVGENYEVICH ,  SMITS JOSEPHUS JACOBUS ,  WILDENBERG VAN DEN LAMBERTUS A ,  SCHMIDT ALEXANDER ALEXANDROVIT ,  WASSINK ARNOUD CORNELIS ,  BROM PAUL PETER ANNA ANTONIUS ,  VERPALEN ERIC LOUIS WILLEM ,  PAS VAN DE ANTONIUS JOHANNES

Abstract: A lithographic apparatus includes a radiation system including a radiation source (SO) for the production of a radiation beam, and a contaminant trap (10,110) arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector (12,112) which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

公开(公告)号：DE60223630T2

公开(公告)日：2008-10-30

申请号：DE60223630

申请日：2002-07-12

Applicant: ZEISS CARL SMT AG ,  ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  FRANKEN DOMINICUS JACOBUS ,  SMITS JOSEPHUS JACOBUS ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  HOF ALBRECHT ,  MAUL GUENTER ,  MUHLBEYER MICHAEL ,  MEHLKOPP KLAUS

IPC: G02B7/00 ,  G02B7/182 ,  G02B7/02 ,  G02B27/62 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  H01L21/027

Abstract: A lithographic projection apparatus in which the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1 x 10 K thereby avoiding the need for expensive cooling systems and/or predictive temperature compensation.

公开(公告)号：DE60223630D1

公开(公告)日：2008-01-03

申请号：DE60223630

申请日：2002-07-12

Applicant: ZEISS CARL SMT AG ,  ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  FRANKEN DOMINICUS JACOBUS PETR ,  SMITS JOSEPHUS JACOBUS ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  MOORS JOHANNES HUBERTUS JOSEPH ,  HOF ALBRECHT ,  MAUL GUENTER ,  MUHLBEYER MICHAEL ,  MEHLKOPP KLAUS

IPC: G02B7/00 ,  G02B7/182 ,  G02B7/02 ,  G02B27/62 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  H01L21/027

Abstract: A lithographic projection apparatus in which the projection system comprises a plurality of optical elements or sensors mounted on a frame. The frame is made of a glass ceramic material with a coefficient of thermal expansion of less than or approximately equal to 0.1 x 10 K thereby avoiding the need for expensive cooling systems and/or predictive temperature compensation.

公开(公告)号：DE602006002439D1

公开(公告)日：2008-10-09

申请号：DE602006002439

申请日：2006-07-05

Applicant: ASML NETHERLANDS BV

Inventor： SJMAENOK LEONID AIZIKOVITCH ,  SMITS JOSEPHUS JACOBUS ,  BANINE VADIM YEVGENYEVICH ,  VAN DEN WILDENBERG LAMBERTUS A ,  SCHMIDT ALEXANDER ALEXANDROVIT ,  WASSINK ARNOUD CORNELIS ,  BROM PAUL PETER ANNA ANTONIUS ,  VERPALEN ERIC LOUIS WILLEM ,  VAN DE PAS ANTONIUS JOHANNES

IPC: G03F7/20

Abstract: A lithographic apparatus includes a radiation system including a radiation source (SO) for the production of a radiation beam, and a contaminant trap (10,110) arranged in a path of the radiation beam. The contaminant trap includes a plurality of foils or plates defining channels which are arranged substantially parallel to the direction of propagation of said radiation beam. The foils or plates can be oriented substantially radially with respect to an optical axis of the radiation beam. The contaminant trap can be provided with a gas injector (12,112) which is configured to inject gas at least at two different positions directly into at least one of the channels of the contaminant trap.

公开(公告)号：SG115684A1

公开(公告)日：2005-10-28

申请号：SG200402416

申请日：2004-05-06

Applicant: ASML NETHERLANDS BV

Inventor： BOX WILHELMUS JOSEPHUS ,  VAN DIJSSELDONK ANTONIUS JOHAN ,  FRANKEN DOMINICUS JACOBUS PETR ,  LEENDERS MARTINUS HENDRIKUS AN ,  LOOPSTRA ERIK ROELOF ,  SMITS JOSEPHUS JACOBUS ,  VAN DER WIJST MARC WILHELMUS M

IPC: G21K1/06 ,  G02B7/182 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus contains a projection system for projecting a patterned beam onto a target portion of the substrate. The projection system contains one or more optically active mirrors (20) and heat shields (22,28,29) specifically located for intercepting heat radiation to or from the mirrors and/or their support structure (26). The heat shields are actively cooled and the mirrors and the heat shields and the mirrors are supported separately on a support frame to reduce vibration of the mirrors due to active cooling. The heat shields preferably include heat shields that intercept heat radiation to or from the support structure and/or respective heat shields for individual mirrors that intercept heat radiation to or from the mirrors.

公开(公告)号：NL1036957A1

公开(公告)日：2009-12-15

申请号：NL1036957

申请日：2009-05-13

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  BARTRAY PETRUS RUTGERUS ,  LEVASIER LEON MARTIN ,  LUTTIKHUIS BERNARDUS ANTONIUS ,  SMITS JOSEPHUS JACOBUS ,  AANTJES ANTHONIE ,  WIJCKMANS MAURICE WILLEM JOZEF ,  RIDDER JOHANNES BERNARDUS ,  SCHREUDER ANDRE ,  PAULUSSEN DENNIS JOSEF MARIA ,  JONKERS PETER GERARDUS ,  POINCELIN HUGUES ,  HEUSSCHEN FRANSISCUS THERESIA

IPC: G03F7/20