公开(公告)号：NL2010954A

公开(公告)日：2013-12-23

申请号：NL2010954

申请日：2013-06-12

Applicant: ASML NETHERLANDS BV

Inventor： WIT PAUL ,  LEENDERS MARTINUS ,  OTTENS JOOST ,  ZUTPHEN TOM ,  DRENT WILLIAM

IPC: G03F7/20

公开(公告)号：NL2004752A

公开(公告)日：2010-12-20

申请号：NL2004752

申请日：2010-05-20

Applicant: ASML NETHERLANDS BV

Inventor： MAKAROVIC JURAJ ,  KOOPS RODY ,  ZUTPHEN TOM

IPC: G03F7/20 ,  H02K41/03

公开(公告)号：NL2004085A

公开(公告)日：2010-09-14

申请号：NL2004085

申请日：2010-01-13

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ,  SWINKELS GERARDUS ,  ZUTPHEN TOM ,  LABETSKI DZMITRY

IPC: G03F7/20 ,  H05G2/00

Abstract: A plasma radiation source includes a vessel configured to catch a source material transmitted along a trajectory, and a decelerator configured to reduce a speed of the source material in a section of the trajectory downstream of a plasma initiation site.