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    LITHOGRAPHIC APPARATUS.
    1.
    发明专利
    LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2008272A

    公开(公告)日：2012-09-11

    申请号：NL2008272

    申请日：2012-02-10

    Applicant: ASML NETHERLANDS BV

    Inventor： PASCH ENGELBERTUS ,  EUSSEN EMIEL ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  OTTENS JOOST JEROEN ,  STAALS FRANK ,  MACHT LUKASZ JERZY ,  DRENT WILLIAM ,  BOGAART ERIK WILLEM

    IPC: G03F7/20 ,  H01L21/68

    Abstract: A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD.
    2.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. 未知

    公开(公告)号：NL2006129A

    公开(公告)日：2011-09-13

    申请号：NL2006129

    申请日：2011-02-03

    Applicant: ASML NETHERLANDS BV

    Inventor： DRENT WILLIAM

    IPC: G03F7/20

    Abstract: A level sensor configured to measure a height level of a substrate arranged in a measurement position is disclosed. The level sensor comprises a projection unit to project multiple measurement beams on multiple measurement locations on the substrate, a detection unit to receive the measurement beams after reflection on the substrate, and a processing unit to calculate a height level on the basis of the reflected measurement beams received by the detection unit, wherein the projection unit and the detection unit are arranged next to the substrate, when the substrate is arranged in the measurement position.

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