公开(公告)号：NL2013417A

公开(公告)日：2015-04-07

申请号：NL2013417

申请日：2014-09-05

Applicant: ASML NETHERLANDS BV

Inventor： YPMA ALEXANDER ,  MENGER JASPER ,  DECKERS DAVID ,  HAN DAVID ,  KOOPMAN ADRIANUS ,  LYULINA IRINA ,  MIDDLEBROOKS SCOTT ,  HAREN RICHARD ,  WILDENBERG JOCHEM

IPC: G03F7/20

Abstract: In a lithographic process, product units such as semiconductor wafers are subjected to lithographic patterning operations and chemical and physical processing operations. Alignment data or other measurements are made at stages during the performance of the process to obtain object data representing positional deviation or other parameters measured at points spatially distributed across each unit. This object data is used to obtain diagnostic information by performing a multivariate analysis to decompose a set of vectors representing the units in the multidimensional space into one or more component vectors. Diagnostic information about the industrial process is extracted using the component vectors. The performance of the industrial process for subsequent product units can be controlled based on the extracted diagnostic information.

公开(公告)号：NL2013677A

公开(公告)日：2015-07-29

申请号：NL2013677

申请日：2014-10-24

Applicant: ASML NETHERLANDS BV

Inventor： WILDENBERG JOCHEM ,  MOS EVERHARDUS CORNELIS

IPC: G03F7/20 ,  H01L21/68